Predicted protein targets (top 7)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | APP | P05067 | 1/20 | 0.46 |
| ▸ | PTGS1 | P23219 | 1/20 | 0.38 |
| ▸ | PDE4A | P27815 | 1/20 | 0.38 |
| ▸ | LMNA | P02545 | 1/20 | 0.38 |
| ▸ | SLC6A6 | P31641 | 1/20 | 0.38 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.38 |
| ▸ | BLM | P54132 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3144107 | 0.92 | APP (0.44) | APPPTGS1PDE4ALMNASLC6A6 | |
| SCHEMBL3128440 | 0.83 | PTGS1 (0.41) | APPPTGS1PDE4ALMNASLC6A6 | |
| SCHEMBL31303493 | 0.74 | APP (0.46) | APPPTGS1PDE4ALMNASLC6A6 | |
| SCHEMBL3134278 | 0.74 | APP (0.46) | APPPTGS1PDE4ALMNASLC6A6 | |
| SCHEMBL8620435 | 0.74 | APP (0.46) | APPPTGS1PDE4ALMNASLC6A6 | |
| SCHEMBL3134376 | 0.74 | APP (0.46) | APPPTGS1PDE4ALMNASLC6A6 | |
| SCHEMBL216634 | 0.74 | APP (0.46) | APPPTGS1PDE4ALMNASLC6A6 | |
| SCHEMBL35183 | 0.73 | APP (0.65) | APPPTGS1PDE4ALMNASLC6A6 | |
| Eprodisate SCHEMBL34216 | 0.73 | APP (0.65) | APPPTGS1PDE4ALMNASLC6A6 | |
| Ammonia Solution, Strong SCHEMBL19811951 | 0.72 | APP (0.44) | APPPTGS1PDE4ALMNASLC6A6 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20250020997-A1 | PHOTORESIST COMPOSITIONS AND METHODS OF MANUFACTURING INTEGRATED CIRCUIT DEVICES USING THE SAME | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2025-01-16 | — | — | US | disclosed |
| US-20230176481-A1 | FILM-FORMING COMPOSITION | NISSAN CHEMICAL CORPORATION (JP) | 2023-06-08 | — | — | US | disclosed |
| EP-1676835-B1 | PROCESS FOR PRODUCING TRIARYLSULFONIUM SALT | WAKO PURE CHEM IND LTD (JP) | 2014-12-10 | — | — | EP | disclosed |
| US-8669375-B2 | Process for producing ester compound | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 2014-03-11 | — | — | US | disclosed |
| US-20130066070-A1 | PROCESS FOR PRODUCING ESTER COMPOUND | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 2013-03-14 | — | — | US | disclosed |
| US-8318964-B2 | Process for producing ester compound | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 2012-11-27 | — | — | US | disclosed |
| US-20100324314-A1 | PROCESS FOR PRODUCING ESTER COMPOUND | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 2010-12-23 | — | — | US | disclosed |
| EP-1953149-B1 | A heterocycle-containing onium salt | WAKO PURE CHEM IND LTD (JP) | 2010-10-06 | — | — | EP | disclosed |
| US-7642368-B2 | for use as acid generator in semiconductor manufacture; triarylsulfonium salt having a structure that only one aromatic ring of three is different, in a high yield and by-product inhibition; reacting a diaryl sulfoxide with an aryl Grignard reagent in presence of chlorotrialkylsilane and strong acid | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 2010-01-05 | — | — | US | disclosed |
| EP-1690685-B1 | Planographic printing plate precursor | FUJIFILM CORP (JP) | 2009-04-15 | — | — | EP | disclosed |
| EP-1481973-B1 | HETEROCYCLE-BEARING ONIUM SALTS | WAKO PURE CHEM IND LTD (JP) | 2008-12-31 | — | — | EP | disclosed |
| EP-1953149-A2 | A heterocycle-containing onium salt | Wako Pure Chemical Industries, Ltd. (JP) | 2008-08-06 | — | — | EP | disclosed |
| US-7318991-B2 | Diphenylsulfonium compounds in which the S atom is additionally attached to a xanthene-9-onyl-2-yl- or coumarin-7-yl- ring; acid generator for a chemically amplified resist; photopolymerization initiator for polymerizing an epoxide or a vinyl ether | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 2008-01-15 | — | — | US | disclosed |
| US-20070083060-A1 | for use as acid generator in semiconductor manufacture; triarylsulfonium salt having a structure that only one aromatic ring of three is different, in a high yield and by-product inhibition; reacting a diaryl sulfoxide with an aryl Grignard reagent in presence of chlorotrialkylsilane and strong acid | FUJIFILM WAKO PURE CHEMICAL CORPORATION (JP) | 2007-04-12 | — | — | US | disclosed |
| EP-1690685-A2 | Planographic printing plate precursor | FUJI PHOTO FILM CO., LTD. (JP) | 2006-08-16 | — | — | EP | disclosed |
| EP-1676835-A1 | PROCESS FOR PRODUCING TRIARYLSULFONIUM SALT | Wako Pure Chemical Industries, Ltd. (JP) | 2006-07-05 | — | — | EP | disclosed |
| US-20050233253-A1 | Diphenylsulfonium compounds in which the S atom is additionally attached to a xanthene-9-onyl-2-yl- or coumarin-7-yl- ring; acid generator for a chemically amplified resist; photopolymerization initiator for polymerizing an epoxide or a vinyl ether | WAKO PURE CHEMICAL INDUSTRIES, LTD (JP) | 2005-10-20 | — | — | US | disclosed |
| EP-1481973-A1 | HETEROCYCLE-BEARING ONIUM SALTS | Wako Pure Chemical Industries, Ltd. (JP) | 2004-12-01 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20130066070-A1 | PROCESS FOR PRODUCING ESTER COMPOUND | ADH1C, ADH5, ADH1A | APP 1393/4885PTGS1 2832/4885PDE4A 4386/4885 |
| US-20070083060-A1 | for use as acid generator in semiconductor manufacture; triarylsulfonium salt having a structure that only one aromatic ring of three is different, in a high yield and by-product inhibition; reacting a diaryl sulfoxide with an aryl Grignard reagent in presence of chlorotrialkylsilane and strong acid | ARSA, HAO2, HAO1 | APP 4668/4885PTGS1 561/4885PDE4A 4381/4885 |
| US-20050233253-A1 | Diphenylsulfonium compounds in which the S atom is additionally attached to a xanthene-9-onyl-2-yl- or coumarin-7-yl- ring; acid generator for a chemically amplified resist; photopolymerization initiator for polymerizing an epoxide or a vinyl ether | NOX4, CBR1, CBR3 | APP 4758/4885PTGS1 1559/4885PDE4A 4703/4885 |
| US-20100324314-A1 | PROCESS FOR PRODUCING ESTER COMPOUND | ADH1C, ADH5, ADH1A | APP 1341/4885PTGS1 2829/4885PDE4A 4359/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.