Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 3/20 | 0.59 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.59 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.58 |
| ▸ | SMN1; SMN2 | Q16637 | 3/20 | 0.50 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.45 |
| ▸ | NPC1 | O15118 | 2/20 | 0.43 |
| ▸ | RAB9A | P51151 | 2/20 | 0.43 |
| ▸ | TP53 | P04637 | 1/20 | 0.43 |
| ▸ | NFKB1 | P19838 | 1/20 | 0.43 |
| ▸ | NFKB2 | Q00653 | 1/20 | 0.43 |
| ▸ | RELA | Q04206 | 1/20 | 0.43 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.43 |
| ▸ | MEN1 | O00255 | 1/20 | 0.43 |
| ▸ | MAPT | P10636 | 1/20 | 0.43 |
| ▸ | TSHR | P16473 | 1/20 | 0.43 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.43 |
| ▸ | ATM | Q13315 | 1/20 | 0.43 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.43 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.42 |
| ▸ | HTR6 | P50406 | 1/20 | 0.42 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29868033 | 0.85 | LMNA (0.52) | LMNATDP1L3MBTL1SMN1; SMN2CYP1A2 | |
| SCHEMBL423189 | 0.85 | LMNA (0.52) | LMNATDP1L3MBTL1SMN1; SMN2CYP1A2 | |
| SCHEMBL8595031 | 0.85 | LMNA (0.52) | LMNATDP1L3MBTL1SMN1; SMN2CYP1A2 | |
| SCHEMBL12757466 | 0.84 | LMNA (0.47) | LMNATDP1L3MBTL1SMN1; SMN2CYP1A2 | |
| SCHEMBL3175016 | 0.83 | LMNA (0.55) | LMNATDP1L3MBTL1SMN1; SMN2CYP1A2 | |
| SCHEMBL6382020 | 0.83 | LMNA (0.55) | LMNATDP1L3MBTL1SMN1; SMN2CYP1A2 | |
| SCHEMBL1763383 | 0.83 | LMNA (0.50) | LMNATDP1L3MBTL1SMN1; SMN2CYP1A2 | |
| SCHEMBL16421175 | 0.83 | LMNA (0.50) | LMNATDP1L3MBTL1SMN1; SMN2CYP1A2 | |
| SCHEMBL105629 | 0.83 | LMNA (0.55) | LMNATDP1L3MBTL1SMN1; SMN2CYP1A2 | |
| SCHEMBL504020 | 0.83 | LMNA (0.50) | LMNATDP1L3MBTL1SMN1; SMN2CYP1A2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 215 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-119751857-A | Non-isocyanate polyurea and preparation method thereof, water-based non-isocyanate polyurea and preparation method thereof, and anti-corrosion coating, waterproof coating and fireproof coating containing water-based non-isocyanate polyurea and preparation method thereof | 山西省建筑科学研究院集团有限公司 | 2025-04-04 | — | — | CN | claimed |
| CN-112080014-B | Preparation method and application of carbon-carbon double-bond-connected covalent organic framework material | 中国科学院生态环境研究中心 | 2022-05-17 | — | — | CN | claimed |
| CN-112080014-A | Preparation method and application of carbon-carbon double-bond-connected covalent organic framework material | 中国科学院生态环境研究中心 | 2020-12-15 | — | — | CN | claimed |
| CN-102888208-B | Abrasive and substrate polishing method | HITACHI CHEMICAL CO LTD | 2015-02-25 | — | — | CN | claimed |
| CN-102690607-B | Metal polishing slurry and application thereof | HITACHI CHEMICAL CO LTD | 2015-02-11 | — | — | CN | claimed |
| US-20260146199-A1 | METHOD FOR PROCESSING SEMICONDUCTOR SUBSTRATE, METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, AND PROCESSING SOLUTION FOR SEMICONDUCTOR DEVICE | TOKYO OHKA KOGYO CO., LTD. (JP) | 2026-05-28 | — | — | US | disclosed |
| US-12630742-B2 | Polishing composition using polishing particles containing basic substance and having high water affinity | NISSAN CHEMICAL CORPORATION (JP) | 2026-05-19 | — | — | US | disclosed |
