SCHEMBL3206111

SCHEMBL3206111

CC(C)(C)Oc1cc(OC(C)(C)C)cc(S(OS(=O)(=O)c2ccc(F)cc2)(c2ccccc2)c2ccccc2)c1

nearest known ligand 0.36

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 3/20 0.36
MEN1 O00255 1/20 0.36
NPC1 O15118 1/20 0.36
POLB P06746 1/20 0.36
PKM P14618 1/20 0.35
FFAR1 O14842 2/20 0.35
RORC P51449 1/20 0.35
FFAR4 Q5NUL3 1/20 0.34
HSD11B1 P28845 3/20 0.33
TSHR P16473 1/20 0.33
MAPK1 P28482 1/20 0.33
HSD17B10 Q99714 1/20 0.33
PTGS2 P35354 1/20 0.33
ENPP3 O14638 1/20 0.32
ENPP1 P22413 1/20 0.32
PIK3CD O00329 1/20 0.32
PIK3CA P42336 1/20 0.32
PIK3CB P42338 1/20 0.32
PIK3CG P48736 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8644649 0.91 FFAR1 (0.37) KMT2AMEN1NPC1POLBPKM
SCHEMBL3190563 0.88 HSD11B1 (0.40) HSD11B1PTGS2ENPP3ENPP1
SCHEMBL8651563 0.87 PKM (0.35) KMT2AMEN1PKMFFAR1RORC
SCHEMBL3192154 0.86 KMT2A (0.34) KMT2AMEN1NPC1POLBPKM
SCHEMBL3197589 0.86 ABCC9 (0.34) TSHRMAPK1
SCHEMBL3182174 0.86 KMT2A (0.34) KMT2AMEN1NPC1POLBPKM
SCHEMBL8646184 0.85 ALDH1A1 (0.41) KMT2AMEN1FFAR1RORCHSD11B1
SCHEMBL3206290 0.85 CA12 (0.33) HSD11B1
SCHEMBL3195455 0.84 LMNA (0.33) KMT2APKMHSD11B1TSHRMAPK1
SCHEMBL3197600 0.83 TDP1 (0.40) KMT2AMEN1NPC1HSD11B1MAPK1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8206888-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2012-06-26 US disclosed
US-20100028800-A1 RADIATION-SENSITIVE RESIN COMPOSITION JSR CORPORATION (JP) 2010-02-04 US disclosed
EP-1953593-A1 RADIATION-SENSITIVE RESIN COMPOSITION JSR Corporation (JP) 2008-08-06 EP disclosed
US-7060414-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2006-06-13 US disclosed
US-20050158657-A1 Radiation-sensitive resin composition SUZUKI AKI (JP) 2005-07-21 US disclosed
US-6899989-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2005-05-31 US disclosed