SCHEMBL309451

SCHEMBL309451

CCC(C)[B-](c1ccccc1)(c1ccccc1)c1ccccc1

nearest known ligand 0.38

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LMNA P02545 1/20 0.38
TRPA1 O75762 4/20 0.36
TSHR P16473 1/20 0.35
TP53 P04637 1/20 0.35
TAAR1 Q96RJ0 4/20 0.33
SLC6A2 P23975 3/20 0.33
SIGMAR1 Q99720 2/20 0.33
SLC6A4 P31645 2/20 0.33
SLC6A3 Q01959 2/20 0.33
MAOA P21397 1/20 0.33
CYP2A6 P11509 1/20 0.33
ADORA2A P29274 1/20 0.33
ADORA1 P30542 1/20 0.33
MEN1 O00255 1/20 0.32
KMT2A Q03164 1/20 0.32
ADRA2B P18089 1/20 0.32
ADRA2C P18825 1/20 0.32
HTR2A P28223 1/20 0.32
ADRA1A P35348 1/20 0.32
OPRK1 P41145 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Lithium Ion SCHEMBL9003568 0.98 LMNA (0.37) LMNATRPA1TSHRTP53TAAR1
Tetramethylammonium Ion SCHEMBL1412797 0.96 LMNA (0.35) LMNATRPA1TSHRTP53TAAR1
Tetrahexylammonium SCHEMBL12004399 0.84 DNM1 (0.44) LMNATSHRTP53SLC6A2SLC6A4
SCHEMBL8757654 0.78 MAPT (0.38) LMNATRPA1TSHRMEN1KMT2A
SCHEMBL8757321 0.77 SLC6A3 (0.38) LMNATSHRSLC6A2SLC6A4SLC6A3
SCHEMBL9003677 0.76 CYP2A6 (0.41) LMNATSHRMAOACYP2A6KCNH2
SCHEMBL9003380 0.74 CA12 (0.44) TSHRSLC6A4MAOA
SCHEMBL8756322 0.74 ALDH1A1 (0.37) LMNATRPA1TSHRTAAR1SLC6A2
SCHEMBL8390866 0.73 TAAR1 (0.39) LMNATRPA1TSHRTP53TAAR1
SCHEMBL8394441 0.71 TAAR1 (0.38) LMNATRPA1TSHRTP53TAAR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 67 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-108700785-B Display element sealing agent, liquid crystal sealing agent, cured product of liquid crystal sealing agent, liquid crystal display panel, and method for producing liquid crystal display panel 三井化学株式会社 2021-05-28 CN disclosed
US-10606212-B2 Selection method for additives in photopolymers COVESTRO DEUTSCHLAND AG (DE) 2020-03-31 US disclosed
US-9915592-B2 Methods of analyzing an H and E stained biological sample GENERAL ELECTRIC COMPANY (US) 2018-03-13 US disclosed
US-9915592-B2 Methods of analyzing an H and E stained biological sample GENERAL ELECTRIC COMPANY (US) 2018-03-13 US disclosed
US-9760060-B2 Photopolymer formulations for producing holographic media having highly crosslinked matrix polymers COVESTRO DEUTSCHLAND AG (DE) 2017-09-12 US disclosed
US-20170199494-A1 SELECTION METHOD FOR ADDITIVES IN PHOTOPOLYMERS COVESTRO DEUTSCHLAND AG (DE) 2017-07-13 US disclosed
US-9658595-B2 Security document and/or document of value containing a visually changeable window with a hologram COVESTRO DEUTSCHLAND AG (DE) 2017-05-23 US disclosed
US-9551975-B2 Polycarbonate-based security documents and/or documents of value with a hologram in the card body COVESTRO DEUTSCHLAND AG (DE) 2017-01-24 US disclosed
US-9454130-B2 Photopolymer formulations having the adjustable mechanical modulus GUV COVESTRO DEUTSCHLAND AG (DE) 2016-09-27 US disclosed
US-20160231705-A9 SELECTION METHOD FOR ADDITIVES IN PHOTOPOLYMERS COVESTRO DEUTSCHLAND AG (DE) 2016-08-11 US disclosed
US-6207726-B1 STORAGE STABILITY; CURABILITY SHOWA DENKO KABUSHIKI KAISHA (JP) 2001-03-27 US disclosed
EP-1044777-A1 Molding method for corrosion-resistant FRP SHOWA DENKO KABUSHIKI KAISHA (JP) 2000-10-18 EP disclosed
EP-1002817-A2 Photocurable composition SHOWA DENKO KABUSHIKI KAISHA (JP) 2000-05-24 EP disclosed
EP-0922727-A1 Photocurable prepreg sheet for waterproofing Showa Denko Kabushiki Kaisha (JP) 1999-06-16 EP disclosed
EP-0915136-A1 Photocurable paint composition for road markings SHOWA DENKO KABUSHIKI KAISHA (JP) 1999-05-12 EP disclosed
EP-0387087-B1 Photoinitiator compositions, photohardenable compositions and photosensitive microcapsules CYCOLOR INC (US) 1997-10-08 EP disclosed
EP-0555058-B1 (Oxo)sulfonium complex, polymerizable composition containing the complex, and method of polymerizing composition TOYO INK MFG CO (JP) 1997-05-07 EP disclosed
US-5500453-A INITIATOR FOR PHOTOSENSITIVE FREE RADICAL CURING/ POLYMERIZATION OF UNSATURATED COMPOUNDS TOYO INK MANUFACTURING CO., LTD. (JP) 1996-03-19 US disclosed
EP-0555058-A1 (Oxo)sulfonium complex, polymerizable composition containing the complex, and method of polymerizing composition TOYO INK MANUFACTURING CO., LTD. (JP) 1993-08-11 EP disclosed
EP-0387087-A2 Photoinitiator compositions, photohardenable compositions and photosensitive microcapsules THE MEAD CORPORATION (US) 1990-09-12 EP disclosed