SCHEMBL3106739

SCHEMBL3106739

CO[Si](CCNS(=O)(=O)CCc1ccccc1)(OC)OC

nearest known ligand 0.52

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
NPC1 O15118 2/20 0.52
RAB9A P51151 2/20 0.52
L3MBTL1 Q9Y468 1/20 0.48
MMP8 P22894 4/20 0.48
MMP12 P39900 4/20 0.48
MMP13 P45452 4/20 0.48
MMP1 P03956 1/20 0.48
MMP7 P09237 1/20 0.48
MEN1 O00255 1/20 0.48
KMT2A Q03164 1/20 0.48
POLB P06746 2/20 0.46
ALDH1A1 P00352 1/20 0.46
IDO1 P14902 1/20 0.45
CA12 O43570 1/20 0.43
CA7 P43166 1/20 0.43
CA9 Q16790 1/20 0.43
CA14 Q9ULX7 1/20 0.43
GLO1 Q04760 1/20 0.42
TXNRD1 Q16881 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3099806 0.86 ALDH1A1 (0.52) NPC1RAB9AMMP8MMP13MMP1
SCHEMBL3102149 0.86 MEN1 (0.49) NPC1RAB9AL3MBTL1MMP8MMP12
SCHEMBL15754219 0.79 L3MBTL1 (0.64) NPC1RAB9AL3MBTL1MMP8MMP12
SCHEMBL8907383 0.78 MEN1 (0.60) NPC1RAB9AL3MBTL1MMP8MMP12
SCHEMBL3103504 0.78 ALDH1A1 (0.57) NPC1RAB9AMMP8MMP13MMP1
SCHEMBL17077606 0.75 MAPK1 (0.59) POLBALDH1A1
SCHEMBL16701716 0.75 MMP8 (0.49) NPC1RAB9AL3MBTL1MMP8MMP12
SCHEMBL9002519 0.74 MMP8 (0.59) NPC1RAB9AL3MBTL1MMP8MMP12
SCHEMBL3836194 0.74 MMP8 (0.58) L3MBTL1MMP8MMP12MMP13MMP1
SCHEMBL106416 0.73 TDP1 (0.46) NPC1RAB9AALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9170492-B2 Silicon-containing film-forming composition, silicon-containing film, and pattern forming method JSR CORPORATION (JP) 2015-10-27 US disclosed
US-9140985-B2 2015-09-22 US disclosed
US-20100233632-A1 SILICON-CONTAINING FILM-FORMING COMPOSITION, SILICON-CONTAINING FILM, AND PATTERN FORMING METHOD JSR CORPORATION (JP) 2010-09-16 US disclosed