Predicted protein targets (top 1)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NFKB1 | P19838 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL127783 | 0.98 | DNM1 (0.33) | — | |
| SCHEMBL126038 | 0.96 | — | — | |
| SCHEMBL9229787 | 0.93 | — | — | |
| SCHEMBL2921445 | 0.89 | — | — | |
| SCHEMBL309272 | 0.84 | — | — | |
| SCHEMBL202975 | 0.84 | NFKB1 (0.39) | NFKB1 | |
| SCHEMBL19286514 | 0.83 | NFKB1 (0.30) | NFKB1 | |
| SCHEMBL7808183 | 0.81 | DNM1 (0.42) | NFKB1 | |
| SCHEMBL7809693 | 0.81 | DNM1 (0.42) | NFKB1 | |
| SCHEMBL568547 | 0.81 | NFKB1 (0.37) | NFKB1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 95 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2949719-B1 | ADHESIVE COMPOSITION | TORAY INDUSTRIES (JP) | 2022-11-09 | — | — | EP | claimed |
| US-20240381529-A1 | METHOD FOR MANUFACTURING SUBSTRATE MATERIAL FOR SEMICONDUCTOR PACKAGE, PREPREG, AND APPLICATION FOR PREPREG | RESONAC CORPORATION (JP) | 2024-11-14 | — | — | US | disclosed |
| US-20230331946-A1 | METHOD FOR MANUFACTURING SUBSTRATE MATERIAL FOR SEMICONDUCTOR PACKAGE, PREPREG, AND SUBSTRATE MATERIAL FOR SEMICONDUCTOR PACKAGE | RESONAC CORPORATION (JP) | 2023-10-19 | — | — | US | disclosed |
| EP-2949719-B1 | ADHESIVE COMPOSITION | TORAY INDUSTRIES (JP) | 2022-11-09 | — | — | EP | disclosed |
| US-20220289976-A1 | THERMOSETTING RESIN COMPOSITION, THERMOSETTING RESIN SHEET, ELECTRONIC COMPONENT, AND ELECTRONIC DEVICE | TORAY INDUSTRIES, INC. (JP) | 2022-09-15 | — | — | US | disclosed |
| US-20220019146-A1 | FILM FORMING MATERIAL FOR LITHOGRAPHY, COMPOSITION FOR FILM FORMATION FOR LITHOGRAPHY, UNDERLAYER FILM FOR LITHOGRAPHY, AND METHOD FOR FORMING PATTERN | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2022-01-20 | — | — | US | disclosed |
| US-20210405529-A1 | FILM FORMING MATERIAL FOR LITHOGRAPHY, COMPOSITION FOR FILM FORMATION FOR LITHOGRAPHY, UNDERLAYER FILM FOR LITHOGRAPHY, AND METHOD FOR FORMING PATTERN | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2021-12-30 | — | — | US | disclosed |
| US-20210278767-A1 | FILM FORMING MATERIAL FOR LITHOGRAPHY, COMPOSITION FOR FILM FORMATION FOR LITHOGRAPHY, UNDERLAYER FILM FOR LITHOGRAPHY, AND METHOD FOR FORMING PATTERN | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2021-09-09 | — | — | US | disclosed |
| EP-3842863-A1 | FILM FORMATION MATERIAL FOR LITHOGRAPHY, COMPOSITION FOR FILM FORMATION FOR LITHOGRAPHY, UNDERLAYER FILM FOR LITHOGRAPHY, AND PATTERN FORMATION METHOD | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2021-06-30 | — | — | EP | disclosed |
| US-20210165327-A1 | FILM FORMING MATERIAL FOR LITHOGRAPHY, COMPOSITION FOR FILM FORMATION FOR LITHOGRAPHY, UNDERLAYER FILM FOR LITHOGRAPHY, AND METHOD FOR FORMING PATTERN | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2021-06-03 | — | — | US | disclosed |
| US-20070225438-A1 | Resin Paste for Die Bonding | HITACHI CHEMICAL CO., LTD. (JP) | 2007-09-27 | — | — | US | disclosed |
| US-20070169886-A1 | Heat-resistant resin laminated film, multilayer film with metal layer including same and semiconductor device | TORAY INDUSTRIES, INC. (JP) | 2007-07-26 | — | — | US | disclosed |
| US-20070098995-A1 | Adhesive film and process for preparing the same as well as adhesive sheet and semiconductor device | HITACHI CHEMICAL CO., LTD. (JP) | 2007-05-03 | — | — | US | disclosed |
| EP-1721740-A1 | HEAT-RESISTANT RESIN LAMINATED FILM, MULTILAYER FILM WITH METAL LAYER INCLUDING SAME, AND SEMICONDUCTOR DEVICE | TORAY INDUSTRIES, INC. (JP) | 2006-11-15 | — | — | EP | disclosed |
| EP-1407879-A1 | HEAT-RESISTANT RESIN FILM WITH METAL LAYER AND WIRING BOARD AND METHOD FOR MANUFACTURING THEM | TORAY INDUSTRIES, INC. (JP) | 2004-04-14 | — | — | EP | disclosed |
| US-20030170431-A1 | Heat-resistant resin film with metal layer and wiring board, and method for manufacturing them | TORAY INDUSTRIES, INC. (JP) | 2003-09-11 | — | — | US | disclosed |
| EP-0510638-B1 | Silicon-modified polyimide film and process for producing same | CHISSO CORP (JP) | 1995-10-11 | — | — | EP | disclosed |
| US-5300364-A | Metal-clad laminates and method for producing same | CHISSO CORPORATION (JP) | 1994-04-05 | — | — | US | disclosed |
| EP-0510638-A1 | Silicon-modified polyimide film and process for producing same | CHISSO CORPORATION (JP) | 1992-10-28 | — | — | EP | disclosed |
| EP-0496334-A1 | A flexible base laminated with metal on both the surfaces and a process for producing same | CHISSO CORPORATION (JP) | 1992-07-29 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20210165327-A1 | FILM FORMING MATERIAL FOR LITHOGRAPHY, COMPOSITION FOR FILM FORMATION FOR LITHOGRAPHY, UNDERLAYER FILM FOR LITHOGRAPHY, AND METHOD FOR FORMING PATTERN | RALA, MRPL19, MRPL9 | NFKB1 4478/4885 |
| US-20220019146-A1 | FILM FORMING MATERIAL FOR LITHOGRAPHY, COMPOSITION FOR FILM FORMATION FOR LITHOGRAPHY, UNDERLAYER FILM FOR LITHOGRAPHY, AND METHOD FOR FORMING PATTERN | LIPA, MLLT3, EPB41L2 | NFKB1 4323/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.