⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL36845 | 0.90 | CA12 (0.30) | — | |
| Water SCHEMBL16974951 | 0.88 | — | — | |
| SCHEMBL63951 | 0.87 | — | — | |
| SCHEMBL59313 | 0.83 | — | — | |
| SCHEMBL13379883 | 0.83 | EPHX1 (0.34) | — | |
| SCHEMBL3250993 | 0.83 | MMP1 (0.31) | — | |
| SCHEMBL4646072 | 0.82 | — | — | |
| SCHEMBL36061 | 0.81 | — | — | |
| SCHEMBL10072232 | 0.81 | — | — | |
| SCHEMBL27565867 | 0.81 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 27 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-101313246-B | Radiation-sensitive resin composition | JSR CORP | 2012-10-03 | — | — | CN | disclosed |
| US-8206888-B2 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2012-06-26 | — | — | US | disclosed |
| US-7833691-B2 | Heterocycle-bearing onium salts | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 2010-11-16 | — | — | US | disclosed |
| EP-1953149-B1 | A heterocycle-containing onium salt | WAKO PURE CHEM IND LTD (JP) | 2010-10-06 | — | — | EP | disclosed |
| US-20100028800-A1 | RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2010-02-04 | — | — | US | disclosed |
| EP-1481973-B1 | HETEROCYCLE-BEARING ONIUM SALTS | WAKO PURE CHEM IND LTD (JP) | 2008-12-31 | — | — | EP | disclosed |
| CN-101313246-A | Radiation-sensitive resin composition | JSR CORP (JP) | 2008-11-26 | — | — | CN | disclosed |
| EP-1443042-B1 | HYBRID ONIUM SALT | WAKO PURE CHEM IND LTD (JP) | 2008-08-13 | — | — | EP | disclosed |
| EP-1953593-A1 | RADIATION-SENSITIVE RESIN COMPOSITION | JSR Corporation (JP) | 2008-08-06 | — | — | EP | disclosed |
| EP-1953149-A2 | A heterocycle-containing onium salt | Wako Pure Chemical Industries, Ltd. (JP) | 2008-08-06 | — | — | EP | disclosed |
| US-6899989-B2 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2005-05-31 | — | — | US | disclosed |
| EP-1481973-A1 | HETEROCYCLE-BEARING ONIUM SALTS | Wako Pure Chemical Industries, Ltd. (JP) | 2004-12-01 | — | — | EP | disclosed |
| EP-1443042-A1 | HYBRID ONIUM SALT | Wako Pure Chemical Industries, Ltd. (JP) | 2004-08-04 | — | — | EP | disclosed |
| US-6723483-B1 | Sulfonium salt compounds | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 2004-04-20 | — | — | US | disclosed |
| US-20040033434-A1 | Sulfonium salt compound | FUJIFILM WAKO PURE CHEMICAL CORPORATION (JP) | 2004-02-19 | — | — | US | disclosed |
| EP-1113005-B1 | Sulfonium salt compounds | WAKO PURE CHEM IND LTD (JP) | 2003-08-06 | — | — | EP | disclosed |
| EP-1314725-A1 | SULFONIUM SALT COMPOUND | Wako Pure Chemical Industries, Ltd. (JP) | 2003-05-28 | — | — | EP | disclosed |
| EP-1238969-A2 | Sulfonium salt compounds | Wako Pure Chemical Industries, Ltd. (JP) | 2002-09-11 | — | — | EP | disclosed |
| US-20020090569-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2002-07-11 | — | — | US | disclosed |
| EP-1113005-A1 | Sulfonium salt compounds | Wako Pure Chemical Industries, Ltd. (JP) | 2001-07-04 | — | — | EP | disclosed |