SCHEMBL3191986

SCHEMBL3191986

COc1ccc(O[PH](=O)c2ccc(OC)cc2)cc1

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CA1 P00915 6/20 0.50
CA2 P00918 6/20 0.50
CA9 Q16790 3/20 0.50
CA7 P43166 2/20 0.50
CA12 O43570 1/20 0.50
CA14 Q9ULX7 1/20 0.50
ACHE P22303 1/20 0.42
ALDH1A1 P00352 2/20 0.41
CYP2A6 P11509 1/20 0.41
PKM P14618 1/20 0.41
CES2 O00748 1/20 0.41
CES1 P23141 1/20 0.41
TDP1 Q9NUW8 3/20 0.41
MAPK1 P28482 2/20 0.41
CMA1 P23946 1/20 0.39
KDM4E B2RXH2 1/20 0.39
NPC1 O15118 1/20 0.39
GAA P10253 1/20 0.39
MAPT P10636 1/20 0.39
THRB P10828 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL969753 0.82 ACHE (0.42) CA1CA2CA9ACHEALDH1A1
SCHEMBL233807 0.78 CA1 (0.58) CA1CA2CA9CA7CA12
SCHEMBL184125 0.78 CA1 (0.58) CA1CA2CA9CA7CA12
SCHEMBL23777849 0.77 MEN1 (0.44) CA1CA2CA9CA12CA14
SCHEMBL989137 0.77 MEN1 (0.39) CA1CA2CA9ALDH1A1CYP2A6
SCHEMBL13417234 0.77 ESR2 (0.40) ALDH1A1PKMCES2CES1KDM4E
SCHEMBL13970401 0.77 CA12 (0.44) CA1CA2CA9CA7CA12
SCHEMBL4320820 0.77 CA1 (0.44) CA1CA2CA9ALDH1A1TDP1
SCHEMBL28876962 0.77 NQO1 (0.56) CA1CA2CA9CA7CA12
SCHEMBL988094 0.77 SMN1; SMN2 (0.42) CA2ALDH1A1NPC1MAPTRAB9A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 53 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240393684-A1 METHOD OF FORMING PATTERNS SAMSUNG SDI CO., LTD. (KR) 2024-11-28 US claimed
US-20240272556-A1 METAL CONTAINING PHOTORESIST DEVELOPER COMPOSITION, AND METHOD OF FORMING PATTERNS INCLUDING STEP OF DEVELOPING USING THE COMPOSITION SAMSUNG SDI CO LTD (KR) 2024-08-15 US claimed
US-20240019784-A1 METAL CONTAINING PHOTORESIST DEVELOPER COMPOSITION, AND METHOD OF FORMING PATTERNS INCLUDING STEP OF DEVELOPING USING THE COMPOSITION SAMSUNG SDI CO., LTD. (KR) 2024-01-18 US claimed
US-11400693-B2 Weather resistance improver, resin composition for coating metal-nanowire layer, and metal nanowire-containing laminate SEIKO PMC CORPORATION (JP) 2022-08-02 US claimed
US-20190299575-A1 WEATHER RESISTANCE IMPROVER, RESIN COMPOSITION FOR COATING METAL-NANOWIRE LAYER, AND METAL NANOWIRE-CONTAINING LAMINATE CHEMIPAZ CORPORATION (JP) 2019-10-03 US claimed
CN-110072949-A Weatherability enhancer, the coating resin combination of metal nanometer line layer and laminated body containing metal nanometer line 星光PMC株式会社 2019-07-30 CN claimed
US-12534610-B2 Heat-expanding fire retardant SEKISUI CHEMICAL CO., LTD. (JP) 2026-01-27 US disclosed
US-20240393684-A1 METHOD OF FORMING PATTERNS SAMSUNG SDI CO., LTD. (KR) 2024-11-28 US disclosed
US-20240383227-A1 LAMINATE SEKISUI CHEMICAL CO., LTD. (JP) 2024-11-21 US disclosed
US-20240272556-A1 METAL CONTAINING PHOTORESIST DEVELOPER COMPOSITION, AND METHOD OF FORMING PATTERNS INCLUDING STEP OF DEVELOPING USING THE COMPOSITION SAMSUNG SDI CO LTD (KR) 2024-08-15 US disclosed
US-20240019784-A1 METAL CONTAINING PHOTORESIST DEVELOPER COMPOSITION, AND METHOD OF FORMING PATTERNS INCLUDING STEP OF DEVELOPING USING THE COMPOSITION SAMSUNG SDI CO., LTD. (KR) 2024-01-18 US disclosed
EP-3312214-B1 METHOD OF SYNTHESISING POLYCARBONATES IN THE PRESENCE OF A BIMETALLIC CATALYST AND A CHAIN TRANSFER AGENT IMPERIAL INNOVATIONS LTD (GB) 2023-08-16 EP disclosed
US-20220275190-A1 HEAT-EXPANDING FIRE RETARDANT SEKISUI CHEMICAL CO., LTD. (JP) 2022-09-01 US disclosed
EP-1116772-A1 FLAME RETARDANT COMPOSITION AND FLAME-RETARDANT RESIN COMPOSITION NIPPON CHEMICAL INDUSTRIAL COMPANY LIMITED (JP) 2001-07-18 EP disclosed
US-5922824-A POLYESTERURETHANE MORTON INTERNATIONAL, INC. (US) 1999-07-13 US disclosed
EP-0659789-B1 Polyurethane composition for use as a dispersing binder GOODRICH CO B F (US) 1999-07-07 EP disclosed
US-5891578-A CONTAINING A QUATERNARY AMMONIUM DIOL COMPOUND MORTON INTERNATIONAL, INC. (US) 1999-04-06 US disclosed
US-5747630-A Polyurethane binder for a magnetic recording medium MORTON INTERNATIONAL, INC. (US) 1998-05-05 US disclosed
EP-0659789-A1 Polyurethane composition for use as a dispersing binder THE B.F. GOODRICH COMPANY (US) 1995-06-28 EP disclosed
US-5371166-A High gloss, hydrolytic stability, magnetic recording media THE B. F. GOODRICH COMPANY (US) 1994-12-06 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-12534610-B2 Heat-expanding fire retardant HEATR1, HSF1, ERAL1 CA1 696/4885CA2 1863/4885CA9 2736/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.