SCHEMBL3089481

SCHEMBL3089481

CCO[Si](OCC)(OCC)C(CC)C(=O)O

nearest known ligand 0.37

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
CHRM1 P11229 1/20 0.36
AKR1A1 P14550 1/20 0.36
CHRM3 P20309 1/20 0.36
HTR2A P28223 1/20 0.36
HTR2C P28335 1/20 0.36
ADRA1A P35348 1/20 0.36
HRH1 P35367 1/20 0.36
DRD3 P35462 1/20 0.36
SLC6A3 Q01959 1/20 0.36
HDAC1 Q13547 1/20 0.36
HDAC2 Q92769 1/20 0.36
TDP1 Q9NUW8 1/20 0.36
CA2 P00918 1/20 0.31
MAPK1 P28482 1/20 0.31
SLC1A3 P43003 1/20 0.30
SLC1A2 P43004 1/20 0.30
SLC1A1 P43005 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28301015 0.84 CHRM1 (0.44) CHRM1AKR1A1CHRM3HTR2AHTR2C
SCHEMBL12468894 0.83
SCHEMBL110600 0.83
SCHEMBL11118295 0.82 ALDH1A1 (0.33)
SCHEMBL15513449 0.80 ALOX15 (0.36) CA2
SCHEMBL28873678 0.79 CA2 (0.44) CHRM1AKR1A1CHRM3HTR2AHTR2C
SCHEMBL7568882 0.79
SCHEMBL9174333 0.79 GABRP (0.42) CHRM1AKR1A1CHRM3HTR2AHTR2C
SCHEMBL1971029 0.79 CA2 (0.32) CHRM1AKR1A1CHRM3HTR2AHTR2C
SCHEMBL18190791 0.77

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 51 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-119503725-A Preparation method and application of hydrogen production particles with porous structure 盐城师范学院 2025-02-25 CN claimed
CN-114265284-A High-heat-resistance copolymerization type negative photoresist composition and preparation method thereof 深圳迪道微电子科技有限公司 2022-04-01 CN claimed
CN-119503725-A Preparation method and application of hydrogen production particles with porous structure 盐城师范学院 2025-02-25 CN disclosed
CN-114265284-B High heat-resistant copolymerization type negative photoresist composition and preparation method thereof 深圳迪道微电子科技有限公司 2024-11-08 CN disclosed
CN-114265284-A High-heat-resistance copolymerization type negative photoresist composition and preparation method thereof 深圳迪道微电子科技有限公司 2022-04-01 CN disclosed
EP-2807112-B1 LOW DENSITY, HIGHLY POROUS NANO STRUCTURE NVIGEN INC (US) 2021-12-22 EP disclosed
US-10398905-B2 Uses of porous nanostructure in delivery NVIGEN, INC. (US) 2019-09-03 US disclosed
US-10302651-B2 Magnetic nanocompositions for highly sensitive molecular and cellular enrichment, purification and detection NVIGEN INC (US) 2019-05-28 US disclosed
US-20180306801-A1 MAGNETIC NANOCOMPOSITIONS FOR HIGHLY SENSITIVE MOLECULAR AND CELLULAR ENRICHMENT, PURIFICATION AND DETECTION NVIGEN INC (US) 2018-10-25 US disclosed
US-10067137-B2 Magnetic nanocompositions for highly sensitive molecular and cellular enrichment, purification and detection NVIGEN, INC. (US) 2018-09-04 US disclosed
US-10060915-B2 Multifunctional nanoparticles for molecular and cellular separation, detection and quantification NVIGEN, INC. (US) 2018-08-28 US disclosed
EP-1472574-A4 SPIN-ON ANTI-REFLECTIVE COATINGS FOR PHOTOLITHOGRAPHY HONEYWELL INT INC (US) 2005-06-08 EP disclosed
US-20050013843-A1 Dendrimeric organochalcogeno derivative bound to sol gel matrix; inexpensive, environmentally friendly, robust coating; nontoxic; reduced maintenance RESEARCH FOUNDATION OF STATE UNIVERSITY OF NEW YORK, THE 2005-01-20 US disclosed
EP-1478682-A1 ANTI-REFLECTIVE COATINGS FOR PHOTOLITHOGRAPHY AND METHODS OF PREPARATION THEREOF Honeywell International, Inc. (US) 2004-11-24 EP disclosed
EP-1472574-A1 SPIN-ON ANTI-REFLECTIVE COATINGS FOR PHOTOLITHOGRAPHY Honeywell International, Inc. (US) 2004-11-03 EP disclosed
WO-2004063292-A2 ANTI-FOULING SOL-GEL COATINGS CONTAINING DENDRIMERS THE RESEARCH FOUNDATION OF STATE UNIVERSITY OF NEWYORK (US) 2004-07-29 WO disclosed
WO-2003044078-A9 ANTI-REFLECTIVE COATINGS FOR PHOTOLITHOGRAPHY AND METHODS OF PREPARATION THEREOF HONEYWELL INT INC (US) 2004-01-08 WO disclosed
WO-2003044078-A1 ANTI-REFLECTIVE COATINGS FOR PHOTOLITHOGRAPHY AND METHODS OF PREPARATION THEREOF HONEYWELL INTERNATIONAL INC. (US) 2003-05-30 WO disclosed
WO-2003044600-A1 SPIN-ON ANTI-REFLECTIVE COATINGS FOR PHOTOLITHOGRAPHY HONEYWELL INTERNATIONAL INC. (US) 2003-05-30 WO disclosed
WO-1995034808-A1 A METHOD AND DEVICE FOR ANALYTICAL DETERMINATION OF MOLECULES PHARMACIA BIOTECH AB (SE) 1995-12-21 WO disclosed