Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 2/20 | 0.48 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.46 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.45 |
| ▸ | MAPT | P10636 | 3/20 | 0.45 |
| ▸ | KMT2A | Q03164 | 4/20 | 0.43 |
| ▸ | MEN1 | O00255 | 3/20 | 0.43 |
| ▸ | CHRM2 | P08172 | 1/20 | 0.43 |
| ▸ | HPGD | P15428 | 2/20 | 0.40 |
| ▸ | GAA | P10253 | 1/20 | 0.40 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.40 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.40 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.40 |
| ▸ | SLC6A2 | P23975 | 1/20 | 0.39 |
| ▸ | SLC6A4 | P31645 | 1/20 | 0.39 |
| ▸ | SLC6A3 | Q01959 | 1/20 | 0.39 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.38 |
| ▸ | IAPP | P10997 | 1/20 | 0.38 |
| ▸ | MMP2 | P08253 | 1/20 | 0.38 |
| ▸ | MMP9 | P14780 | 1/20 | 0.38 |
| ▸ | MMP12 | P39900 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Naphthalene SCHEMBL28357626 | 0.94 | LMNA (0.44) | LMNAL3MBTL1ALDH1A1MAPTKMT2A | |
| Chlorobenzene SCHEMBL28322357 | 0.90 | MAPT (0.43) | LMNAL3MBTL1ALDH1A1MAPTKMT2A | |
| Bromobenzene SCHEMBL28354245 | 0.90 | L3MBTL1 (0.43) | LMNAL3MBTL1ALDH1A1MAPTKMT2A | |
| SCHEMBL1146046 | 0.84 | CYP2C9 (0.56) | LMNAL3MBTL1ALDH1A1MAPTKMT2A | |
| SCHEMBL7495159 | 0.83 | CHRM2 (0.46) | LMNAL3MBTL1ALDH1A1MAPTKMT2A | |
| SCHEMBL1569021 | 0.82 | LMNA (0.47) | LMNAL3MBTL1ALDH1A1MAPTKMT2A | |
| SCHEMBL28549256 | 0.82 | L3MBTL1 (0.45) | LMNAL3MBTL1ALDH1A1MAPTKMT2A | |
| SCHEMBL8697987 | 0.81 | ALDH1A1 (0.51) | LMNAL3MBTL1ALDH1A1MAPTKMT2A | |
| SCHEMBL6805430 | 0.80 | L3MBTL1 (0.57) | LMNAL3MBTL1ALDH1A1MAPTGAA | |
| SCHEMBL9430367 | 0.79 | LMNA (0.51) | LMNAL3MBTL1ALDH1A1MAPTKMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 22 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2025058368-A1 | PHOTOSENSITIVE RESIN COMPOSITION, INSULATION FILM, AND SEMICONDUCTOR DEVICE | 주식회사 엘지화학 | 2025-03-20 | — | — | WO | disclosed |
| CN-110903319-B | Preparation method of 2-phosphonothioflavonoid compound | 信阳农林学院 | 2022-06-14 | — | — | CN | disclosed |
| US-20220179316-A1 | POLYIMIDE RESIN, POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, INSULATING FILM AND SEMICONDUCTOR DEVICE | LG CHEM, LTD. (KR) | 2022-06-09 | — | — | US | disclosed |
| CN-110903319-A | Preparation method of 2-phosphonothioflavonoid compound | 信阳农林学院 | 2020-03-24 | — | — | CN | disclosed |
| CN-106661031-B | Pyrrolopyrimidine compounds or its salt, pharmaceutical composition and application containing it | 大鹏药品工业株式会社 | 2019-07-23 | — | — | CN | disclosed |
| US-9766545-B2 | Methods for small trench patterning using chemical amplified photoresist compositions | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2017-09-19 | — | — | US | disclosed |
| US-20150331324-A1 | Methods for Small Trench Patterning Using Chemical Amplified Photoresist Compositions | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2015-11-19 | — | — | US | disclosed |
| US-9093276-B2 | Methods for small trench patterning using chemical amplified photoresist compositions | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2015-07-28 | — | — | US | disclosed |
| US-20140065552-A1 | Methods For Small Trench Patterning Using Chemical Amplified Photoresist Compositions | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2014-03-06 | — | — | US | disclosed |
| US-8592137-B2 | Methods for small trench patterning using chemical amplified photoresist compositions | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2013-11-26 | — | — | US | disclosed |
| US-20100079547-A1 | INKJET PRINTHEAD AND METHOD OF MANUFACTURING THE SAME | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2010-04-01 | — | — | US | disclosed |
| EP-1077391-B1 | Onium salts, photoacid generators for resist compositions, and patterning process | SHINETSU CHEMICAL CO (JP) | 2006-09-27 | — | — | EP | disclosed |
| US-6653044-B2 | Addition copolymer | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2003-11-25 | — | — | US | disclosed |
| US-6440634-B1 | MICROFABRICATION OF INTEGRATED CIRCUITS, DEEP UV LITHOGRAPHY; PHENYLSULFONATE SALTS OF SULFONIUM OR IODINIUM CATIONS | SHIN-ETSU CHEMICAL CO., LTD (JP) | 2002-08-27 | — | — | US | disclosed |
| US-6416928-B1 | HALOGENONIUM OR SULFONIUM SALTS OF SULFONATED DIPHENYLALKANE | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2002-07-09 | — | — | US | disclosed |
| US-6395446-B1 | CONTAINING SULFONYLDIAZOMETHANE COMPOUND AS ACID GENERATOR | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2002-05-28 | — | — | US | disclosed |
| US-6338931-B1 | PHOTOACID GENERATOR OF SULFONYLDIAZOMETHANE COMPOUND | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2002-01-15 | — | — | US | disclosed |
| US-20010036593-A1 | Chemical amplification type resist composition | SHIN-ETSU CHEMICAL CO., LTD. | 2001-11-01 | — | — | US | disclosed |
| EP-1117003-A1 | Chemical amplification type resist composition | Shin-Etsu Chemical Co., Ltd. (JP) | 2001-07-18 | — | — | EP | disclosed |
| EP-1077391-A1 | Onium salts, photoacid generators for resist compositions, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2001-02-21 | — | — | EP | disclosed |