SCHEMBL31329331

SCHEMBL31329331

Cc1cc(O)c(O)cc1-c1cc(C)c(-c2cc(O)c(O)cc2C)c(O)c1O

nearest known ligand 0.45

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
GAA P10253 2/20 0.45
KDM4E B2RXH2 4/20 0.43
MAPT P10636 4/20 0.43
G6PD P11413 2/20 0.43
MAPK1 P28482 2/20 0.43
ALDH1A1 P00352 2/20 0.43
HPGD P15428 2/20 0.43
CYP1A2 P05177 1/20 0.43
CYP3A4 P08684 1/20 0.43
CYP2D6 P10635 1/20 0.43
CYP2C9 P11712 1/20 0.43
PKM P14618 1/20 0.43
ALOX15 P16050 1/20 0.43
ALOX12 P18054 1/20 0.43
CYP2C19 P33261 1/20 0.43
CCR6 P51684 1/20 0.43
HIF1A Q16665 1/20 0.43
NPSR1 Q6W5P4 1/20 0.43
HSD17B10 Q99714 1/20 0.43
RECQL P46063 2/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5532932 0.92 KDM4E (0.48) GAAKDM4EMAPTG6PDMAPK1
SCHEMBL18941006 0.79 CA1 (0.39) GAAKDM4EMAPTG6PDMAPK1
SCHEMBL7524739 0.76 HSP90AA1 (0.38) KDM4EMAPTMCL1MEN1KMT2A
SCHEMBL758291 0.75 KDM4E (0.48) GAAKDM4EMAPTG6PDMAPK1
SCHEMBL8894430 0.72 KDM4E (0.50) GAAKDM4EMAPTG6PDMAPK1
SCHEMBL4388616 0.71 KDM4E (0.68) GAAKDM4EMAPTG6PDMAPK1
SCHEMBL30693660 0.71 KDM4E (0.68) GAAKDM4EMAPTG6PDMAPK1
SCHEMBL7522981 0.71 CA1 (0.36) GAAKDM4EMAPTALDH1A1HPGD
SCHEMBL4363656 0.70 ALDH1A1 (0.52) GAAKDM4EMAPTG6PDMAPK1
SCHEMBL9174513 0.69 KDM4E (0.46) GAAKDM4EMAPTG6PDMAPK1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2025041685-A1 PHOTOSENSITIVE RESIN COMPOSITION FOR PRODUCING PLATED MOLDED ARTICLE, METHOD FOR PRODUCING RESIST PATTERN FILM, AND METHOD FOR PRODUCING PLATED MOLDED ARTICLE JSR株式会社 2025-02-27 WO disclosed
WO-2025041686-A1 PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING RESIST PATTERN FILM, AND METHOD FOR PRODUCING PLATED SHAPED ARTICLE JSR株式会社 2025-02-27 WO disclosed