Known targets — ChEMBL curated mechanism
AGTR1DHFRGABBR1GABBR2GABRA1GABRA2GABRA3GABRA4GABRA5GABRA6GABRB1GABRB2GABRB3GABRDGABREGABRG1GABRG2GABRG3GABRPGABRQGARTNR3C2PBP2XPTGS1PTGS2VKORC1blablaT-3blaT-4blaT-5blaT-6dacAdacBdacCfolAftsImrcAmrcBmrdApbp1apbp1bpbp2apbp2bpbp3polthyA
The experimentally established mechanism targets of Potassium Ion. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | RECQL | P46063 | 2/20 | 0.91 |
| ▸ | TSHR | P16473 | 2/20 | 0.91 |
| ▸ | GLA | P06280 | 1/20 | 0.91 |
| ▸ | HPGD | P15428 | 1/20 | 0.91 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.91 |
| ▸ | EPHX2 | P34913 | 1/20 | 0.91 |
| ▸ | BLM | P54132 | 1/20 | 0.91 |
| ▸ | CA1 | P00915 | 15/20 | 0.59 |
| ▸ | CA2 | P00918 | 15/20 | 0.59 |
| ▸ | CA9 | Q16790 | 13/20 | 0.59 |
| ▸ | CA12 | O43570 | 4/20 | 0.59 |
| ▸ | CA7 | P43166 | 4/20 | 0.59 |
| ▸ | CA14 | Q9ULX7 | 4/20 | 0.59 |
| ▸ | CA3 | P07451 | 3/20 | 0.59 |
| ▸ | CA4 | P22748 | 3/20 | 0.59 |
| ▸ | CA6 | P23280 | 3/20 | 0.59 |
| ▸ | CA5A | P35218 | 3/20 | 0.59 |
| ▸ | CA5B | Q9Y2D0 | 3/20 | 0.59 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.42 |
| ▸ | USP2 | O75604 | 1/20 | 0.42 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Potassium Ion SCHEMBL8894946 | 1.00 | RECQL (0.91) | RECQLTSHRGLAHPGDMAPK1 | |
| Potassium Ion SCHEMBL1268318 | 1.00 | RECQL (0.91) | RECQLTSHRGLAHPGDMAPK1 | |
| Potassium Ion SCHEMBL6130040 | 1.00 | RECQL (0.91) | RECQLTSHRGLAHPGDMAPK1 | |
| Potassium Ion SCHEMBL10600170 | 1.00 | RECQL (0.91) | RECQLTSHRGLAHPGDMAPK1 | |
| Potassium Ion SCHEMBL379323 | 1.00 | RECQL (0.91) | RECQLTSHRGLAHPGDMAPK1 | |
| Potassium Ion SCHEMBL1269089 | 1.00 | RECQL (0.91) | RECQLTSHRGLAHPGDMAPK1 | |
| Potassium Ion SCHEMBL10599158 | 1.00 | RECQL (0.91) | RECQLTSHRGLAHPGDMAPK1 | |
| Potassium Ion SCHEMBL5694816 | 1.00 | RECQL (0.91) | RECQLTSHRGLAHPGDMAPK1 | |
| Potassium Ion SCHEMBL10599511 | 1.00 | RECQL (0.91) | RECQLTSHRGLAHPGDMAPK1 | |
| Potassium Ion SCHEMBL29701335 | 1.00 | RECQL (0.91) | RECQLTSHRGLAHPGDMAPK1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 84 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4662251-A2 | MANUFACTURE OF FLUOROPOLYMER LATEX BY DUAL SURFACTANTS | Arkema, Inc. (US) | 2025-12-17 | — | — | EP | claimed |
| WO-2024167876-A2 | MANUFACTURE OF FLUOROPOLYMER LATEX BY DUAL SURFACTANTS | ARKEMA INC. (US) | 2024-08-15 | — | — | WO | claimed |
| US-5972572-A | A COPOLYMER EMULSIFIER USE AS ANTICAKING AND ANTIGUMMING AGENT | AGFA-GEVAERT AG (DE) | 1999-10-26 | — | — | US | claimed |
| US-5380628-A | Photography | EASTMAN KODAK COMPANY (US) | 1995-01-10 | — | — | US | claimed |
| US-5081003-A | Developer compositions for newspaper plates | HOECHST CELANESE CORPORATION (US) | 1992-01-14 | — | — | US | claimed |
| US-4912021-A | Water solubility of Group Ia phosphate, aromatic alcohol, resin, acid, Group Ia octyl sulfate and benzoate | HOECHST CELANESE CORPORATION (US) | 1990-03-27 | — | — | US | claimed |
| US-4873174-A | TO REMOVE THE NON-IMAGE PORTIONS AFTER EXPOSING PHOTOGRAPHIC ELEMENT TO ACTINIC RADIATION TO FORM A LATENT IMAGE | HOECHST CELANESE CORPORATION (US) | 1989-10-10 | — | — | US | claimed |
| EP-0326715-A2 | Developer/finisher compositions for litographic plates | HOECHST CELANESE CORPORATION (US) | 1989-08-09 | — | — | EP | claimed |
| EP-4702842-A1 | COMPOSITION, ANT CONTROL AGENT, AND CONTROL METHOD FOR ANTS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-03-04 | — | — | EP | disclosed |
| EP-3514201-B1 | CRYSTAL NUCLEATOR FOR POLYOLEFIN RESINS | NEW JAPAN CHEM CO LTD (JP) | 2026-01-28 | — | — | EP | disclosed |
| EP-4662248-A2 | SHEAR STABLE AQUEOUS FLUOROPOLYMER DISPERSION | Arkema, Inc. (US) | 2025-12-17 | — | — | EP | disclosed |
| EP-4662251-A2 | MANUFACTURE OF FLUOROPOLYMER LATEX BY DUAL SURFACTANTS | Arkema, Inc. (US) | 2025-12-17 | — | — | EP | disclosed |
| WO-2025110076-A1 | DIACETAL COMPOSITION, POLYOLEFIN-BASED RESIN COMPOSITION, MOLDED POLYOLEFIN-BASED RESIN, AND METHOD FOR PRODUCING MOLDED POLYOLEFIN-BASED RESIN | 新日本理化株式会社 | 2025-05-30 | — | — | WO | disclosed |
| US-20250000088-A1 | ANT CONTROL AGENT AND ANT CONTROL METHOD | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-01-02 | — | — | US | disclosed |
| US-4857402-A | Magnetic recording medium | FUJI PHOTO FILM CO., LTD. (JP) | 1989-08-15 | — | — | US | disclosed |
| EP-0326715-A2 | Developer/finisher compositions for litographic plates | HOECHST CELANESE CORPORATION (US) | 1989-08-09 | — | — | EP | disclosed |
| US-4743383-A | ORGANOPHILIC CLAY, PREVENTION OF FLUID LOSS | PHILLIPS PETROLEUM COMPANY (US) | 1988-05-10 | — | — | US | disclosed |
| US-4554200-A | ALKALI METAL SALTS OF UNSATURATED FATTY ACIDS OR ALKYL SULFATES, INK ADHESION | AMERICAN HOECHST CORPORATION (US) | 1985-11-19 | — | — | US | disclosed |
| EP-0134463-A1 | Thermoplastic polyester film having a priming layer containing a salt of an organic acid | HOECHST CELANESE CORPORATION (US) | 1985-03-20 | — | — | EP | disclosed |
| US-4486483-A | ADHESION OF INKS | AMERICAN HOECHST CORPORATION (US) | 1984-12-04 | — | — | US | disclosed |