Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP3A4 | P08684 | 3/20 | 0.56 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.56 |
| ▸ | TSHR | P16473 | 1/20 | 0.56 |
| ▸ | MEN1 | O00255 | 5/20 | 0.52 |
| ▸ | KMT2A | Q03164 | 5/20 | 0.52 |
| ▸ | MAPT | P10636 | 4/20 | 0.52 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.52 |
| ▸ | APOBEC3G | Q9HC16 | 1/20 | 0.52 |
| ▸ | CYP2C9 | P11712 | 3/20 | 0.51 |
| ▸ | CYP2C19 | P33261 | 3/20 | 0.51 |
| ▸ | HPGD | P15428 | 2/20 | 0.51 |
| ▸ | PDE7A | Q13946 | 2/20 | 0.48 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.47 |
| ▸ | DHFR | P00374 | 1/20 | 0.46 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.44 |
| ▸ | KDM1A | O60341 | 1/20 | 0.44 |
| ▸ | GFER | P55789 | 1/20 | 0.43 |
| ▸ | SLC6A2 | P23975 | 1/20 | 0.43 |
| ▸ | SLC6A4 | P31645 | 1/20 | 0.43 |
| ▸ | SLC6A3 | Q01959 | 1/20 | 0.43 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9814281 | 0.88 | CYP3A4 (0.65) | CYP3A4MAPK1TSHRMEN1KMT2A | |
| SCHEMBL29613097 | 0.86 | MAPT (0.56) | CYP3A4MAPK1MEN1KMT2AMAPT | |
| SCHEMBL11546 | 0.86 | MAPT (0.56) | CYP3A4MAPK1MEN1KMT2AMAPT | |
| SCHEMBL9814267 | 0.86 | CYP3A4 (0.70) | CYP3A4MAPK1TSHRMEN1KMT2A | |
| Hydrochloric Acid SCHEMBL5211034 | 0.84 | MAPT (0.54) | CYP3A4MAPK1MEN1KMT2AMAPT | |
| SCHEMBL546833 | 0.83 | DHFR (0.49) | CYP3A4MAPK1MEN1KMT2AMAPT | |
| SCHEMBL2614720 | 0.83 | DHFR (0.49) | CYP3A4MAPK1MEN1KMT2AMAPT | |
| SCHEMBL31016398 | 0.83 | CYP1A2 (0.53) | CYP3A4MEN1KMT2AMAPTNPSR1 | |
| SCHEMBL30567099 | 0.83 | DHFR (0.49) | CYP3A4MAPK1MEN1KMT2AMAPT | |
| SCHEMBL1713296 | 0.83 | CYP1A2 (0.53) | CYP3A4MEN1KMT2AMAPTNPSR1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 191 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-105315666-B | Transparent polymer film, electronic device including the same, and composition | 三星电子株式会社 | 2020-03-10 | — | — | CN | claimed |
| US-9975997-B2 | Compositions, composites prepared therefrom, and films and electronic devices including the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2018-05-22 | — | — | US | claimed |
| US-20160280857-A1 | COMPOSITIONS, COMPOSITES PREPARED THEREFROM, AND FILMS AND ELECTRONIC DEVICES INCLUDING THE SAME | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2016-09-29 | — | — | US | claimed |
| CN-105315666-A | Transparent polymer film and electronic device and composition including transparent polymer film | SAMSUNG ELECTRONICS CO LTD | 2016-02-10 | — | — | CN | claimed |
| US-20160009862-A1 | TRANSPARENT POLYMER FILM AND ELECTRONIC DEVICE INCLUDING THE SAME | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2016-01-14 | — | — | US | claimed |
| EP-0317943-A2 | Polymers prepared from 4,4'-bis-[2-(3,4-(dicarboxyphenyl) hexafluoroisopropyl] diphenyl ether dianhydride | HOECHST CELANESE CORPORATION (US) | 1989-05-31 | — | — | EP | claimed |
| CN-118210196-A | Photosensitive resin composition, cured film pattern and method for producing the same | 奇美实业股份有限公司 | 2024-06-18 | — | — | CN | disclosed |
| WO-2024111131-A1 | POLYAMIC ACID ESTER AND RESIN COMPOSITION | ＨＤマイクロシステムズ株式会社 | 2024-05-30 | — | — | WO | disclosed |
| WO-2024111130-A1 | POLYAMIC ACID ESTER AND RESIN COMPOSITION | ＨＤマイクロシステムズ株式会社 | 2024-05-30 | — | — | WO | disclosed |
| WO-2024111129-A1 | METHOD FOR PRODUCING POLYIMIDE PRECURSOR, POLYIMIDE PRECURSOR, PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT, METHOD FOR PRODUCING PATTERN CURED PRODUCT, AND ELECTRONIC COMPONENT | ＨＤマイクロシステムズ株式会社 | 2024-05-30 | — | — | WO | disclosed |
| WO-2024095573-A1 | POLYIMIDE PRECURSOR AND RESIN COMPOSITION | ＨＤマイクロシステムズ株式会社 | 2024-05-10 | — | — | WO | disclosed |
| WO-2024084636-A1 | PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT, METHOD FOR PRODUCING PATTERNED CURED PRODUCT, AND ELECTRONIC COMPONENT | ＨＤマイクロシステムズ株式会社 | 2024-04-25 | — | — | WO | disclosed |
| US-11945199-B2 | Laminated film, and display device including same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2024-04-02 | — | — | US | disclosed |
| EP-0052305-A1 | Isocyanato-isocyanurates that contain sulphur, process for their preparation and their use as a component in the preparation of polyurethanes | BAYER AG (DE) | 1982-05-26 | — | — | EP | disclosed |
| EP-0017883-B1 | SULPHUR-CONTAINING DIISOCYANATES, A PROCESS FOR THEIR PREPARATION AND THEIR USE AS SYNTHESIS COMPONENTS TO PREPARE POLYURETHANES | BAYER AG (DE) | 1981-10-21 | — | — | EP | disclosed |
| US-4276386-A | LIQUID AT ROOM TEMPERATURE OR LIQUEFIABLE BY GENTLE HEATING | BAYER AKTIENGESELLSCHAFT (US) | 1981-06-30 | — | — | US | disclosed |
| EP-0021077-A1 | Urea groups-containing diisocyanates, optionally dissolved in NCO-prepolymers, a process for preparing same as well as their use in the production of polyurethane resins | BAYER AG (DE) | 1981-01-07 | — | — | EP | disclosed |
| EP-0017905-A1 | Polyurethane ureas with aromatic sulfur-containing urea groups and process for their preparation | BAYER AG (DE) | 1980-10-29 | — | — | EP | disclosed |
| EP-0017883-A1 | Sulphur-containing diisocyanates, a process for their preparation and their use as synthesis components to prepare polyurethanes | BAYER AG (DE) | 1980-10-29 | — | — | EP | disclosed |
| US-3954718-A | Process for preparing polymers containing carbamoyl-hydroxamate groups and the resultant polymers | STANFORD RESEARCH INSTITUTE (US) | 1976-05-04 | — | — | US | disclosed |