SCHEMBL3094974

SCHEMBL3094974

Clc1ccccc1-c1nc(-c2ccc(Br)cc2)c(-c2ccc(Br)cc2)n1C1(c2ccccc2Cl)N=C(c2ccc(Br)cc2)C(c2ccc(Br)cc2)=N1

nearest known ligand 0.38

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
GAA P10253 1/20 0.33
KMT2A Q03164 1/20 0.33
TOP2A P11388 1/20 0.33
PDE2A O00408 1/20 0.32
PDE10A Q9Y233 1/20 0.32
SMN1; SMN2 Q16637 2/20 0.32
HSD11B1 P28845 2/20 0.32
LMNA P02545 2/20 0.32
PTGES O14684 1/20 0.31
MAPT P10636 2/20 0.31
NPC1 O15118 2/20 0.30
RAB9A P51151 2/20 0.30
KDM4E B2RXH2 1/20 0.30
ALDH1A1 P00352 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL30358506 1.00 GAA (0.33) GAAKMT2ATOP2APDE2APDE10A
SCHEMBL29359500 0.91 HSD11B1 (0.37) GAAKMT2ASMN1; SMN2HSD11B1LMNA
SCHEMBL29749791 0.91 HSD11B1 (0.37) GAAKMT2ASMN1; SMN2HSD11B1LMNA
SCHEMBL307038 0.91 HSD11B1 (0.37) GAAKMT2ASMN1; SMN2HSD11B1LMNA
SCHEMBL30358509 0.90 L3MBTL1 (0.39) KMT2APDE2APDE10ASMN1; SMN2HSD11B1
SCHEMBL3094986 0.90 L3MBTL1 (0.39) KMT2APDE2APDE10ASMN1; SMN2HSD11B1
SCHEMBL30358508 0.86 KDM4E (0.39) GAAPDE2APDE10ALMNAMAPT
SCHEMBL3101056 0.86 KDM4E (0.39) GAAPDE2APDE10ALMNAMAPT
SCHEMBL3094971 0.86 HSD11B1 (0.36) SMN1; SMN2HSD11B1
SCHEMBL13645037 0.85 HSD11B1 (0.37) KMT2ASMN1; SMN2HSD11B1LMNAMAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240317942-A1 THIOL-CONTAINING COMPOSITION, PHOTOSETTING COMPOSITION, AND THERMOSETTING COMPOSITION RESONAC CORPORATION (JP) 2024-09-26 US disclosed
EP-4375302-A1 THIOL-CONTAINING COMPOSITION, PHOTOCURABLE COMPOSITION, AND THERMOSETTING COMPOSITION Resonac Corporation (JP) 2024-05-29 EP disclosed
US-9371460-B2 Photopolymerization method, ink set, ink composition, and water-soluble biimidazole FUJIFILM CORPORATION (JP) 2016-06-21 US disclosed
US-9371460-B2 Photopolymerization method, ink set, ink composition, and water-soluble biimidazole FUJIFILM CORPORATION (JP) 2016-06-21 US disclosed
US-20150148442-A1 PHOTOPOLYMERIZATION METHOD, INK SET, INK COMPOSITION, AND WATER-SOLUBLE BIIMIDAZOLE FUJIFILM CORPORATION (JP) 2015-05-28 US disclosed
US-20150148442-A1 PHOTOPOLYMERIZATION METHOD, INK SET, INK COMPOSITION, AND WATER-SOLUBLE BIIMIDAZOLE FUJIFILM CORPORATION (JP) 2015-05-28 US disclosed
EP-1478668-B1 THIOL COMPOUND, PHOTOPOLYMERIZATION INITIATOR COMPOSITION AND PHOTOSENSITIVE COMPOSITION SHOWA DENKO KK (JP) 2013-04-10 EP disclosed
US-8283095-B2 Thiourethane compound and photosensitive resin composition SHOWA DENKO K.K. (JP) 2012-10-09 US disclosed
US-20100233596-A1 THIOURETHANE COMPOUND AND PHOTOSENSITIVE RESIN COMPOSITION SHOWA DENKO K.K. (JP) 2010-09-16 US disclosed
EP-2055726-A1 THIOURETHANE COMPOUND AND PHOTOSENSITIVE RESIN COMPOSITION Showa Denko K.K. (JP) 2009-05-06 EP disclosed
US-7341828-B2 Thiol compound, photopolymerization initiator composition and photosensitive composition SHOWA DENKO K.K. (JP) 2008-03-11 US disclosed
EP-1031579-B1 Photopolymerization initiator for color filter, photosensitive coloring composition, and color filter SHOWA DENKO KK (JP) 2005-07-27 EP disclosed
US-20050153231-A1 Thiol compound, photopolymerization initiator composition and photosensitive composition SHOWA DENKO K.K. (JP) 2005-07-14 US disclosed
EP-1031579-A2 Photopolymerization initiator for color filter, photosensitive coloring composition, and color filter SHOWA DENKO KABUSHIKI KAISHA (JP) 2000-08-30 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20150148442-A1 PHOTOPOLYMERIZATION METHOD, INK SET, INK COMPOSITION, AND WATER-SOLUBLE BIIMIDAZOLE JAK1, SETDB1, CCNI GAA 4119/4885KMT2A 370/4885TOP2A 1312/4885
US-20100233596-A1 THIOURETHANE COMPOUND AND PHOTOSENSITIVE RESIN COMPOSITION RCOR3, CBR3, TAS2R3 GAA 4775/4885KMT2A 690/4885TOP2A 975/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.