SCHEMBL3201835

SCHEMBL3201835

CCc1cc(CC)c([S+](c2ccccc2)c2ccccc2)c(CC)c1.O=S(=O)([O-])c1ccc(C(F)(F)F)cc1

nearest known ligand 0.38

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP19A1 P11511 1/20 0.38
PTGDR2 Q9Y5Y4 4/20 0.36
HSD11B1 P28845 3/20 0.36
MAPT P10636 2/20 0.35
LMNA P02545 1/20 0.35
CYP1A2 P05177 1/20 0.35
POLB P06746 1/20 0.35
CYP3A4 P08684 1/20 0.35
GAA P10253 1/20 0.35
CYP2D6 P10635 1/20 0.35
CYP2C9 P11712 1/20 0.35
MAPK1 P28482 1/20 0.35
CYP2C19 P33261 1/20 0.35
HTT P42858 1/20 0.35
AR P10275 1/20 0.35
PTGER1 P34995 1/20 0.35
BCHE P06276 1/20 0.34
ACHE P22303 1/20 0.34
KEAP1 Q14145 1/20 0.34
NFE2L2 Q16236 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3197629 0.88 POLQ (0.35) CYP19A1PTGDR2HSD11B1MAPTCYP3A4
SCHEMBL3189842 0.87 PTGDR2 (0.37) CYP19A1PTGDR2HSD11B1MAPTLMNA
SCHEMBL3197933 0.86 POLQ (0.34) PTGDR2TRPM8
SCHEMBL3193625 0.86 KMT2A (0.39) CYP19A1MAPK1
SCHEMBL3201028 0.85 BCHE (0.40) CYP19A1HSD11B1MAPTLMNACYP1A2
SCHEMBL3200703 0.84 PTGS1 (0.31)
SCHEMBL3188835 0.80 PTGS2 (0.33)
SCHEMBL503701 0.80 ALDH1A1 (0.45) CYP19A1HSD11B1MAPTLMNAPOLB
SCHEMBL3189010 0.80 TP53 (0.43) MAPTLMNACYP1A2MAPK1
SCHEMBL3190403 0.79 KAT6A (0.33) LMNAKEAP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20050158657-A1 Radiation-sensitive resin composition SUZUKI AKI (JP) 2005-07-21 US claimed
US-6899989-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2005-05-31 US claimed
US-20020090569-A1 Radiation-sensitive resin composition JSR CORPORATION (JP) 2002-07-11 US claimed
US-8206888-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2012-06-26 US disclosed
US-20100028800-A1 RADIATION-SENSITIVE RESIN COMPOSITION JSR CORPORATION (JP) 2010-02-04 US disclosed
EP-1953593-A1 RADIATION-SENSITIVE RESIN COMPOSITION JSR Corporation (JP) 2008-08-06 EP disclosed
US-7060414-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2006-06-13 US disclosed
US-20050158657-A1 Radiation-sensitive resin composition SUZUKI AKI (JP) 2005-07-21 US disclosed
US-6899989-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2005-05-31 US disclosed