SCHEMBL3139635

SCHEMBL3139635

CCCCC(c1ccccc1)S(=O)(=O)O

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
SRC P12931 1/20 0.47
POLB P06746 2/20 0.46
NAAA Q02083 2/20 0.43
MMP1 P03956 4/20 0.42
MMP7 P09237 3/20 0.42
MMP12 P39900 3/20 0.42
MMP13 P45452 3/20 0.42
ACE P12821 2/20 0.42
ALDH1A1 P00352 4/20 0.42
KDM4E B2RXH2 2/20 0.42
MME P08473 1/20 0.42
MAPT P10636 2/20 0.41
KMT2A Q03164 2/20 0.41
GMNN O75496 1/20 0.41
LMNA P02545 1/20 0.41
HPGD P15428 1/20 0.41
PMP22 Q01453 1/20 0.41
NPSR1 Q6W5P4 1/20 0.41
TDP1 Q9NUW8 1/20 0.41
CNR2 P34972 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8025012 0.98 SRC (0.46) SRCPOLBNAAAMMP1MMP7
SCHEMBL3144320 0.95 TP53 (0.46) SRCPOLBNAAAMMP12ALDH1A1
SCHEMBL9809203 0.93 NAAA (0.48) SRCPOLBNAAAALDH1A1
SCHEMBL3616787 0.93 NAAA (0.48) SRCPOLBNAAAALDH1A1
SCHEMBL7784175 0.93 NAAA (0.48) SRCPOLBNAAAALDH1A1
SCHEMBL5701092 0.93 NAAA (0.48) SRCPOLBNAAAALDH1A1
SCHEMBL6117900 0.93 NAAA (0.48) SRCPOLBNAAAALDH1A1
SCHEMBL7787199 0.93 NAAA (0.48) SRCPOLBNAAAALDH1A1
SCHEMBL3127159 0.93 NAAA (0.48) SRCPOLBNAAAALDH1A1
SCHEMBL57427 0.93 NAAA (0.48) SRCPOLBNAAAALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 34 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3526274-B1 CATALYST SYSTEM EPC ENGINEERING & TECH GMBH (DE) 2022-08-03 EP claimed
US-20250020997-A1 PHOTORESIST COMPOSITIONS AND METHODS OF MANUFACTURING INTEGRATED CIRCUIT DEVICES USING THE SAME SAMSUNG ELECTRONICS CO., LTD. (KR) 2025-01-16 US disclosed
EP-3526274-B1 CATALYST SYSTEM EPC ENGINEERING & TECH GMBH (DE) 2022-08-03 EP disclosed
CN-106893546-A For optically transparent liquid adhesive(LOCA)Acrylate ended carbamate polybutadiene 赢创德固赛有限公司 2017-06-27 CN disclosed
EP-1676835-B1 PROCESS FOR PRODUCING TRIARYLSULFONIUM SALT WAKO PURE CHEM IND LTD (JP) 2014-12-10 EP disclosed
US-8669375-B2 Process for producing ester compound WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) 2014-03-11 US disclosed
US-20130066070-A1 PROCESS FOR PRODUCING ESTER COMPOUND WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) 2013-03-14 US disclosed
US-8318964-B2 Process for producing ester compound WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) 2012-11-27 US disclosed
US-20100324314-A1 PROCESS FOR PRODUCING ESTER COMPOUND WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) 2010-12-23 US disclosed
US-7833691-B2 Heterocycle-bearing onium salts WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) 2010-11-16 US disclosed
US-20050233253-A1 Diphenylsulfonium compounds in which the S atom is additionally attached to a xanthene-9-onyl-2-yl- or coumarin-7-yl- ring; acid generator for a chemically amplified resist; photopolymerization initiator for polymerizing an epoxide or a vinyl ether WAKO PURE CHEMICAL INDUSTRIES, LTD (JP) 2005-10-20 US disclosed
EP-1548002-A1 PROCESS FOR PRODUCING AMINOALKYLSULFONIC ACID AND METHOD OF SALT EXCHANGE FOR SALT THEREOF Wako Pure Chemical Industries, Ltd. (JP) 2005-06-29 EP disclosed
US-20050020710-A1 Hybrid onium salt WAKO PURE CHEMICALS INDUSTRIES, LTD. (JP) 2005-01-27 US disclosed
EP-1481973-A1 HETEROCYCLE-BEARING ONIUM SALTS Wako Pure Chemical Industries, Ltd. (JP) 2004-12-01 EP disclosed
EP-1472302-A2 POLYCARBONATE RESIN COMPOSITION FOR OPTICAL APPLICATIONS AND METHODS FOR MANUFACTURE THEREOF GENERAL ELECTRIC COMPANY (US) 2004-11-03 EP disclosed
EP-1443042-A1 HYBRID ONIUM SALT Wako Pure Chemical Industries, Ltd. (JP) 2004-08-04 EP disclosed
EP-1393708-A1 METHOD OF TREATING HAIR Kao Corporation (JP) 2004-03-03 EP disclosed
US-20040011373-A1 Method of treating hair KAO CORPORATION (JP) 2004-01-22 US disclosed
WO-2002046272-A2 POLYCARBONATE RESIN COMPOSITION FOR OPTICAL APPLICATIONS AND METHODS FOR MANUFACTURE THEREOF GENERAL ELECTRIC COMPANY (US) 2002-06-13 WO disclosed
US-4009085-A ELECTRODEPOSITION OF CHROMIUM OXIDE M & T CHEMICALS INC. (US) 1977-02-22 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20130066070-A1 PROCESS FOR PRODUCING ESTER COMPOUND ADH1C, ADH5, ADH1A SRC 2380/4885POLB 2382/4885NAAA 54/4885
US-20050233253-A1 Diphenylsulfonium compounds in which the S atom is additionally attached to a xanthene-9-onyl-2-yl- or coumarin-7-yl- ring; acid generator for a chemically amplified resist; photopolymerization initiator for polymerizing an epoxide or a vinyl ether NOX4, CBR1, CBR3 SRC 1020/4885POLB 922/4885NAAA 3665/4885
US-20100324314-A1 PROCESS FOR PRODUCING ESTER COMPOUND ADH1C, ADH5, ADH1A SRC 2958/4885POLB 2181/4885NAAA 55/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.