SCHEMBL3140622

SCHEMBL3140622

CCCc1ccccc1N(c1ccccc1)c1ccc(-c2ccc(N(c3ccccc3)c3ccccc3CCC)cc2)cc1

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 3/20 0.35
MAPT P10636 3/20 0.35
KDM4E B2RXH2 2/20 0.35
L3MBTL1 Q9Y468 2/20 0.35
CYP1A2 P05177 1/20 0.35
CYP3A4 P08684 1/20 0.35
CYP2D6 P10635 1/20 0.35
CYP2C9 P11712 1/20 0.35
CYP2C19 P33261 1/20 0.35
TDP1 Q9NUW8 1/20 0.35
TP53 P04637 1/20 0.35
HPGD P15428 3/20 0.35
SMN1; SMN2 Q16637 2/20 0.35
NPC1 O15118 1/20 0.35
PKM P14618 1/20 0.35
RAB9A P51151 1/20 0.35
HSD17B10 Q99714 1/20 0.35
LTB4R2 Q9NPC1 4/20 0.35
PPARA Q07869 1/20 0.33
TAAR1 Q96RJ0 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL20146680 0.96 HPGD (0.38) ALDH1A1MAPTKDM4EL3MBTL1HPGD
SCHEMBL24631166 0.93 TP53 (0.39) ALDH1A1MAPTKDM4EL3MBTL1CYP1A2
SCHEMBL3145597 0.90 LTB4R2 (0.39) CYP3A4CYP2D6CYP2C9HPGDLTB4R2
SCHEMBL13809371 0.88 POLB (0.33) ALDH1A1MAPTKDM4EHPGDSMN1; SMN2
SCHEMBL3145011 0.87 LIPG (0.46) ALDH1A1MAPTPPARA
SCHEMBL3144684 0.85 POLB (0.41) ALDH1A1MAPTKDM4EL3MBTL1CYP1A2
SCHEMBL27631640 0.84 CYP2C19 (0.39) ALDH1A1MAPTKDM4EL3MBTL1CYP2C19
SCHEMBL14840110 0.82 HTR1A (0.38) ALDH1A1KDM4EHPGDTAAR1ADRA2A
SCHEMBL806152 0.82 ALDH1A1 (0.39) ALDH1A1MAPTKDM4EL3MBTL1CYP1A2
SCHEMBL262880 0.82 GABRP (0.39) ALDH1A1MAPTKDM4EHPGDSMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 46 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7642028-B2 surface layers are a polymeric composition including a resin and a cyclic polymers such as polyethylene terephthalate, acrylic acid-ethylene copolymer, styrene-co-maleic anhydride copolymer; polyhexamethylene adipamide etc. and cyclic poly(bisphenol A carbonate), cyclic poly(bisphenol C carbonate) etc. XEROX CORPORATION (US) 2010-01-05 US claimed
US-20060210894-A1 Imaging members XEROX CORPORATION 2006-09-21 US claimed
EP-0486038-B1 Electrophotographic photoreceptor IDEMITSU KOSAN CO (JP) 1996-10-16 EP claimed
US-5213924-A Copolymers, improved mechanical strength, hardness IDEMITSU KOSAN CO. LTD. (JP) 1993-05-25 US claimed
EP-0709747-B1 Selection of developing bias voltage for use in electrophotographic method using photosensitive material KYOCERA MITA CORP (JP) 2006-03-22 EP disclosed
EP-0666519-B1 Image forming apparatus employing a reversal developing system KYOCERA MITA CORP (JP) 2005-11-30 EP disclosed
EP-0866382-B1 Electrophotographic photosensitive material KYOCERA MITA CORP (JP) 2004-06-23 EP disclosed
EP-0962458-B1 New naphthalenetetracarboxylic acid diimides as electron transporting agents in photosensitive material for electrophotography KYOCERA MITA CORP (JP) 2004-04-07 EP disclosed
US-6483998-B2 Electrostatic image-forming apparatus controlled to compensate for film thinning KYOCERA MITA CORPORATION (JP) 2002-11-19 US disclosed
US-20020021912-A1 Image-forming apparatus KYOCERA MITA CORPORATION (JP) 2002-02-21 US disclosed
EP-0864932-B1 Image processing unit KYOCERA MITA CORP (JP) 2001-12-05 EP disclosed
US-6174638-B1 EXCELLENT SOLUBILITY IN AN ORGANIC SOLVENT, EXCELLENT COMPATIBILITY WITH A RESIN BINDER AND EXCELLENT PHOTOSENSITIVITY; USEFUL AS AN ELECTRON-TRANSPORTING AGENT FOR THE PHOTOSENSITIVE MATERIAL FOR ELECTROPHOTOGRAPHY KYOCERA MITA CORPORATION (JP) 2001-01-16 US disclosed
EP-0690354-A2 Method for contact type development MITA INDUSTRIAL CO., LTD. (JP) 1996-01-03 EP disclosed
EP-0666519-A2 Image forming apparatus employing a reversal developing system MITA INDUSTRIAL CO. LTD. (JP) 1995-08-09 EP disclosed
US-5386279-A Electrostatics, electroconductive polyurethane, organic photosensitive material MITA INDUSTRIAL CO., LTD. (JP) 1995-01-31 US disclosed
EP-0632332-A1 Photosensitive material for electrophotography MITA INDUSTRIAL CO., LTD. (JP) 1995-01-04 EP disclosed
EP-0613067-A2 Transfer in an image-forming apparatus MITA INDUSTRIAL CO. LTD. (JP) 1994-08-31 EP disclosed
US-5213924-A Copolymers, improved mechanical strength, hardness IDEMITSU KOSAN CO. LTD. (JP) 1993-05-25 US disclosed
US-4985326-A PHOTOSENSITIVE LAYER CONTAINING A POLYCARBONATE AS BINDER RESIN IDEMITSU KOSAN CO., LTD. (JP) 1991-01-15 US disclosed
US-4314012-A Photoconductive reflex exposure member XEROX CORPORATION (US) 1982-02-02 US disclosed