SCHEMBL217041

SCHEMBL217041

C=C(C)C(=O)OC12CC3CC(CC(C3)C1CC)C2

nearest known ligand 0.34

Predicted protein targets (top 10)

geneUniProtsupporting neighboursconfidence
TSHR P16473 2/20 0.32
EPHX2 P34913 3/20 0.31
ALDH1A1 P00352 2/20 0.31
LMNA P02545 1/20 0.31
MEN1 O00255 2/20 0.30
KMT2A Q03164 2/20 0.30
SCN1A P35498 1/20 0.30
SCN2A Q99250 1/20 0.30
SCN3A Q9NY46 1/20 0.30
L3MBTL1 Q9Y468 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3053347 0.89 EPHX2 (0.32) TSHREPHX2ALDH1A1MEN1KMT2A
SCHEMBL3057474 0.86 TSHR (0.35) TSHREPHX2ALDH1A1MEN1KMT2A
SCHEMBL10151069 0.86 HSD11B1 (0.37)
SCHEMBL28445485 0.86 TSHR (0.30) TSHREPHX2ALDH1A1
SCHEMBL17322714 0.85 ALDH1A1 (0.33) EPHX2ALDH1A1LMNAMEN1KMT2A
SCHEMBL7711858 0.84 ALDH1A1 (0.34) EPHX2ALDH1A1LMNAMEN1KMT2A
SCHEMBL27608641 0.84 LMNA (0.33) ALDH1A1LMNA
SCHEMBL6333499 0.84
SCHEMBL24244833 0.83 DPP4 (0.31)
SCHEMBL5917748 0.83 EPHX2 (0.32) EPHX2ALDH1A1LMNAMEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 417 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-103178213-B Organic light-emitting display device and manufacture method thereof LG DISPLAY CO., LTD. (KR) 2015-11-18 CN claimed
CN-102483575-B Positive-working photoimageable bottom antireflective coating AZ ELECTRONIC MATERIALS USA 2014-12-03 CN claimed
CN-103178213-A Organic light emitting display device and method for fabricating the same LG DISPLAY CO LTD 2013-06-26 CN claimed
CN-101086620-B Salt adapted for acid generating agent and chemical enlarging type positive corrosion-resisting agent composition containing the same SUMITOMO CHEMICAL CO 2011-11-09 CN claimed
US-20110177454-A1 RESIST MATERIAL AND PATTERN FORMATION METHOD USING THE RESIST MATERIAL PANASONIC CORPORATION (JP) 2011-07-21 US claimed
CN-101799629-A Chemical amplifying type photo-corrosion-resisting agent composition and formation method of patterning SUMITOMO CHEMICAL CO 2010-08-11 CN claimed
CN-101086620-A Salt adapted for acid generating agent and chemical enlarging type positive corrosion-resisting agent composition containing the same SUMITOMO CHEMICAL CO (JP) 2007-12-12 CN claimed
CN-1321351-C Chemical reinforcing type positive photoresist composition SUMITOMO CHEMICAL CO (JP) 2007-06-13 CN claimed
CN-1366212-A Chemical reinforcing type positive photoresist composition SUMITOMO CHEMICAL CO (JP) 2002-08-28 CN claimed
US-12578644-B2 Upper film-forming composition and method for producing phase-separated pattern NISSAN CHEMICAL CORPORATION (JP) 2026-03-17 US disclosed
EP-4267708-B1 THERMALLY RESPONSIVE BRUSH POLYMERS HAVING A COPOLYMER BACKBONE AND COPOLYMER ARMS INFINEUM INT LTD (GB) 2025-07-02 EP disclosed
US-12281203-B2 Thermally responsive brush polymers having a copolymer backbone and copolymer arms INFINEUM INTERNATIONAL LIMITED (GB) 2025-04-22 US disclosed
US-20240309155-A1 Thermally Responsive Brush Polymers Having a Copolymer Backbone and Copolymer Arms INFINEUM INTERNATIONAL LIMITED (GB) 2024-09-19 US disclosed
US-20240124632-A1 Method for Producing Fluorine-Containing Polymer and Composition CENTRAL GLASS COMPANY, LIMITED (JP) 2024-04-18 US disclosed
CN-1366212-A Chemical reinforcing type positive photoresist composition SUMITOMO CHEMICAL CO (JP) 2002-08-28 CN disclosed
CN-1354392-A Chemical amplifying positive photoresist composition SUMITOMO CHEMICAL CO (JP) 2002-06-19 CN disclosed
US-20020052449-A1 Method of quantifying protective ratio of hydroxyl groups of polymer compound SUMITOMO CHEMICAL COMPANY, LIMITED 2002-05-02 US disclosed
US-20020051936-A1 Polymers, resist compositions and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2002-05-02 US disclosed
CN-1330289-A Optical enhancement right photoetching rubber composite and sulfonium salt SUMITOMO CHEMICAL CO (JP) 2002-01-09 CN disclosed
CN-1322968-A Chemical reinforcing photoresist structure composition and sulfonium salt SUMITOMO CHEMICAL CO (JP) 2001-11-21 CN disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-12578644-B2 Upper film-forming composition and method for producing phase-separated pattern SMCHD1, SSU72, TPR TSHR 3674/4885EPHX2 1483/4885ALDH1A1 2401/4885
US-20240124632-A1 Method for Producing Fluorine-Containing Polymer and Composition PFAS, AFF2, AFF1 TSHR 552/4885EPHX2 328/4885ALDH1A1 865/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.