SCHEMBL3182174

SCHEMBL3182174

CC(C)(C)Oc1cc(OC(C)(C)C)c(S(OS(=O)(=O)c2ccc(F)cc2)(c2ccccc2)c2ccccc2)c(OC(C)(C)C)c1

nearest known ligand 0.34

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 2/20 0.34
MEN1 O00255 1/20 0.34
NPC1 O15118 1/20 0.34
POLB P06746 1/20 0.34
FFAR1 O14842 2/20 0.33
RORC P51449 1/20 0.33
PKM P14618 1/20 0.33
L3MBTL1 Q9Y468 1/20 0.32
HSD11B1 P28845 3/20 0.32
HSD17B3 P37058 1/20 0.32
FFAR4 Q5NUL3 1/20 0.32
HTR6 P50406 1/20 0.31
TDP1 Q9NUW8 1/20 0.31
TSHR P16473 1/20 0.31
MAPK1 P28482 1/20 0.31
HSD17B10 Q99714 1/20 0.31
PTGS2 P35354 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3197754 0.90 KMT2A (0.37) KMT2AMEN1NPC1POLBFFAR1
SCHEMBL3200904 0.88 HSD11B1 (0.38) KMT2AMEN1L3MBTL1HSD11B1HSD17B3
SCHEMBL3192154 0.88 KMT2A (0.34) KMT2AMEN1NPC1POLBFFAR1
SCHEMBL3204664 0.87 ALDH1A1 (0.33)
SCHEMBL3194025 0.87 FFAR1 (0.35) KMT2AMEN1NPC1POLBFFAR1
SCHEMBL3182670 0.87 CA12 (0.32)
SCHEMBL3206111 0.86 KMT2A (0.36) KMT2AMEN1NPC1POLBFFAR1
SCHEMBL3192420 0.86 PKM (0.31) KMT2AMEN1NPC1PKMMAPK1
SCHEMBL3195099 0.83 HSD11B1 (0.32) HSD11B1
SCHEMBL8644649 0.83 FFAR1 (0.37) KMT2AMEN1NPC1POLBFFAR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8206888-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2012-06-26 US disclosed
US-20100028800-A1 RADIATION-SENSITIVE RESIN COMPOSITION JSR CORPORATION (JP) 2010-02-04 US disclosed
EP-1953593-A1 RADIATION-SENSITIVE RESIN COMPOSITION JSR Corporation (JP) 2008-08-06 EP disclosed
US-7060414-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2006-06-13 US disclosed
US-20050158657-A1 Radiation-sensitive resin composition SUZUKI AKI (JP) 2005-07-21 US disclosed
US-6899989-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2005-05-31 US disclosed