SCHEMBL3164341

SCHEMBL3164341

COc1cccc(Sc2cccc(OC)c2)c1

nearest known ligand 0.54

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ACHE P22303 1/20 0.54
MTNR1A P48039 2/20 0.53
MTNR1B P49286 2/20 0.53
CA1 P00915 1/20 0.52
CA2 P00918 1/20 0.52
CA7 P43166 1/20 0.52
CA9 Q16790 1/20 0.52
ALDH1A1 P00352 1/20 0.52
CYP3A4 P08684 1/20 0.52
EDNRA P25101 2/20 0.50
ABCG2 Q9UNQ0 1/20 0.50
IDO1 P14902 1/20 0.50
PTGIR P43119 1/20 0.50
DHFR P00374 1/20 0.50
HTR1A P08908 1/20 0.49
HTR3A P46098 1/20 0.49
P4HB P07237 1/20 0.48
CES2 O00748 1/20 0.47
CES1 P23141 1/20 0.47
ENPP2 Q13822 1/20 0.47

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL31425668 1.00 ACHE (0.54) ACHEMTNR1AMTNR1BCA1CA2
SCHEMBL24433577 0.98 ACHE (0.52) ACHEMTNR1AMTNR1BCA1CA2
SCHEMBL10709610 0.96 MTNR1A (0.57) ACHEMTNR1AMTNR1BCA1CA2
SCHEMBL13163776 0.94 EDNRA (0.54) ACHEMTNR1AMTNR1BCA1CA2
SCHEMBL9770219 0.92 HTR2C (0.55) ACHEMTNR1AMTNR1BCA1CA2
SCHEMBL31345530 0.88 ACHE (0.53) ACHEMTNR1AMTNR1BEDNRAABCG2
SCHEMBL3484059 0.88 ACHE (0.53) ACHEMTNR1AMTNR1BEDNRAABCG2
SCHEMBL921437 0.87 MTNR1A (0.48) ACHEMTNR1AMTNR1BCA1CA2
SCHEMBL4806373 0.87 IDO1 (0.56) ACHEMTNR1AMTNR1BALDH1A1EDNRA
SCHEMBL27663257 0.87 PTGIR (0.52) ACHEMTNR1AMTNR1BALDH1A1EDNRA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 57 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-115141814-B Application of 4-hydroxyacetophenone monooxygenase 江南大学 2023-05-05 CN claimed
CN-113999149-B Preparation method for synthesizing diaryl sulfide compound based on L-cysteine 沈阳药科大学 2024-04-02 CN disclosed
WO-2023157635-A1 ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, METHOD FOR PRODUCING ELECTRONIC DEVICE, AND COMPOUND 富士フイルム株式会社 2023-08-24 WO disclosed
US-11703758-B2 Photosensitive composition for EUV light, pattern forming method, and method for manufacturing electronic device FUJIFILM CORPORATION (JP) 2023-07-18 US disclosed
US-11693321-B2 Treatment liquid for manufacturing semiconductor, storage container storing treatment liquid for manufacturing semiconductor, pattern forming method, and method of manufacturing electronic device FUJIFILM CORPORATION (JP) 2023-07-04 US disclosed
US-20220153956-A1 Polyimide-Gold-Nanorod J-aggregates with Broadened Surface Plasmonic Resonance Band and Method of Manufacture GOVERNMENT OF THE UNITED STATES, AS REPRESENTED BY THE SECRETARY OF THE AIR FORCE 2022-05-19 US disclosed
CN-113999149-A Preparation method for synthesizing diaryl thioether compound based on L-cysteine 沈阳药科大学 2022-02-01 CN disclosed
US-20210405530-A1 PHOTOSENSITIVE COMPOSITION FOR EUV LIGHT, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2021-12-30 US disclosed
CN-108884110-B Sulfonium salt, photoacid generator, photocurable composition, and cured product thereof 三亚普罗股份有限公司 2021-09-14 CN disclosed
US-20210011377-A1 PHOTOSENSITIVE COMPOSITION FOR EUV LIGHT, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2021-01-14 US disclosed
US-20030171589-A1 Method for preparing sulfone or sulfoxide compound SUMITOMO CHEMICAL COMPANY, LIMITED 2003-09-11 US disclosed
EP-1334956-A2 Method for preparing sulfone or sulfoxide compound SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2003-08-13 EP disclosed
US-5250657-A Process for preparing polyarylene thioether SEISAN KAIHATSU KAGAKU KENKYUSHO (JP) 1993-10-05 US disclosed
EP-0440106-A2 Process for preparing polyarylene thioethers SEISAN KAIHATSU KAGAKU KENKYUSHO (JP) 1991-08-07 EP disclosed
EP-0135938-B1 PROCESS FOR PRODUCING AROMATIC POLYETHER KETONES AND POLYTHIOETHER KETONES MITSUBISHI KASEI CORPORATION (JP) 1988-06-22 EP disclosed
US-4707536-A Catalytic preparation of aromatic polyketone from phosgene and aromatic ether or sulfide MITSUBISHI CHEMICAL INDUSTRIES LIMITED (JP) 1987-11-17 US disclosed
US-4661581-A REACTING AROMATIC ETHERS OR THIOETHERS WITH PHOSGENE IN AN APROTIC SOLVENT WITH GROUP 3 METAL HALIDE CATALYST MITSUBISHI CHEMICAL INDUSTRIES, LTD. (JP) 1987-04-28 US disclosed
US-4533497-A N-ethylidene azetidinones ELI LILLY AND COMPANY (US) 1985-08-06 US disclosed
EP-0135938-A2 Process for producing aromatic polyether ketones and polythioether ketones MITSUBISHI KASEI CORPORATION (JP) 1985-04-03 EP disclosed
US-4339611-A BUTANOL, BUTANAL, COBALT, IODINE GULF RESEARCH & DEVELOPMENT COMPANY (US) 1982-07-13 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20030171589-A1 Method for preparing sulfone or sulfoxide compound TST, SDHB, GPX4 ACHE 1945/4885MTNR1A 3860/4885MTNR1B 1690/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.