SCHEMBL3135083

SCHEMBL3135083

Cc1ccc(S(=O)(=O)OS(c2ccccc2)(c2ccc(O)cc2)c2ccc(O)cc2)cc1

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 3/20 0.44
KMT2A Q03164 3/20 0.44
VDR P11473 1/20 0.43
HTT P42858 1/20 0.42
SMN1; SMN2 Q16637 1/20 0.42
ESR1 P03372 3/20 0.42
GAA P10253 2/20 0.42
ESR2 Q92731 1/20 0.42
ACHE P22303 2/20 0.42
BCHE P06276 1/20 0.41
LMNA P02545 2/20 0.40
MAPK1 P28482 1/20 0.40
KEAP1 Q14145 1/20 0.40
NFE2L2 Q16236 1/20 0.40
CA12 O43570 1/20 0.40
CA1 P00915 1/20 0.40
CA2 P00918 1/20 0.40
CA9 Q16790 1/20 0.40
ENPP2 Q13822 1/20 0.40
RECQL P46063 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8862178 0.93 MEN1 (0.49) MEN1KMT2AVDRHTTESR1
SCHEMBL64190 0.92 VDR (0.49) MEN1KMT2AVDRHTTSMN1; SMN2
SCHEMBL3144536 0.92 VDR (0.49) MEN1KMT2AVDRHTTSMN1; SMN2
SCHEMBL2962485 0.92 VDR (0.49) MEN1KMT2AVDRHTTSMN1; SMN2
SCHEMBL2964106 0.92 VDR (0.49) MEN1KMT2AVDRHTTSMN1; SMN2
SCHEMBL15676270 0.92 ESR1 (0.46) MEN1KMT2ASMN1; SMN2ESR1GAA
SCHEMBL2955938 0.92 VDR (0.49) MEN1KMT2AVDRHTTSMN1; SMN2
SCHEMBL21072819 0.84 ACHE (0.54) MEN1KMT2AHTTESR1GAA
SCHEMBL2966008 0.84 GAA (0.52) MEN1KMT2AVDRHTTSMN1; SMN2
SCHEMBL3137415 0.84 KMT2A (0.46) MEN1KMT2AVDRHTTSMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1676835-B1 PROCESS FOR PRODUCING TRIARYLSULFONIUM SALT WAKO PURE CHEM IND LTD (JP) 2014-12-10 EP disclosed
US-7642368-B2 for use as acid generator in semiconductor manufacture; triarylsulfonium salt having a structure that only one aromatic ring of three is different, in a high yield and by-product inhibition; reacting a diaryl sulfoxide with an aryl Grignard reagent in presence of chlorotrialkylsilane and strong acid WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) 2010-01-05 US disclosed
EP-1676835-A1 PROCESS FOR PRODUCING TRIARYLSULFONIUM SALT Wako Pure Chemical Industries, Ltd. (JP) 2006-07-05 EP disclosed
US-5679496-A CONTAINING SULFONIUM SALT HAVING TERT-BUTOXYCARBONYLMETHOXY GROUP(S) AS ACID LABILE GROUPS; SENSITIVITY, RESOLUTION, ETCH AND HEAT RESISTANCE SHIN-ETSU CHEMICAL CO., LTD. (JP) 1997-10-21 US disclosed