SCHEMBL3136264

SCHEMBL3136264

CC(C)c1cc(C(C)C)cc(S(=O)(=O)O)c1

nearest known ligand 0.57

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
FABP3 P05413 2/20 0.57
FABP4 P15090 2/20 0.57
FABP5 Q01469 1/20 0.57
LCK P06239 1/20 0.41
FYN P06241 1/20 0.41
LMNA P02545 2/20 0.41
ING2 Q9H160 1/20 0.40
ALDH1A1 P00352 6/20 0.39
TSHR P16473 3/20 0.39
NT5E P21589 2/20 0.39
SMN1; SMN2 Q16637 1/20 0.37
GABRA1 P14867 1/20 0.35
GABRB2 P47870 1/20 0.35
PGR P06401 1/20 0.35
HSD17B10 Q99714 3/20 0.34
TDP1 Q9NUW8 1/20 0.34
CA12 O43570 1/20 0.33
CA1 P00915 1/20 0.33
CA2 P00918 1/20 0.33
CA9 Q16790 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6733288 0.98 FABP3 (0.55) FABP3FABP4FABP5LCKFYN
SCHEMBL12014092 0.95 FABP3 (0.57) FABP3FABP4FABP5LCKFYN
SCHEMBL11799151 0.87 FABP3 (0.50) FABP3FABP4FABP5LCKFYN
SCHEMBL12014163 0.87 FABP3 (0.50) FABP3FABP4FABP5LCKFYN
Sulfuric Acid SCHEMBL30910258 0.85 FABP4 (0.60) FABP3FABP4FABP5LMNAALDH1A1
SCHEMBL20751961 0.82 FABP3 (0.46) FABP3FABP4FABP5LCKFYN
SCHEMBL16923056 0.81 FABP3 (0.44) FABP3FABP4FABP5LCKFYN
SCHEMBL11042085 0.80 FABP4 (0.45) FABP3FABP4FABP5LMNAALDH1A1
SCHEMBL6903766 0.80 FABP4 (0.56) FABP3FABP4FABP5LMNAALDH1A1
SCHEMBL15496497 0.80 FABP3 (0.43) FABP3FABP4FABP5LCKFYN