| US-20260117105-A1 | POLISHING COMPOSITION HAVING EXCELLENT STORAGE STABILITY AND METHOD FOR PRODUCING SAME | NISSAN CHEMICAL CORPORATION (JP) | 2026-04-30 | — | — | US | disclosed |
| US-12564547-B2 | Compositions, formulations, and methods for skin treatment | ODDITY LABS, LLC (US) | 2026-03-03 | — | — | US | disclosed |
| US-20260042978-A1 | PROCESSING SOLUTION FOR SEMICONDUCTOR DEVICE | TOKYO OHKA KOGYO CO LTD (JP) | 2026-02-12 | — | — | US | disclosed |
| US-20260028553-A1 | PROCESSING SOLUTION, METHOD FOR MANUFACTURING PROCESSING SOLUTION, METHOD FOR PROCESSING SUBSTRATE, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE | TOKYO OHKA KOGYO CO LTD (JP) | 2026-01-29 | — | — | US | disclosed |
| US-12516420-B2 | Chemical solution for removing precious metal, method for manufacturing chemical solution, method for treating substrate, method for manufacturing semiconductor device | TOKYO OHKA KOGYO CO., LTD. (JP) | 2026-01-06 | — | — | US | disclosed |
| EP-0611766-A1 | Polysubstituted 2-amido thiazoles derivatives, process for their preparation, pharmaceutical compositions and utilization for the preparation of a medicament | SANOFI (FR) | 1994-08-24 | — | — | EP | disclosed |
| US-5340701-A | Photoinitiators | CIBA-GEIGY CORPORATION (US) | 1994-08-23 | — | — | US | disclosed |
| US-5266697-A | Process for the production of 2-substituted 4,6-dialkoxypyrimidines | LONZA LTD. (CH) | 1993-11-30 | — | — | US | disclosed |
| EP-0565488-A1 | Fluorine free titanocenes and their application | CIBA-GEIGY AG (CH) | 1993-10-13 | — | — | EP | disclosed |
| EP-0547411-A1 | Process for the preparation of 2-substituted 4,6-dialkoxypyrimidines | LONZA A.G. (CH) | 1993-06-23 | — | — | EP | disclosed |
| US-4938793-A | Herbicide, plant growth regulator | ICI AUSTRALIA LIMITED (AU) | 1990-07-03 | — | — | US | disclosed |
| US-4923989-A | Compounds and compositions | ICI AUSTRALIA LIMITED (AU) | 1990-05-08 | — | — | US | disclosed |
| EP-0102823-A2 | Herbicidal cyclohexane-1,3-dione derivatives | ICI AUSTRALIA LIMITED (AU) | 1984-03-14 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (6 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20260117105-A1 | POLISHING COMPOSITION HAVING EXCELLENT STORAGE STABILITY AND METHOD FOR PRODUCING SAME | SRPRA, SEM1, PSMA1 | LMNA 1106/4885TDP1 2148/4885L3MBTL1 3139/4885 |
| US-20260028553-A1 | PROCESSING SOLUTION, METHOD FOR MANUFACTURING PROCESSING SOLUTION, METHOD FOR PROCESSING SUBSTRATE, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE | TET2, TET1, KDM2A | LMNA 3633/4885TDP1 155/4885L3MBTL1 3661/4885 |
| US-20260042978-A1 | PROCESSING SOLUTION FOR SEMICONDUCTOR DEVICE | TWF2, DSTYK, WNK1 | LMNA 4667/4885TDP1 1940/4885L3MBTL1 3539/4885 |
| US-20260146199-A1 | METHOD FOR PROCESSING SEMICONDUCTOR SUBSTRATE, METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, AND PROCESSING SOLUTION FOR SEMICONDUCTOR DEVICE | AS3MT, ASH1L, HMOX2 | LMNA 4210/4885TDP1 2230/4885L3MBTL1 3120/4885 |
| US-12630742-B2 | Polishing composition using polishing particles containing basic substance and having high water affinity | POLR1A, PRMT1, SRRM2 | LMNA 978/4885TDP1 893/4885L3MBTL1 4300/4885 |
| US-12564547-B2 | Compositions, formulations, and methods for skin treatment | MCOLN1, H1-0, APOL1 | LMNA 576/4885TDP1 2363/4885L3MBTL1 503/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.