SCHEMBL4400851

SCHEMBL4400851

C=CCC(=CC1C2CC3CC(C2)CC1C3)C(=O)O

nearest known ligand 0.36

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
HSD11B1 P28845 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3027574 0.79 HSD11B1 (0.38) HSD11B1
SCHEMBL16874413 0.76 L3MBTL1 (0.45) HSD11B1
Bicarbonate SCHEMBL20943643 0.75 HSD11B1 (0.43) HSD11B1
SCHEMBL2173214 0.73 NPSR1 (0.41) HSD11B1
SCHEMBL18259758 0.70 L3MBTL1 (0.40) HSD11B1
SCHEMBL1251150 0.69 TDP1 (0.39)
SCHEMBL2831855 0.69 THRB (0.34)
SCHEMBL8076053 0.68 HSD11B1 (0.38) HSD11B1
SCHEMBL244479 0.68 HSD11B1 (0.38) HSD11B1
SCHEMBL9649905 0.68 HSD11B1 (0.38) HSD11B1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7611822-B2 Positive resist composition used for semiconductor microfabrication employing a lithography process contains an acid generator comprising a compound generating an acid by irradiation and a monomer having a bulky and acid-labile group SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2009-11-03 US claimed
US-20080081293-A1 Salt suitable for an acid generator and a chemically amplified positive resist composition containing the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2008-04-03 US claimed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20080081293-A1 Salt suitable for an acid generator and a chemically amplified positive resist composition containing the same HCN3, HCN1, NHERF1 HSD11B1 293/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.