SCHEMBL3136672

SCHEMBL3136672

Cc1ccc(S(=O)(=O)OS(c2ccccc2)(c2ccccc2)c2cccc(C)c2)cc1

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HTT P42858 2/20 0.44
TDP1 Q9NUW8 1/20 0.44
L3MBTL1 Q9Y468 1/20 0.44
BCHE P06276 1/20 0.43
ACHE P22303 1/20 0.43
KMT2A Q03164 4/20 0.42
MEN1 O00255 3/20 0.42
VDR P11473 1/20 0.42
SMN1; SMN2 Q16637 1/20 0.41
ALDH1A1 P00352 1/20 0.41
MMP2 P08253 1/20 0.40
GAA P10253 2/20 0.40
KEAP1 Q14145 1/20 0.39
NFE2L2 Q16236 1/20 0.39
CA12 O43570 2/20 0.39
CA9 Q16790 2/20 0.39
C5AR1 P21730 1/20 0.39
CA1 P00915 1/20 0.39
CA2 P00918 1/20 0.39
ESR1 P03372 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2962485 0.90 VDR (0.49) HTTTDP1L3MBTL1BCHEACHE
SCHEMBL2955938 0.90 VDR (0.49) HTTTDP1L3MBTL1BCHEACHE
SCHEMBL64190 0.90 VDR (0.49) HTTTDP1L3MBTL1BCHEACHE
SCHEMBL2964106 0.90 VDR (0.49) HTTTDP1L3MBTL1BCHEACHE
SCHEMBL3144536 0.90 VDR (0.49) HTTTDP1L3MBTL1BCHEACHE
SCHEMBL3141444 0.86 BCHE (0.42) HTTL3MBTL1BCHEACHEKMT2A
SCHEMBL3141175 0.85 FFAR4 (0.47) HTTBCHEACHESMN1; SMN2KEAP1
SCHEMBL8920104 0.85 HTT (0.44) HTTTDP1L3MBTL1BCHEACHE
SCHEMBL2966008 0.83 GAA (0.52) HTTTDP1L3MBTL1KMT2AMEN1
SCHEMBL3137415 0.83 KMT2A (0.46) HTTBCHEACHEKMT2AMEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1676835-B1 PROCESS FOR PRODUCING TRIARYLSULFONIUM SALT WAKO PURE CHEM IND LTD (JP) 2014-12-10 EP disclosed
US-7642368-B2 for use as acid generator in semiconductor manufacture; triarylsulfonium salt having a structure that only one aromatic ring of three is different, in a high yield and by-product inhibition; reacting a diaryl sulfoxide with an aryl Grignard reagent in presence of chlorotrialkylsilane and strong acid WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) 2010-01-05 US disclosed
EP-1676835-A1 PROCESS FOR PRODUCING TRIARYLSULFONIUM SALT Wako Pure Chemical Industries, Ltd. (JP) 2006-07-05 EP disclosed
US-6723483-B1 Sulfonium salt compounds WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) 2004-04-20 US disclosed
EP-1113005-B1 Sulfonium salt compounds WAKO PURE CHEM IND LTD (JP) 2003-08-06 EP disclosed
EP-1238969-A2 Sulfonium salt compounds Wako Pure Chemical Industries, Ltd. (JP) 2002-09-11 EP disclosed
EP-1113005-A1 Sulfonium salt compounds Wako Pure Chemical Industries, Ltd. (JP) 2001-07-04 EP disclosed