SCHEMBL31576823

SCHEMBL31576823

Fc1ccc(S)c(F)c1C(F)(F)F

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9629047 0.81 CES2 (0.39)
SCHEMBL15850520 0.75 KIF11 (0.36)
SCHEMBL9693627 0.73 NOTUM (0.43)
SCHEMBL29396883 0.73 KDM1A (0.31)
SCHEMBL8783285 0.73
SCHEMBL9747444 0.73 ALDH1A1 (0.36)
SCHEMBL16652774 0.73 KDM1A (0.31)
SCHEMBL20823474 0.73 ACHE (0.33)
SCHEMBL20824099 0.73 NOTUM (0.43)
SCHEMBL28391679 0.73

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12531211-B2 Sulfur-containing molecules for high aspect ratio plasma etching processes L'Air Liquide, Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude (FR) 2026-01-20 US disclosed
US-20250166974-A1 SULFUR-CONTAINING MOLECULES FOR HIGH ASPECT RATIO PLASMA ETCHING PROCESSES L'AIR LIQUIDE, SOCIETE ANONYME POUR L'ETUDE ET L’EXPLOITATION DES PROCEDES GEORGES CLAUDE (FR) 2025-05-22 US disclosed