Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MAPT | P10636 | 3/20 | 0.49 |
| ▸ | NPC1 | O15118 | 2/20 | 0.49 |
| ▸ | RAB9A | P51151 | 2/20 | 0.49 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.41 |
| ▸ | HPGD | P15428 | 1/20 | 0.41 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.41 |
| ▸ | GRIA4 | P48058 | 3/20 | 0.38 |
| ▸ | PDE2A | O00408 | 1/20 | 0.35 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.35 |
| ▸ | GRIN2D | O15399 | 1/20 | 0.35 |
| ▸ | GRIN3B | O60391 | 1/20 | 0.35 |
| ▸ | GRIN1 | Q05586 | 1/20 | 0.35 |
| ▸ | GRIN2A | Q12879 | 1/20 | 0.35 |
| ▸ | GRIN2B | Q13224 | 1/20 | 0.35 |
| ▸ | GRIN2C | Q14957 | 1/20 | 0.35 |
| ▸ | GRIN3A | Q8TCU5 | 1/20 | 0.35 |
| ▸ | MEN1 | O00255 | 1/20 | 0.33 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.33 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.33 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10716629 | 0.92 | MAPT (0.63) | MAPTNPC1RAB9AALDH1A1HPGD | |
| SCHEMBL10794218 | 0.82 | TSHR (0.43) | MAPTNPC1RAB9AGRIA4RIPK1 | |
| SCHEMBL3480352 | 0.81 | SHBG (0.52) | MAPTALDH1A1HPGDTDP1CYP1A2 | |
| SCHEMBL12384045 | 0.81 | PDE2A (0.43) | PDE2A | |
| SCHEMBL21671652 | 0.80 | NPC1 (0.49) | MAPTNPC1RAB9AALDH1A1HPGD | |
| SCHEMBL23409249 | 0.80 | ACE (0.35) | MAPTNPC1RAB9AALDH1A1GRIA4 | |
| SCHEMBL19012408 | 0.79 | ALDH1A1 (0.44) | MAPTNPC1RAB9AALDH1A1MAPK1 | |
| SCHEMBL21933684 | 0.78 | PDE2A (0.37) | GRIA4PDE2AGRIN2DGRIN3BGRIN1 | |
| SCHEMBL9359862 | 0.77 | MAOB (0.49) | MAPTNPC1RAB9AALDH1A1HPGD | |
| SCHEMBL11019015 | 0.77 | MAPT (0.49) | MAPTNPC1RAB9AALDH1A1HPGD |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 101 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| JP-57175148-A | — | — | None | — | — | JP | disclosed |
| CN-114008525-B | Method for producing purified resist composition, method for forming resist pattern, and purified resist composition | 东京应化工业株式会社 | 2025-05-23 | — | — | CN | disclosed |
| US-20250153114-A1 | POLYIMIDE-CONTAINING FILTRATION MEMBRANE, FILTERS, AND METHODS | ENTEGRIS, INC. | 2025-05-15 | — | — | US | disclosed |
| US-20250110406-A1 | METHOD OF PRODUCING RESIST COMPOSITION PURIFIED PRODUCT, RESIST PATTERN FORMING METHOD, AND RESIST COMPOSITION PURIFIED PRODUCT | TOKYO OHKA KOGYO CO LTD (JP) | 2025-04-03 | — | — | US | disclosed |
| WO-2025053071-A1 | POROUS FILM AND METHOD FOR PRODUCING POROUS FILM | 東京応化工業株式会社 | 2025-03-13 | — | — | WO | disclosed |
| CN-119552505-A | Composition for producing porous film, method for producing porous film, and porous film | 东京应化工业株式会社 | 2025-03-04 | — | — | CN | disclosed |
| CN-119503513-A | Winding device, film winding method, and method for producing porous imide resin film | 东京应化工业株式会社 | 2025-02-25 | — | — | CN | disclosed |
| CN-119503516-A | Slitting machine and system for manufacturing porous imide resin film | 东京应化工业株式会社 | 2025-02-25 | — | — | CN | disclosed |
| CN-107249720-B | Method for purifying liquid, method for producing chemical liquid or cleaning liquid, filter medium, and filter device | 东京应化工业株式会社 | 2025-01-10 | — | — | CN | disclosed |
| US-12186715-B2 | Production method for resist composition purified product, resist pattern forming method, and resist composition purified product | TOKYO OHKA KOGYO CO., LTD. (JP) | 2025-01-07 | — | — | US | disclosed |
| US-5753407-A | Polyamic acid composition | KABUSHIKI KAISHA TOSHIBA (JP) | 1998-05-19 | — | — | US | disclosed |
| US-5585217-A | Polyamic acid composition | KABUSHIKI KAISHA TOSHIBA (JP) | 1996-12-17 | — | — | US | disclosed |
| US-5518864-A | PHOTOSENSITIVE, QUINONE DIAZIDE | KABUSHIKI KAISHA TOSHIBA (JP) | 1996-05-21 | — | — | US | disclosed |
| EP-0431971-B1 | Photosensitive composition and resin-encapsulated semiconductor device | TOSHIBA KK (JP) | 1995-07-19 | — | — | EP | disclosed |
| EP-0431971-A2 | Photosensitive composition and resin-encapsulated semiconductor device | KABUSHIKI KAISHA TOSHIBA (JP) | 1991-06-12 | — | — | EP | disclosed |
| JP-S57175148-A | PREPARATION OF 2-METHYL-2,4-BIS-(4-AMINOPHENYL) PENTANE | MITSUI TOATSU CHEM INC | 1982-10-28 | — | — | JP | disclosed |
| US-4186145-A | Process for the hydrogenation of an aromatic amine and the supported ruthenium catalyst used in the process | BAYER AKTIENGESELLSCHAFT (DE) | 1980-01-29 | — | — | US | disclosed |
| US-4161492-A | HYDROGENATION OF AROMATIC AMINES, RUTHENIUM CATALYST, SUPPORT OF CHROMIUM AND MANGANESE HYDROXIDES OR OXIDES | BAYER AKTIENGESELLSCHAFT (DE) | 1979-07-17 | — | — | US | disclosed |
| EP-0001425-A1 | Supported ruthenium catalyst, process for its preparation, and its use as a hydrogenation catalyst | BAYER AG (DE) | 1979-04-18 | — | — | EP | disclosed |
| US-4049584-A | HYDROGENATION CATALYST | BAYER AKTIENGESELLSCHAFT (DT) | 1977-09-20 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-12186715-B2 | Production method for resist composition purified product, resist pattern forming method, and resist composition purified product | PUF60, RIOK2, SLC11A2 | MAPT 2939/4885NPC1 3418/4885RAB9A 1882/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.