Predicted protein targets (top 3)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.31 |
| ▸ | EPHX2 | P34913 | 1/20 | 0.31 |
| ▸ | ELANE | P08246 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Acrylic Acid SCHEMBL27911850 | 0.92 | THRB (0.31) | — | |
| SCHEMBL251058 | 0.87 | NAAA (0.32) | ALDH1A1EPHX2ELANE | |
| SCHEMBL1919856 | 0.84 | — | — | |
| SCHEMBL16241191 | 0.83 | ALDH1A1 (0.31) | ALDH1A1 | |
| SCHEMBL13244778 | 0.81 | ALDH1A1 (0.34) | ALDH1A1EPHX2 | |
| SCHEMBL2112114 | 0.80 | TSHR (0.31) | ALDH1A1EPHX2 | |
| SCHEMBL217041 | 0.80 | TSHR (0.32) | ALDH1A1EPHX2 | |
| SCHEMBL6536682 | 0.79 | MEN1 (0.35) | EPHX2 | |
| SCHEMBL3053347 | 0.78 | EPHX2 (0.32) | ALDH1A1EPHX2 | |
| SCHEMBL10151069 | 0.78 | HSD11B1 (0.37) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 382 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-122011265-A | Novel terpolymer photoresist resin and application thereof | 宁波南大光电材料有限公司 | 2026-05-12 | — | — | CN | claimed |
| CN-121578607-A | Composition for lithography development, design method and application thereof | 苏州实验室 | 2026-02-27 | — | — | CN | claimed |
| US-20260029717-A1 | PITCH SPLITTING FOR EUV IMAGING | TOKYO ELECTRON LTD (JP) | 2026-01-29 | — | — | US | claimed |
| CN-115903384-A | Chemically amplified photoresist and preparation and use method thereof | 徐州博康信息化学品有限公司 | 2023-04-04 | — | — | CN | claimed |
| CN-115826357-A | Chemical amplification type photoresist containing ammonium salt compound and preparation and use method thereof | 徐州博康信息化学品有限公司 | 2023-03-21 | — | — | CN | claimed |
| CN-114105863-A | Acid diffusion inhibitor, chemically amplified photoresist containing acid diffusion inhibitor and preparation and use methods thereof | 江苏汉拓光学材料有限公司 | 2022-03-01 | — | — | CN | claimed |
| CN-104404765-B | A kind of aramid fiber cord fabric dipping glue, preparation method and impregnation aramid fiber cord fabric | 江苏久瑞高能电子有限公司 | 2018-01-26 | — | — | CN | claimed |
| US-9233840-B2 | Method for improving self-assembled polymer features | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2016-01-12 | — | — | US | claimed |
| US-8486489-B2 | Methods for aligning polymer films and related structures | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2013-07-16 | — | — | US | claimed |
| US-20120103935-A1 | METHOD FOR IMPROVING SELF-ASSEMBLED POLYMER FEATURES | JSR CORPORATION (JP) | 2012-05-03 | — | — | US | claimed |
| US-20090214823-A1 | METHODS FOR ALIGNING POLYMER FILMS AND RELATED STRUCTURES | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2009-08-27 | — | — | US | claimed |
| CN-122070309-A | Composition, resin composition, film-forming composition for lithography, and resist film-forming composition | 三菱瓦斯化学株式会社 | 2026-05-19 | — | — | CN | disclosed |
| WO-2026100410-A1 | IODINE-CONTAINING POLYMERIZABLE COMPOUND AND IODINE-CONTAINING POLYMER | 三菱瓦斯化学株式会社 | 2026-05-15 | — | — | WO | disclosed |
| CN-122011265-A | Novel terpolymer photoresist resin and application thereof | 宁波南大光电材料有限公司 | 2026-05-12 | — | — | CN | disclosed |
| CN-122011265-A | Novel terpolymer photoresist resin and application thereof | 宁波南大光电材料有限公司 | 2026-05-12 | — | — | CN | disclosed |
| EP-1162506-A1 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2001-12-12 | — | — | EP | disclosed |
| US-20010023050-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2001-09-20 | — | — | US | disclosed |
| EP-1122605-A2 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2001-08-08 | — | — | EP | disclosed |
| EP-1085379-A1 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2001-03-21 | — | — | EP | disclosed |
| EP-0936504-A1 | A radiation-sensitive material and a method for forming a pattern therewith | Daicel Chemical Industries, Ltd. (JP) | 1999-08-18 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20260029717-A1 | PITCH SPLITTING FOR EUV IMAGING | ELAVL3, ELAVL1, RUVBL2 | ALDH1A1 1924/4885EPHX2 124/4885ELANE 2946/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.