Predicted protein targets (top 5)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HSD11B1 | P28845 | 1/20 | 0.38 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.36 |
| ▸ | EPHX2 | P34913 | 4/20 | 0.34 |
| ▸ | MAPT | P10636 | 1/20 | 0.33 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL16874413 | 0.86 | L3MBTL1 (0.45) | HSD11B1L3MBTL1EPHX2MAPT | |
| SCHEMBL2173214 | 0.83 | NPSR1 (0.41) | HSD11B1L3MBTL1EPHX2 | |
| SCHEMBL18259758 | 0.79 | L3MBTL1 (0.40) | HSD11B1L3MBTL1EPHX2 | |
| SCHEMBL4400851 | 0.79 | HSD11B1 (0.36) | HSD11B1 | |
| SCHEMBL9649905 | 0.75 | HSD11B1 (0.38) | HSD11B1L3MBTL1EPHX2MAPTHSD17B10 | |
| SCHEMBL244479 | 0.75 | HSD11B1 (0.38) | HSD11B1L3MBTL1EPHX2MAPTHSD17B10 | |
| SCHEMBL245976 | 0.74 | POLB (0.42) | HSD11B1L3MBTL1EPHX2MAPT | |
| SCHEMBL3023543 | 0.70 | EPHX2 (0.36) | HSD11B1EPHX2MAPT | |
| SCHEMBL15534301 | 0.70 | GRIK1 (0.46) | — | |
| SCHEMBL15534303 | 0.70 | GRIK1 (0.46) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 22 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3067395-B1 | ULTRAVIOLET RADIATION-CURABLE COMPOSITION, AND RECORDED MATTER | SEIKO EPSON CORP (JP) | 2020-10-28 | — | — | EP | claimed |
| EP-3067396-B1 | ULTRAVIOLET CURABLE COMPOSITION AND RECORDED OBJECT | SEIKO EPSON CORP (JP) | 2019-04-17 | — | — | EP | claimed |
| EP-2738229-B1 | Ultraviolet ray curable ink composition for use in ink jet method and printed object | SEIKO EPSON CORP (JP) | 2018-04-18 | — | — | EP | claimed |
| EP-2738228-B1 | Ultraviolet ray curable ink composition for use in ink jet method and printed object | SEIKO EPSON CORP (JP) | 2018-01-17 | — | — | EP | claimed |
| EP-2871062-B1 | Production method of recording material, and recording material | SEIKO EPSON CORP (JP) | 2016-08-17 | — | — | EP | claimed |
| EP-2738227-B1 | Ultraviolet ray curable ink composition for use in ink jet method and printed object | SEIKO EPSON CORP (JP) | 2015-10-21 | — | — | EP | claimed |
| US-20100203446-A1 | CHEMICALLY AMPLIFIED PHOTORESIST COMPOSITION AND METHOD FOR FORMING PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2010-08-12 | — | — | US | claimed |
| CN-117693545-A | Organosilicon polymer compound and organosilicon polymer material | 国立大学法人大阪大学 | 2024-03-12 | — | — | CN | disclosed |
| CN-117623918-A | Preparation method of acrylic resin monomer for 193nm photoresist | 河北凯力昂生物科技有限公司 | 2024-03-01 | — | — | CN | disclosed |
| US-9753299-B2 | Optical element | ASAHI GLASS COMPANY, LIMITED (JP) | 2017-09-05 | — | — | US | disclosed |
| US-9654676-B2 | Optical element, optical system and imaging apparatus | ASAHI GLASS COMPANY, LIMITED (JP) | 2017-05-16 | — | — | US | disclosed |
| US-20150309224-A1 | OPTICAL DEVICE, OPTICAL SYSTEM, AND IMAGING APPARATUS | ASAHI GLASS COMPANY, LIMITED (JP) | 2015-10-29 | — | — | US | disclosed |
| US-20150281536-A1 | OPTICAL ELEMENT, OPTICAL SYSTEM AND IMAGING APPARATUS | ASAHI GLASS COMPANY, LIMITED (JP) | 2015-10-01 | — | — | US | disclosed |
| US-20100203446-A1 | CHEMICALLY AMPLIFIED PHOTORESIST COMPOSITION AND METHOD FOR FORMING PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2010-08-12 | — | — | US | disclosed |
| US-20060275697-A1 | Top coating composition for photoresist and method of forming photoresist pattern using the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2006-12-07 | — | — | US | disclosed |
| EP-1558654-A4 | NOVEL COPOLYMER, PHOTORESIST COMPOSITIONS THEREOF AND DEEP UV BILAYER SYSTEM THEREOF | FUJIFILM ELECTRONIC MATERIALS (US) | 2006-04-05 | — | — | EP | disclosed |
| EP-1558654-A2 | NOVEL COPOLYMER, PHOTORESIST COMPOSITIONS THEREOF AND DEEP UV BILAYER SYSTEM THEREOF | Fujifilm Electronic Materials USA, Inc. (US) | 2005-08-03 | — | — | EP | disclosed |
| US-6916543-B2 | Copolymer, photoresist compositions thereof and deep UV bilayer system thereof | ARCH SPECIALTY CHEMICALS, INC. (US) | 2005-07-12 | — | — | US | disclosed |
| US-20040137362-A1 | Novel copolymer, photoresist compositions thereof and deep UV bilayer system thereof | ARCH SPECIALTY CHEMICALS, INC. | 2004-07-15 | — | — | US | disclosed |
| WO-2004040371-A2 | NOVEL COPOLYMER AND PHOTORESIST COMPOSITIONS THEREOF | ARCH SPECIALTY CHEMICALS, INC. (US) | 2004-05-13 | — | — | WO | disclosed |