Predicted protein targets (top 7)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 2/20 | 0.35 |
| ▸ | EPHX2 | P34913 | 13/20 | 0.34 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.31 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.31 |
| ▸ | MEN1 | O00255 | 2/20 | 0.31 |
| ▸ | EPHX1 | P07099 | 1/20 | 0.30 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3053347 | 0.92 | EPHX2 (0.32) | TSHREPHX2KMT2AALDH1A1MEN1 | |
| SCHEMBL217041 | 0.86 | TSHR (0.32) | TSHREPHX2KMT2AALDH1A1MEN1 | |
| SCHEMBL3058363 | 0.86 | EPHX2 (0.37) | TSHREPHX2KMT2AALDH1A1MEN1 | |
| SCHEMBL10151069 | 0.81 | HSD11B1 (0.37) | — | |
| SCHEMBL24244833 | 0.79 | DPP4 (0.31) | — | |
| SCHEMBL17750341 | 0.78 | EPHX2 (0.33) | EPHX2ALDH1A1EPHX1 | |
| SCHEMBL75673 | 0.76 | ALDH1A1 (0.31) | EPHX2ALDH1A1 | |
| SCHEMBL251058 | 0.76 | NAAA (0.32) | EPHX2ALDH1A1 | |
| SCHEMBL16241191 | 0.75 | ALDH1A1 (0.31) | ALDH1A1 | |
| SCHEMBL6333499 | 0.74 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4267708-B1 | THERMALLY RESPONSIVE BRUSH POLYMERS HAVING A COPOLYMER BACKBONE AND COPOLYMER ARMS | INFINEUM INT LTD (GB) | 2025-07-02 | — | — | EP | disclosed |
| US-12281203-B2 | Thermally responsive brush polymers having a copolymer backbone and copolymer arms | INFINEUM INTERNATIONAL LIMITED (GB) | 2025-04-22 | — | — | US | disclosed |
| US-20240309155-A1 | Thermally Responsive Brush Polymers Having a Copolymer Backbone and Copolymer Arms | INFINEUM INTERNATIONAL LIMITED (GB) | 2024-09-19 | — | — | US | disclosed |
| CN-110032042-B | Negative photoresist composition for laser ablation and method of use thereof | 默克专利有限公司 | 2022-05-27 | — | — | CN | disclosed |
| CN-108139670-B | Negative photoresist composition for laser ablation and method of use thereof | 默克专利有限公司 | 2021-07-09 | — | — | CN | disclosed |
| CN-110032042-A | Negative photoresist composition and its application method for laser ablation | AZ电子材料卢森堡有限公司 | 2019-07-19 | — | — | CN | disclosed |
| CN-108139670-A | Negative photoresist composition for laser ablation and method of use thereof | AZ电子材料卢森堡有限公司 | 2018-06-08 | — | — | CN | disclosed |
| CN-102056913-A | Sulfonium derivatives and the use thereof as latent acids | BASF SE | 2011-05-11 | — | — | CN | disclosed |
| CN-101952248-A | Sulphonium salt initiators | BASF SE | 2011-01-19 | — | — | CN | disclosed |
| US-7833690-B2 | Photoacid generators and lithographic resists comprising the same | THE UNIVERSITY OF NORTH CAROLINA AT CHARLOTTE (US) | 2010-11-16 | — | — | US | disclosed |
| US-7776505-B2 | High resolution resists for next generation lithographies | THE UNIVERSITY OF NORTH CAROLINA AT CHARLOTTE (US) | 2010-08-17 | — | — | US | disclosed |
| CN-101410756-A | Negative photoresist compositions | AZ ELECTRONIC MATERIALS USA (US) | 2009-04-15 | — | — | CN | disclosed |
| US-20070117043-A1 | Photoacid generators and lithographic resists comprising the same | NATIONAL SCIENCE FOUNDATION | 2007-05-24 | — | — | US | disclosed |
| US-20060121390-A1 | High resolution resists for next generation lithographies | NATIONAL SCIENCE FOUNDATION | 2006-06-08 | — | — | US | disclosed |