SCHEMBL3203604

SCHEMBL3203604

CC(C)(C)S(=O)(=O)C(=[N+]=[N-])S(=O)(=O)c1ccccc1

nearest known ligand 0.39

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HSD11B1 P28845 2/20 0.39
ALDH1A1 P00352 5/20 0.38
SMN1; SMN2 Q16637 4/20 0.38
HSD17B10 Q99714 2/20 0.38
TP53 P04637 2/20 0.38
HTT P42858 2/20 0.38
TDP1 Q9NUW8 1/20 0.38
TSHR P16473 1/20 0.38
MAPT P10636 3/20 0.36
LMNA P02545 2/20 0.36
NPC1 O15118 2/20 0.36
RAB9A P51151 2/20 0.36
KMT2A Q03164 2/20 0.36
S1PR2 O95136 1/20 0.36
PRNP P04156 1/20 0.36
XBP1 P17861 1/20 0.36
MAPK1 P28482 1/20 0.36
ATM Q13315 1/20 0.36
HTR6 P50406 1/20 0.35
PPME1 Q9Y570 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL65095 0.85 SMN1; SMN2 (0.46) ALDH1A1SMN1; SMN2HSD17B10TP53HTT
SCHEMBL3207137 0.84 ALDH1A1 (0.42) ALDH1A1SMN1; SMN2HTTLMNAKMT2A
SCHEMBL3193127 0.81 SMN1; SMN2 (0.40) HSD11B1ALDH1A1SMN1; SMN2HSD17B10TP53
SCHEMBL21838871 0.79 MAPT (0.47) HSD11B1ALDH1A1SMN1; SMN2HTTTDP1
SCHEMBL14600187 0.79 MAPT (0.47) HSD11B1ALDH1A1SMN1; SMN2HTTTDP1
SCHEMBL7690064 0.78 ALDH1A1 (0.40) ALDH1A1SMN1; SMN2HTTMAPTKMT2A
SCHEMBL7717451 0.77 MAPT (0.53) ALDH1A1SMN1; SMN2HSD17B10TP53TDP1
SCHEMBL10072231 0.76 ALDH1A1 (0.40) HSD11B1ALDH1A1SMN1; SMN2HSD17B10TP53
SCHEMBL2165382 0.76 GAA (0.45) HSD11B1ALDH1A1SMN1; SMN2HSD17B10TP53
SCHEMBL7695232 0.76 MMP2 (0.41) ALDH1A1SMN1; SMN2MAPTKMT2ACA1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8241740-B2 Layer laminated to support; ionization radiation; curing using free radical catalyst; image display and polarization plates FUJIFILM CORPORATION (JP) 2012-08-14 US disclosed
US-8206888-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2012-06-26 US disclosed
US-20100028800-A1 RADIATION-SENSITIVE RESIN COMPOSITION JSR CORPORATION (JP) 2010-02-04 US disclosed
US-20080234461-A1 Antireflective Film, Method of Manufacturing Antireflective Film, Polarizing Plate and Image Display Device Using the Same FUJIFILM CORPORATION (JP) 2008-09-25 US disclosed
US-7060414-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2006-06-13 US disclosed
US-20050158657-A1 Radiation-sensitive resin composition SUZUKI AKI (JP) 2005-07-21 US disclosed
US-6899989-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2005-05-31 US disclosed
US-20020090569-A1 Radiation-sensitive resin composition JSR CORPORATION (JP) 2002-07-11 US disclosed