Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 6/20 | 0.39 |
| ▸ | LMNA | P02545 | 4/20 | 0.39 |
| ▸ | MAPT | P10636 | 4/20 | 0.39 |
| ▸ | GLA | P06280 | 3/20 | 0.39 |
| ▸ | HPGD | P15428 | 3/20 | 0.39 |
| ▸ | KDM4E | B2RXH2 | 3/20 | 0.39 |
| ▸ | HTT | P42858 | 3/20 | 0.39 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.39 |
| ▸ | ATM | Q13315 | 2/20 | 0.39 |
| ▸ | GAA | P10253 | 1/20 | 0.39 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.39 |
| ▸ | PGAM1 | P18669 | 1/20 | 0.39 |
| ▸ | MAOA | P21397 | 1/20 | 0.39 |
| ▸ | CASP1 | P29466 | 1/20 | 0.39 |
| ▸ | CASP7 | P55210 | 1/20 | 0.39 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.39 |
| ▸ | P2RX4 | Q99571 | 2/20 | 0.35 |
| ▸ | CA1 | P00915 | 1/20 | 0.32 |
| ▸ | CA2 | P00918 | 1/20 | 0.32 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13326153 | 0.95 | ALDH1A1 (0.39) | ALDH1A1LMNAMAPTGLAHPGD | |
| SCHEMBL30118169 | 0.92 | GLA (0.34) | ALDH1A1LMNAMAPTGLAHPGD | |
| SCHEMBL1059475 | 0.92 | GLA (0.34) | ALDH1A1LMNAMAPTGLAHPGD | |
| SCHEMBL47563 | 0.87 | ALDH1A1 (0.30) | ALDH1A1HSD17B10TDP1 | |
| SCHEMBL12256973 | 0.87 | LMNA (0.38) | ALDH1A1LMNAMAPTGLAHPGD | |
| SCHEMBL13326072 | 0.86 | P2RX4 (0.41) | ALDH1A1LMNAMAPTHPGDKDM4E | |
| SCHEMBL13088245 | 0.86 | MAOA (0.40) | ALDH1A1GLAHPGDKDM4ESMN1; SMN2 | |
| SCHEMBL13088309 | 0.86 | KDM4E (0.40) | ALDH1A1LMNAMAPTGLAHPGD | |
| SCHEMBL13326100 | 0.85 | AKR1B1 (0.33) | ALDH1A1LMNAMAPTGLAHPGD | |
| SCHEMBL13326151 | 0.81 | P2RX4 (0.38) | ALDH1A1LMNAMAPTHPGDKDM4E |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 127 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2023127797-A1 | PHOTOCURABLE RESIN COMPOSITION, CURED PRODUCT OF SAME, AND ELECTRONIC CIRCUIT BOARD PROVIDED WITH SAID CURED PRODUCT | 太陽ホールディングス株式会社 | 2023-07-06 | — | — | WO | disclosed |
| CN-111978898-B | Method for producing pressure-sensitive adhesive reactive adhesive tape | 德莎欧洲股份公司 | 2022-09-09 | — | — | CN | disclosed |
| CN-114380929-A | Functionalized (co) polymers for adhesive systems | 德莎欧洲股份公司 | 2022-04-22 | — | — | CN | disclosed |
| CN-111548746-B | UV curable adhesive tape and method for sheathing elongated objects, in particular wires | 德莎欧洲股份公司 | 2022-04-12 | — | — | CN | disclosed |
| CN-109219624-B | Functionalized (co) polymers for adhesive systems | 德莎欧洲股份公司 | 2022-01-14 | — | — | CN | disclosed |
| CN-108884363-B | Radiation-activatable pressure-sensitive adhesive tapes with dark reaction and use thereof | 德莎欧洲股份公司 | 2021-10-15 | — | — | CN | disclosed |
| CN-109994288-B | Forming rigid armored cables with curable jacket | 德莎欧洲股份公司 | 2021-02-26 | — | — | CN | disclosed |
| CN-109071728-B | Water vapor barrier adhesive compositions with highly functionalized poly (meth) acrylates | 德莎欧洲股份公司 | 2021-02-19 | — | — | CN | disclosed |
| CN-111978898-A | Method for producing pressure-sensitive adhesive reactive adhesive tape | 德莎欧洲股份公司 | 2020-11-24 | — | — | CN | disclosed |
| EP-3714001-A1 | PROCESS FOR PRODUCING PRESSURE-SENSITIVE REACTIVE ADHESIVE TAPES | TESA SE (DE) | 2020-09-30 | — | — | EP | disclosed |
| EP-2151443-A1 | POLYHEDRAL POLYSILOXANE MODIFIED PRODUCT AND COMPOSITION USING THE MODIFIED PRODUCT | Kaneka Corporation (JP) | 2010-02-10 | — | — | EP | disclosed |
| US-7615330-B2 | Positive resist composition and pattern formation method using the same | FUJIFILM CORPORATION (JP) | 2009-11-10 | — | — | US | disclosed |
| US-7541131-B2 | Resist composition, compound for use in the resist composition and pattern forming method using the resist composition | FUJIFILM CORPORATION (JP) | 2009-06-02 | — | — | US | disclosed |
| WO-2009048705-A1 | HIGHLY FUNCTIONAL MULTIPHOTON CURABLE REACTIVE SPECIES | 3M INNOVATIVE PROPERTIES COMPANY (US) | 2009-04-16 | — | — | WO | disclosed |
| US-20080268169-A1 | Cationically Curable Coating Compositions | SUN CHEMICAL CORPORATION (US) | 2008-10-30 | — | — | US | disclosed |
| US-7374860-B2 | Positive resist composition and pattern forming method using the same | FUJI FILM CORPORATION (JP) | 2008-05-20 | — | — | US | disclosed |
| US-20080085468-A1 | microlithography; ultrafine processing of semiconductor using electron beam, X-ray or deep UV; high sensitivity, high resolution and good line edge roughness; suppression of vaporized outgas; a polystyrene with an acid-decomposable group; 10-tolyl-9-oxothioxanthenium nonafluorobutanesulfonate | FUJIFILM CORPORATION (JP) | 2008-04-10 | — | — | US | disclosed |
| US-20070224540-A1 | Positive resist composition and pattern formation method using the same | FUJIFILM CORPORATION (JP) | 2007-09-27 | — | — | US | disclosed |
| EP-0931103-B1 | MONOMERS, OLIGOMERS AND POLYMERS WITH TERMINAL OXIRANE GROUPS, METHOD OF PREPARATION AND POLYMERISATION UNDER RADIATION EXPOSURE | UCB SA (BE) | 2004-06-09 | — | — | EP | disclosed |
| US-6417243-B1 | POLYESTERURETHANE BLOCKS | UCB, S.A. (BE) | 2002-07-09 | — | — | US | disclosed |