SCHEMBL3175016

SCHEMBL3175016

COc1cc(O)nc(OC)n1

nearest known ligand 0.55

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LMNA P02545 3/20 0.55
TDP1 Q9NUW8 1/20 0.55
L3MBTL1 Q9Y468 2/20 0.44
SMN1; SMN2 Q16637 4/20 0.41
NPC1 O15118 3/20 0.41
RAB9A P51151 3/20 0.41
TP53 P04637 1/20 0.41
NFKB1 P19838 1/20 0.41
NFKB2 Q00653 1/20 0.41
RELA Q04206 1/20 0.41
ALDH1A1 P00352 5/20 0.41
KDM4E B2RXH2 1/20 0.41
CYP1A2 P05177 3/20 0.40
CASP3 P42574 1/20 0.38
SENP8 Q96LD8 1/20 0.38
SENP7 Q9BQF6 1/20 0.38
SENP6 Q9GZR1 1/20 0.38
CYP3A4 P08684 2/20 0.37
HTR6 P50406 1/20 0.37
CYP2D6 P10635 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1285445 0.85 LMNA (0.42) LMNATDP1TP53ALDH1A1KDM4E
SCHEMBL439716 0.83 LMNA (0.59) LMNATDP1L3MBTL1SMN1; SMN2NPC1
SCHEMBL11728875 0.82 LMNA (0.40) LMNATDP1L3MBTL1SMN1; SMN2NPC1
SCHEMBL11737692 0.82 LMNA (0.40) LMNATDP1SMN1; SMN2NPC1RAB9A
SCHEMBL3109540 0.79 ALDH1A1 (0.42) LMNATDP1L3MBTL1SMN1; SMN2ALDH1A1
SCHEMBL9912008 0.77 PDE2A (0.52) LMNATDP1L3MBTL1SMN1; SMN2ALDH1A1
SCHEMBL11788517 0.77 LMNA (0.37) LMNATDP1SMN1; SMN2TP53ALDH1A1
SCHEMBL11583546 0.76 ALDH1A1 (0.39) LMNATDP1L3MBTL1SMN1; SMN2ALDH1A1
SCHEMBL12101919 0.76 ALDH1A1 (0.44) LMNATDP1L3MBTL1SMN1; SMN2ALDH1A1
SCHEMBL18978202 0.76 KDM4E (0.39) LMNATDP1L3MBTL1SMN1; SMN2NPC1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 55 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-3931180-A Substituted 6-hydroxy pyrimidines SANDOZ LTD., (SANDOZ AG) (CH) 1976-01-06 US claimed
CN-110959138-B Resist material DIC株式会社 2023-06-30 CN disclosed
US-11487204-B2 Resist material DIC CORPORATION (JP) 2022-11-01 US disclosed
CN-108368214-B Novolac resin and resist film DIC株式会社 2021-03-23 CN disclosed
CN-108368213-B Novolac resin and resist film DIC株式会社 2020-12-18 CN disclosed
CN-107003612-B Photosensitive composition for forming resist underlayer film, and resist underlayer film DIC株式会社 2020-11-06 CN disclosed
US-20200166838-A1 RESIST MATERIAL DIC CORPORATION (JP) 2020-05-28 US disclosed
CN-110959138-A Resist material DIC株式会社 2020-04-03 CN disclosed
US-20180346635-A1 NOVOLAC RESIN AND RESIST FILM DIC CORPORATION (JP) 2018-12-06 US disclosed
US-20180334523-A1 NOVOLAC RESIN AND RESIST FILM DIC CORPORATION (JP) 2018-11-22 US disclosed
EP-1449860-A1 NOVEL FLUOROPOLYMER, RESIST COMPOSITIONS CONTAINING THE SAME, AND NOVEL FLUOROMONOMERS Daikin Industries, Ltd. (JP) 2004-08-25 EP disclosed
EP-1415974-A1 PROCESS FOR PRODUCTION OF FLUORINE-CONTAINING NORBORNENE DERIVATIVES Daikin Industries, Ltd. (JP) 2004-05-06 EP disclosed
EP-1375540-A1 ETHYLENIC FLUOROMONOMER CONTAINING HYDROXYL OR FLUOROALKYLCARBONYL GROUP AND FLUOROPOLYMER OBTAINED BY POLYMERIZING THE SAME Daikin Industries, Ltd. (JP) 2004-01-02 EP disclosed
US-20040002575-A1 Fluorine-containing ethylenic monomer having hydroxyl group or fluoroalkyl carbonyl group and fluorine-containing polymer prepared by polymerization of same DAIKIN INDUSTRIES, LTD. 2004-01-01 US disclosed
US-20030152864-A1 Novel fluorine-containing polymer having acid-reactive group and chemically amplifying type photoresist composition prepared from same DAIKIN INDUSTRIES, LTD. 2003-08-14 US disclosed
WO-2003053957-A1 BENZHYDRYL DERIVATIVES FUJISAWA PHARMACEUTICAL CO., LTD. (US) 2003-07-03 WO disclosed
EP-1275666-A1 NOVEL FLUOROPOLYMER HAVING ACID-REACTIVE GROUP AND CHEMICAL AMPLIFICATION TYPE PHOTORESIST COMPOSITION CONTAINING THE SAME Daikin Industries, Ltd. (JP) 2003-01-15 EP disclosed
US-6090518-A HAVING HIGH RESOLUTION, WHICH IS USEFUL FOR A HALFMICRONLITHOGRAPHY EMPLOYING A RADIATION MITSUBISHI CHEMICAL CORPORATION (JP) 2000-07-18 US disclosed
US-4045561-A Pesticidal pyrimidinyl phosphorus esters SANDOZ LTD. (CH) 1977-08-30 US disclosed
US-3931180-A Substituted 6-hydroxy pyrimidines SANDOZ LTD., (SANDOZ AG) (CH) 1976-01-06 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11487204-B2 Resist material FLNA, AFF1, RXRA LMNA 985/4885TDP1 4108/4885L3MBTL1 4344/4885
US-20180334523-A1 NOVOLAC RESIN AND RESIST FILM ASH2L, PRRC2C, ACSL1 LMNA 832/4885TDP1 2581/4885L3MBTL1 935/4885
US-20200166838-A1 RESIST MATERIAL FLNA, AFF1, RXRA LMNA 985/4885TDP1 4108/4885L3MBTL1 4344/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.