SCHEMBL3145597

SCHEMBL3145597

CCCCc1ccccc1N(c1ccccc1)c1ccc(-c2ccc(N(c3ccccc3)c3ccccc3CCCC)cc2)cc1

nearest known ligand 0.41

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
LTB4R2 Q9NPC1 5/20 0.39
CYP3A4 P08684 1/20 0.39
CYP2D6 P10635 1/20 0.39
CYP2C9 P11712 1/20 0.39
LIPG Q9Y5X9 1/20 0.38
TLR8 Q9NR97 1/20 0.36
HSD11B1 P28845 1/20 0.36
RARB P10826 1/20 0.36
GAA P10253 1/20 0.35
HPGD P15428 1/20 0.35
PTPN1 P18031 1/20 0.35
ADORA3 P0DMS8 1/20 0.35
ALOX5 P09917 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3145011 0.94 LIPG (0.46) LIPGRARB
SCHEMBL5809365 0.93 CYP3A4 (0.42) CYP3A4CYP2D6CYP2C9LIPGTLR8
SCHEMBL513928 0.90 ADORA3 (0.38) LTB4R2CYP3A4CYP2D6CYP2C9LIPG
SCHEMBL3140622 0.90 ALDH1A1 (0.35) LTB4R2CYP3A4CYP2D6CYP2C9HPGD
SCHEMBL28041959 0.88 LIPG (0.49) LIPGTLR8ALOX5
SCHEMBL1996391 0.87 LTB4R2 (0.38) LTB4R2CYP3A4CYP2D6CYP2C9LIPG
SCHEMBL1261999 0.86 UCHL3 (0.37) CYP3A4CYP2D6CYP2C9LIPGTLR8
SCHEMBL7922788 0.86 LIPG (0.51) LIPGTLR8
SCHEMBL20146680 0.86 HPGD (0.38) GAAHPGDALOX5
SCHEMBL28160478 0.86 LIPG (0.51) LIPGTLR8

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 49 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7642028-B2 surface layers are a polymeric composition including a resin and a cyclic polymers such as polyethylene terephthalate, acrylic acid-ethylene copolymer, styrene-co-maleic anhydride copolymer; polyhexamethylene adipamide etc. and cyclic poly(bisphenol A carbonate), cyclic poly(bisphenol C carbonate) etc. XEROX CORPORATION (US) 2010-01-05 US claimed
US-20060210894-A1 Imaging members XEROX CORPORATION 2006-09-21 US claimed
EP-0486038-B1 Electrophotographic photoreceptor IDEMITSU KOSAN CO (JP) 1996-10-16 EP claimed
US-5213924-A Copolymers, improved mechanical strength, hardness IDEMITSU KOSAN CO. LTD. (JP) 1993-05-25 US claimed
US-4314012-A Photoconductive reflex exposure member XEROX CORPORATION (US) 1982-02-02 US claimed
EP-2930762-B1 MATERIAL FOR ORGANIC ELECTROLUMINESCENT ELEMENT, ORGANIC ELECTROLUMINESCENT ELEMENT, ILLUMINATION DEVICE, AND DISPLAY DEVICE KONICA MINOLTA INC (JP) 2020-09-16 EP disclosed
US-9944629-B2 Material for organic electroluminescent element, organic electroluminescent element, illumination device, and display device Konica Minolta, Inc. (JP) 2018-04-17 US disclosed
US-20150322337-A1 MATERIAL FOR ORGANIC ELECTROLUMINESCENT ELEMENT, ORGANIC ELECTROLUMINESCENT ELEMENT, ILLUMINATION DEVICE, AND DISPLAY DEVICE Konica Minolta, Inc. (JP) 2015-11-12 US disclosed
EP-2930762-A1 MATERIAL FOR ORGANIC ELECTROLUMINESCENT ELEMENT, ORGANIC ELECTROLUMINESCENT ELEMENT, ILLUMINATION DEVICE, AND DISPLAY DEVICE Konica Minolta, Inc. (JP) 2015-10-14 EP disclosed
EP-0709747-B1 Selection of developing bias voltage for use in electrophotographic method using photosensitive material KYOCERA MITA CORP (JP) 2006-03-22 EP disclosed
EP-0666519-B1 Image forming apparatus employing a reversal developing system KYOCERA MITA CORP (JP) 2005-11-30 EP disclosed
EP-0866382-B1 Electrophotographic photosensitive material KYOCERA MITA CORP (JP) 2004-06-23 EP disclosed
EP-0690354-A2 Method for contact type development MITA INDUSTRIAL CO., LTD. (JP) 1996-01-03 EP disclosed
EP-0666519-A2 Image forming apparatus employing a reversal developing system MITA INDUSTRIAL CO. LTD. (JP) 1995-08-09 EP disclosed
US-5386279-A Electrostatics, electroconductive polyurethane, organic photosensitive material MITA INDUSTRIAL CO., LTD. (JP) 1995-01-31 US disclosed
EP-0632332-A1 Photosensitive material for electrophotography MITA INDUSTRIAL CO., LTD. (JP) 1995-01-04 EP disclosed
EP-0613067-A2 Transfer in an image-forming apparatus MITA INDUSTRIAL CO. LTD. (JP) 1994-08-31 EP disclosed
US-5213924-A Copolymers, improved mechanical strength, hardness IDEMITSU KOSAN CO. LTD. (JP) 1993-05-25 US disclosed
US-4985326-A PHOTOSENSITIVE LAYER CONTAINING A POLYCARBONATE AS BINDER RESIN IDEMITSU KOSAN CO., LTD. (JP) 1991-01-15 US disclosed
US-4314012-A Photoconductive reflex exposure member XEROX CORPORATION (US) 1982-02-02 US disclosed