Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.41 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.39 |
| ▸ | EPHX2 | P34913 | 5/20 | 0.38 |
| ▸ | APEX1 | P27695 | 3/20 | 0.35 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.34 |
| ▸ | TP53 | P04637 | 1/20 | 0.34 |
| ▸ | HSD11B1 | P28845 | 1/20 | 0.34 |
| ▸ | USP2 | O75604 | 1/20 | 0.34 |
| ▸ | ALOX5 | P09917 | 2/20 | 0.33 |
| ▸ | CES2 | O00748 | 1/20 | 0.32 |
| ▸ | CES1 | P23141 | 1/20 | 0.32 |
| ▸ | PTGES | O14684 | 1/20 | 0.31 |
| ▸ | AKR1B1 | P15121 | 1/20 | 0.31 |
| ▸ | GRIK1 | P39086 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL16874413 | 0.90 | L3MBTL1 (0.45) | NPSR1L3MBTL1EPHX2HSD11B1USP2 | |
| SCHEMBL18259758 | 0.83 | L3MBTL1 (0.40) | NPSR1L3MBTL1EPHX2HSD11B1 | |
| SCHEMBL3027574 | 0.83 | HSD11B1 (0.38) | L3MBTL1EPHX2HSD11B1 | |
| SCHEMBL4400851 | 0.73 | HSD11B1 (0.36) | HSD11B1 | |
| SCHEMBL692340 | 0.70 | GRIK1 (0.51) | EPHX2APEX1ALOX5CES2CES1 | |
| SCHEMBL322607 | 0.70 | GRIK1 (0.51) | EPHX2APEX1ALOX5CES2CES1 | |
| SCHEMBL9649905 | 0.70 | HSD11B1 (0.38) | L3MBTL1EPHX2ALDH1A1HSD11B1 | |
| SCHEMBL244479 | 0.70 | HSD11B1 (0.38) | L3MBTL1EPHX2ALDH1A1HSD11B1 | |
| SCHEMBL481537 | 0.68 | CES1 (0.48) | APEX1ALDH1A1TP53CES2CES1 | |
| SCHEMBL88045 | 0.68 | CES1 (0.48) | APEX1ALDH1A1TP53CES2CES1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7972763-B2 | Patterns having high resolution; used for semiconductor microfabrication employing a lithography | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-07-05 | — | — | US | disclosed |
| US-7862980-B2 | Salt suitable for an acid generator and a chemically amplified positive resist composition containing the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-01-04 | — | — | US | disclosed |
| US-20080153036-A1 | Chemically amplified positive resist compostion | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2008-06-26 | — | — | US | disclosed |
| US-20080081293-A1 | Salt suitable for an acid generator and a chemically amplified positive resist composition containing the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2008-04-03 | — | — | US | disclosed |
| EP-1558654-A4 | NOVEL COPOLYMER, PHOTORESIST COMPOSITIONS THEREOF AND DEEP UV BILAYER SYSTEM THEREOF | FUJIFILM ELECTRONIC MATERIALS (US) | 2006-04-05 | — | — | EP | disclosed |
| EP-1558654-A2 | NOVEL COPOLYMER, PHOTORESIST COMPOSITIONS THEREOF AND DEEP UV BILAYER SYSTEM THEREOF | Fujifilm Electronic Materials USA, Inc. (US) | 2005-08-03 | — | — | EP | disclosed |
| US-6916543-B2 | Copolymer, photoresist compositions thereof and deep UV bilayer system thereof | ARCH SPECIALTY CHEMICALS, INC. (US) | 2005-07-12 | — | — | US | disclosed |
| US-20040137362-A1 | Novel copolymer, photoresist compositions thereof and deep UV bilayer system thereof | ARCH SPECIALTY CHEMICALS, INC. | 2004-07-15 | — | — | US | disclosed |
| WO-2004040371-A2 | NOVEL COPOLYMER AND PHOTORESIST COMPOSITIONS THEREOF | ARCH SPECIALTY CHEMICALS, INC. (US) | 2004-05-13 | — | — | WO | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20080081293-A1 | Salt suitable for an acid generator and a chemically amplified positive resist composition containing the same | HCN3, HCN1, NHERF1 | NPSR1 806/4885L3MBTL1 3211/4885EPHX2 1108/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.