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 41 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-116234794-B Low reactivity hydrocarbon dispersants in aqueous polymerization of fluoropolymers THE CHEMOURS COMPANY FC, LLC (US) 2026-05-26 CN disclosed
EP-4222141-B1 LOW REACTIVITY HYDROCARBON DISPERSING AGENTS IN THE AQUEOUS POLYMERIZATION OF FLUOROPOLYMERS CHEMOURS CO FC LLC (US) 2025-08-06 EP disclosed
US-20250020997-A1 PHOTORESIST COMPOSITIONS AND METHODS OF MANUFACTURING INTEGRATED CIRCUIT DEVICES USING THE SAME SAMSUNG ELECTRONICS CO., LTD. (KR) 2025-01-16 US disclosed
CN-117624033-A Ligand compound, iron/nickel complex, catalyst, preparation method and application thereof 中国科学技术大学 2024-03-01 CN disclosed
US-20240002553-A1 EMPLOYING LOW REACTIVITY HYDROCARBON DISPERSING AGENT IN AQUEOUS POLYMERIZATION OF FLUOROPOLYMERS THE CHEMOURS COMPANY FC, LLC (US) 2024-01-04 US disclosed
EP-4222141-A1 LOW REACTIVITY HYDROCARBON DISPERSING AGENTS IN THE AQUEOUS POLYMERIZATION OF FLUOROPOLYMERS The Chemours Company FC, LLC (US) 2023-08-09 EP disclosed
US-20230176481-A1 FILM-FORMING COMPOSITION NISSAN CHEMICAL CORPORATION (JP) 2023-06-08 US disclosed
CN-116234794-A Low reactivity hydrocarbon dispersants in aqueous polymerization of fluoropolymers 科慕埃弗西有限公司 2023-06-06 CN disclosed
CN-115398342-A Film-forming composition 日产化学株式会社 2022-11-25 CN disclosed
WO-2022072693-A1 LOW REACTIVITY HYDROCARBON DISPERSING AGENTS IN THE AQUEOUS POLYMERIZATION OF FLUOROPOLYMERS THE CHEMOURS COMPANY FC, LLC (US) 2022-04-07 WO disclosed
EP-1690685-B1 Planographic printing plate precursor FUJIFILM CORP (JP) 2009-04-15 EP disclosed
EP-1481973-B1 HETEROCYCLE-BEARING ONIUM SALTS WAKO PURE CHEM IND LTD (JP) 2008-12-31 EP disclosed
EP-1953149-A2 A heterocycle-containing onium salt Wako Pure Chemical Industries, Ltd. (JP) 2008-08-06 EP disclosed
US-20080161520-A1 Heterocycle-bearing onium salts WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) 2008-07-03 US disclosed
US-7318991-B2 Diphenylsulfonium compounds in which the S atom is additionally attached to a xanthene-9-onyl-2-yl- or coumarin-7-yl- ring; acid generator for a chemically amplified resist; photopolymerization initiator for polymerizing an epoxide or a vinyl ether WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) 2008-01-15 US disclosed
US-20070083060-A1 for use as acid generator in semiconductor manufacture; triarylsulfonium salt having a structure that only one aromatic ring of three is different, in a high yield and by-product inhibition; reacting a diaryl sulfoxide with an aryl Grignard reagent in presence of chlorotrialkylsilane and strong acid FUJIFILM WAKO PURE CHEMICAL CORPORATION (JP) 2007-04-12 US disclosed
EP-1690685-A2 Planographic printing plate precursor FUJI PHOTO FILM CO., LTD. (JP) 2006-08-16 EP disclosed
EP-1676835-A1 PROCESS FOR PRODUCING TRIARYLSULFONIUM SALT Wako Pure Chemical Industries, Ltd. (JP) 2006-07-05 EP disclosed
US-20050233253-A1 Diphenylsulfonium compounds in which the S atom is additionally attached to a xanthene-9-onyl-2-yl- or coumarin-7-yl- ring; acid generator for a chemically amplified resist; photopolymerization initiator for polymerizing an epoxide or a vinyl ether WAKO PURE CHEMICAL INDUSTRIES, LTD (JP) 2005-10-20 US disclosed
EP-1481973-A1 HETEROCYCLE-BEARING ONIUM SALTS Wako Pure Chemical Industries, Ltd. (JP) 2004-12-01 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20070083060-A1 for use as acid generator in semiconductor manufacture; triarylsulfonium salt having a structure that only one aromatic ring of three is different, in a high yield and by-product inhibition; reacting a diaryl sulfoxide with an aryl Grignard reagent in presence of chlorotrialkylsilane and strong acid ARSA, HAO2, HAO1 FABP3 4535/4885FABP4 4596/4885FABP5 4178/4885
US-20050233253-A1 Diphenylsulfonium compounds in which the S atom is additionally attached to a xanthene-9-onyl-2-yl- or coumarin-7-yl- ring; acid generator for a chemically amplified resist; photopolymerization initiator for polymerizing an epoxide or a vinyl ether NOX4, CBR1, CBR3 FABP3 4793/4885FABP4 4661/4885FABP5 4592/4885
US-20240002553-A1 EMPLOYING LOW REACTIVITY HYDROCARBON DISPERSING AGENT IN AQUEOUS POLYMERIZATION OF FLUOROPOLYMERS FPR1, NAF1, SIGMAR1 FABP3 3809/4885FABP4 3307/4885FABP5 2576/4885
US-20080161520-A1 Heterocycle-bearing onium salts MCM5, NIT2, PCNA FABP3 4866/4885FABP4 4624/4885FABP5 4178/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.