Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | P2RX4 | Q99571 | 1/20 | 0.38 |
| ▸ | ALOX12 | P18054 | 3/20 | 0.37 |
| ▸ | LMNA | P02545 | 2/20 | 0.37 |
| ▸ | TSHR | P16473 | 2/20 | 0.37 |
| ▸ | ACHE | P22303 | 1/20 | 0.37 |
| ▸ | MEN1 | O00255 | 2/20 | 0.36 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.36 |
| ▸ | NPC1 | O15118 | 5/20 | 0.36 |
| ▸ | POLB | P06746 | 1/20 | 0.36 |
| ▸ | RAB9A | P51151 | 5/20 | 0.36 |
| ▸ | TNKS | O95271 | 2/20 | 0.36 |
| ▸ | PARP1 | P09874 | 2/20 | 0.36 |
| ▸ | TNKS2 | Q9H2K2 | 2/20 | 0.36 |
| ▸ | CES2 | O00748 | 1/20 | 0.35 |
| ▸ | CES1 | P23141 | 1/20 | 0.35 |
| ▸ | HTT | P42858 | 2/20 | 0.35 |
| ▸ | NPSR1 | Q6W5P4 | 2/20 | 0.35 |
| ▸ | TP53 | P04637 | 2/20 | 0.35 |
| ▸ | XBP1 | P17861 | 1/20 | 0.35 |
| ▸ | ATM | Q13315 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13326072 | 0.96 | P2RX4 (0.41) | P2RX4ALOX12LMNATSHRACHE | |
| SCHEMBL29968036 | 0.88 | ACHE (0.38) | ALOX12LMNATSHRACHEMEN1 | |
| Iodide SCHEMBL3776654 | 0.86 | ACHE (0.36) | ALOX12LMNATSHRACHEMEN1 | |
| SCHEMBL13326153 | 0.86 | ALDH1A1 (0.39) | P2RX4ALOX12LMNAMEN1KMT2A | |
| SCHEMBL3142984 | 0.81 | ALDH1A1 (0.39) | P2RX4ALOX12LMNAMEN1KMT2A | |
| Acetic Acid SCHEMBL3771068 | 0.80 | LMNA (0.37) | LMNATSHRMEN1KMT2ANPC1 | |
| SCHEMBL13326071 | 0.80 | CA1 (0.39) | LMNATSHRMEN1KMT2ANPC1 | |
| SCHEMBL13326090 | 0.79 | CTSV (0.43) | TSHRACHEMEN1KMT2APARP1 | |
| SCHEMBL13088309 | 0.77 | KDM4E (0.40) | LMNANPC1RAB9ATNKSPARP1 | |
| SCHEMBL13088245 | 0.77 | MAOA (0.40) | MEN1KMT2APOLBTNKSPARP1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7718344-B2 | microlithography; ultrafine processing of semiconductor using electron beam, X-ray or deep UV; high sensitivity, high resolution and good line edge roughness; suppression of vaporized outgas; a polystyrene with an acid-decomposable group; 10-tolyl-9-oxothioxanthenium nonafluorobutanesulfonate | FUJIFILM CORPORATION (JP) | 2010-05-18 | — | — | US | disclosed |
| US-7615330-B2 | Positive resist composition and pattern formation method using the same | FUJIFILM CORPORATION (JP) | 2009-11-10 | — | — | US | disclosed |
| US-7541131-B2 | Resist composition, compound for use in the resist composition and pattern forming method using the resist composition | FUJIFILM CORPORATION (JP) | 2009-06-02 | — | — | US | disclosed |
| US-7374860-B2 | Positive resist composition and pattern forming method using the same | FUJI FILM CORPORATION (JP) | 2008-05-20 | — | — | US | disclosed |
| US-20080085468-A1 | microlithography; ultrafine processing of semiconductor using electron beam, X-ray or deep UV; high sensitivity, high resolution and good line edge roughness; suppression of vaporized outgas; a polystyrene with an acid-decomposable group; 10-tolyl-9-oxothioxanthenium nonafluorobutanesulfonate | FUJIFILM CORPORATION (JP) | 2008-04-10 | — | — | US | disclosed |
| US-20070224540-A1 | Positive resist composition and pattern formation method using the same | FUJIFILM CORPORATION (JP) | 2007-09-27 | — | — | US | disclosed |