Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CHRM1 | P11229 | 1/20 | 0.39 |
| ▸ | AKR1A1 | P14550 | 1/20 | 0.39 |
| ▸ | CHRM3 | P20309 | 1/20 | 0.39 |
| ▸ | HTR2A | P28223 | 1/20 | 0.39 |
| ▸ | HTR2C | P28335 | 1/20 | 0.39 |
| ▸ | ADRA1A | P35348 | 1/20 | 0.39 |
| ▸ | HRH1 | P35367 | 1/20 | 0.39 |
| ▸ | DRD3 | P35462 | 1/20 | 0.39 |
| ▸ | SLC6A3 | Q01959 | 1/20 | 0.39 |
| ▸ | HDAC1 | Q13547 | 1/20 | 0.39 |
| ▸ | HDAC2 | Q92769 | 1/20 | 0.39 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.39 |
| ▸ | TSHR | P16473 | 4/20 | 0.33 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.33 |
| ▸ | NFKB1 | P19838 | 2/20 | 0.33 |
| ▸ | NPSR1 | Q6W5P4 | 2/20 | 0.33 |
| ▸ | CHRNB2 | P17787 | 1/20 | 0.33 |
| ▸ | CHRNB4 | P30926 | 1/20 | 0.33 |
| ▸ | CHRNA3 | P32297 | 1/20 | 0.33 |
| ▸ | CHRNA4 | P43681 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5266548 | 0.82 | MTNR1A (0.40) | TDP1TSHRALDH1A1LMNAHSD17B10 | |
| SCHEMBL3214845 | 0.82 | TSHR (0.35) | CHRM1TSHRALDH1A1LMNAHSD17B10 | |
| SCHEMBL11344133 | 0.71 | FDPS (0.41) | ALDH1A1 | |
| SCHEMBL6267833 | 0.71 | TSHR (0.41) | CHRM1TSHRALDH1A1 | |
| SCHEMBL509444 | 0.71 | TSHR (0.41) | CHRM1TSHRALDH1A1 | |
| SCHEMBL2400701 | 0.69 | TSHR (0.32) | CHRM1AKR1A1CHRM3HTR2AHTR2C | |
| SCHEMBL19897496 | 0.68 | ALDH1A1 (0.35) | TSHRALDH1A1LMNAHSD17B10 | |
| SCHEMBL475940 | 0.68 | TSHR (0.35) | CHRM1TSHRALDH1A1LMNAHSD17B10 | |
| SCHEMBL3209259 | 0.68 | TSHR (0.35) | CHRM1TSHRALDH1A1LMNAHSD17B10 | |
| SCHEMBL7091995 | 0.68 | ALDH1A1 (0.31) | ALDH1A1LMNAHSD17B10 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 38 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8283260-B2 | Process for restoring dielectric properties | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2012-10-09 | — | — | US | disclosed |
| CN-1757445-B | Composition for preparing low dielectric material containing solvent | AIR PROD & CHEM | 2010-12-01 | — | — | CN | disclosed |
| US-20100041234-A1 | Process For Restoring Dielectric Properties | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2010-02-18 | — | — | US | disclosed |
| US-20090298671-A1 | Compositions for Preparing Low Dielectric Materials Containing Solvents | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2009-12-03 | — | — | US | disclosed |
| CN-100539037-C | The composition of preparation low dielectric material | AIR PROD & CHEM (US) | 2009-09-09 | — | — | CN | disclosed |
| US-7500397-B2 | Activated chemical process for enhancing material properties of dielectric films | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2009-03-10 | — | — | US | disclosed |
| US-7482676-B2 | Compositions for preparing low dielectric materials | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2009-01-27 | — | — | US | disclosed |
| CN-101312129-A | Activated chemical process for enhancing material properties of dielectric film | AIR PROD & CHEM (US) | 2008-11-26 | — | — | CN | disclosed |
| US-20080264672-A1 | Photoimprintable Low Dielectric Constant Material and Method for Making and Using Same | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2008-10-30 | — | — | US | disclosed |
| CN-101252030-A | Compositions for preparing low dielectric materials containing solvents | AIR PROD & CHEM (US) | 2008-08-27 | — | — | CN | disclosed |
| EP-1583141-A2 | Solvents and methods using same for removing silicon-containing residues from a substrate | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2005-10-05 | — | — | EP | disclosed |
| EP-1577935-A2 | Compositions for preparing low dielectric materials containing solvents | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2005-09-21 | — | — | EP | disclosed |
| US-20050196974-A1 | Compositions for preparing low dielectric materials containing solvents | VERSUM MATERIALS US, LLC | 2005-09-08 | — | — | US | disclosed |
| US-20050196535-A1 | Solvents and methods using same for removing silicon-containing residues from a substrate | AIR PRODUCTS AND CHEMICALS, INC. | 2005-09-08 | — | — | US | disclosed |
| EP-1561841-A2 | Cleaning CVD Chambers following deposition of porogen-containing materials | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2005-08-10 | — | — | EP | disclosed |
| CN-1651159-A | Cleaning CVD chambers following deposition of porogen-containing materials | AIR PROD & CHEM (US) | 2005-08-10 | — | — | CN | disclosed |
| US-20050161060-A1 | Cleaning CVD chambers following deposition of porogen-containing materials | AIR PRODUCTS AND CHEMICALS, INC. | 2005-07-28 | — | — | US | disclosed |
| CN-1487567-A | Composition for producing low dielectric material | �����Ʒ�뻯ѧ��˾ | 2004-04-07 | — | — | CN | disclosed |
| US-20040048960-A1 | Compositions for preparing low dielectric materials | AIR PRODUCTS AND CHEMICALS, INC. | 2004-03-11 | — | — | US | disclosed |
| EP-1376671-A1 | Compositions for preparing materials with a low dielectric constant | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2004-01-02 | — | — | EP | disclosed |