Sebacic Acid

Sebacic Acid

SCHEMBL30655949

C=CC(=O)O.C=CC(=O)O.O=C(O)CCCCCCCCC(=O)O

nearest known ligand 0.67

Full drug profile on Sugi Atlas →

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TSHR P16473 5/20 0.67
LMNA P02545 4/20 0.67
NFKB1 P19838 1/20 0.67
PMP22 Q01453 1/20 0.67
ABCC4 O15439 1/20 0.65
MAPT P10636 1/20 0.65
GPR84 Q9NQS5 8/20 0.55
FFAR1 O14842 2/20 0.55
FFAR4 Q5NUL3 2/20 0.55
SLC22A6 Q4U2R8 2/20 0.53
PPARG P37231 6/20 0.52
PPARD Q03181 6/20 0.52
PPARA Q07869 6/20 0.52
HDAC11 Q96DB2 5/20 0.52
ALDH1A1 P00352 3/20 0.52
TLR2 O60603 2/20 0.52
TDP1 Q9NUW8 2/20 0.52
MEN1 O00255 2/20 0.52
FABP4 P15090 2/20 0.52
ALOX15 P16050 2/20 0.52

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Octanedioate SCHEMBL31348984 1.00 TSHR (0.67) TSHRLMNANFKB1PMP22ABCC4
Sebacic Acid SCHEMBL2776922 1.00 TSHR (0.67) TSHRLMNANFKB1PMP22ABCC4
Azelaic Acid SCHEMBL31688973 1.00 TSHR (0.67) TSHRLMNANFKB1PMP22ABCC4
Adipic Acid SCHEMBL3293975 0.97 LMNA (0.65) TSHRLMNANFKB1PMP22ABCC4
Adipic Acid SCHEMBL29532685 0.97 LMNA (0.65) TSHRLMNANFKB1PMP22ABCC4
Adipic Acid SCHEMBL9766376 0.94 LMNA (0.61) TSHRLMNANFKB1PMP22ABCC4
Glutarate SCHEMBL28241209 0.92 SLC22A6 (0.65) TSHRLMNANFKB1PMP22ABCC4
Adipic Acid SCHEMBL8593870 0.91 GPR84 (0.73) TSHRLMNANFKB1PMP22ABCC4
Adipic Acid SCHEMBL7906482 0.91 GPR84 (0.73) TSHRLMNANFKB1PMP22ABCC4
Acrylic Acid SCHEMBL31552907 0.91 GPR84 (0.73) TSHRLMNANFKB1PMP22ABCC4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-120053766-A Hydrophilic coating composition, hydrophilic coating reagent and preparation method of hydrophilic coating 科睿驰(深圳)医疗科技发展有限公司 2025-05-30 CN claimed
CN-119039588-A Siloxane benzocyclobutene prepolymer, solvent-free high-temperature-resistant low-dielectric ink for inkjet 3D printing, and preparation method and application thereof 大连理工大学 2024-11-29 CN claimed
CN-117069931-B Hyperbranched fluorenyl photosensitive polyaryletherketone precursor, composition, film and preparation method thereof 大连理工大学 2024-02-23 CN claimed
CN-117069931-A Hyperbranched fluorenyl photosensitive polyaryletherketone precursor, composition, film and preparation method thereof 大连理工大学 2023-11-17 CN claimed
CN-120078964-A Coating composition for lubrication of interventional instrument 科睿驰(深圳)医疗科技发展有限公司 2025-06-03 CN disclosed
CN-120053766-A Hydrophilic coating composition, hydrophilic coating reagent and preparation method of hydrophilic coating 科睿驰(深圳)医疗科技发展有限公司 2025-05-30 CN disclosed
CN-119735755-A Holographic recording medium and preparation and application thereof 华中科技大学 2025-04-01 CN disclosed
CN-119431738-A Triazine acrylic acid epoxy resin, preparation method and application thereof 广东三求光固材料股份有限公司 2025-02-14 CN disclosed
CN-119039588-A Siloxane benzocyclobutene prepolymer, solvent-free high-temperature-resistant low-dielectric ink for inkjet 3D printing, and preparation method and application thereof 大连理工大学 2024-11-29 CN disclosed
CN-119022775-A Anti-fatigue flexible strain sensor based on multi-scale stress dispersion mechanism 合肥工业大学 2024-11-26 CN disclosed
CN-118772361-A Polyfluoro polyurethane acrylate prepolymer, polyfluoro polyurethane acrylate low-dielectric ink for inkjet 3D printing, and preparation methods and applications thereof 大连理工大学 2024-10-15 CN disclosed
CN-117069931-B Hyperbranched fluorenyl photosensitive polyaryletherketone precursor, composition, film and preparation method thereof 大连理工大学 2024-02-23 CN disclosed
CN-117069931-A Hyperbranched fluorenyl photosensitive polyaryletherketone precursor, composition, film and preparation method thereof 大连理工大学 2023-11-17 CN disclosed