Sugi Predict

Sugi Predict / Compounds / SCHEMBL30904490

SCHEMBL30904490

SCHEMBL30904490

CC[C@H](C)[C@H](NC(=O)[C@@H](N)CC(C)C)C(=O)N[C@H](C(=O)N[C@@H](CO)C(=O)NCC(=O)N[C@@H](Cc1ccccc1)C(=O)O)[C@@H](C)O

nearest known ligand 0.61

Predicted protein targets (top 5)

geneUniProtsupporting neighboursconfidence
▸ OPRM1 P35372 6/20 0.61
▸ OPRD1 P41143 6/20 0.61
▸ OPRK1 P41145 3/20 0.57
▸ CTSD P07339 3/20 0.51
▸ BACE1 P56817 1/20 0.48

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL30502004 0.92 OPRM1 (0.68) OPRM1OPRD1OPRK1
SCHEMBL38662780 0.88 CTSD (0.58) OPRM1OPRD1OPRK1CTSD
SCHEMBL31357930 0.87 OPRM1 (0.56) OPRM1OPRD1OPRK1CTSDBACE1
SCHEMBL29994099 0.87 OPRD1 (0.65) OPRM1OPRD1OPRK1
SCHEMBL30122976 0.87 OPRM1 (0.56) OPRM1OPRD1OPRK1BACE1
SCHEMBL30053045 0.86 CTSD (0.61) CTSDBACE1
SCHEMBL29630371 0.85 OPRD1 (0.63) OPRM1OPRD1OPRK1
SCHEMBL29540560 0.84 OPRM1 (0.59) OPRM1OPRD1OPRK1
SCHEMBL31688319 0.84 OPRM1 (0.56) OPRM1OPRD1OPRK1CTSD
SCHEMBL29947099 0.84 LTA4H (0.55) OPRM1OPRD1BACE1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-118126129-A Yellow tea oligopeptide, preparation method thereof and application thereof in resisting skin photoaging 安徽农业大学 2024-06-04 — — CN claimed
CN-118126129-A Yellow tea oligopeptide, preparation method thereof and application thereof in resisting skin photoaging 安徽农业大学 2024-06-04 — — CN disclosed
CN-118126129-A Yellow tea oligopeptide, preparation method thereof and application thereof in resisting skin photoaging 安徽农业大学 2024-06-04 — — CN disclosed
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