SCHEMBL3203657

SCHEMBL3203657

Cc1cccc(C)c1S(OS(=O)(=O)c1ccc(C(F)(F)F)cc1)(c1ccccc1)c1ccccc1

nearest known ligand 0.40

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
HSD11B1 P28845 5/20 0.40
BCHE P06276 1/20 0.40
ACHE P22303 1/20 0.40
PTGS2 P35354 2/20 0.37
CA1 P00915 1/20 0.36
CA2 P00918 1/20 0.36
GAA P10253 1/20 0.36
KIF11 P52732 1/20 0.36
CYP19A1 P11511 1/20 0.35
AR P10275 1/20 0.35
MEN1 O00255 3/20 0.35
KMT2A Q03164 3/20 0.35
ALDH1A1 P00352 2/20 0.35
MAPT P10636 2/20 0.35
HTT P42858 2/20 0.35
RAB9A P51151 1/20 0.35
POLB P06746 1/20 0.34
LMNA P02545 1/20 0.34
PTGS1 P23219 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL547726 0.90 CYP1A2 (0.42) HSD11B1BCHEACHEPTGS2GAA
SCHEMBL3134441 0.86 HSD11B1 (0.49) HSD11B1BCHEACHEPTGS2HTT
SCHEMBL503702 0.85 HSD11B1 (0.45) HSD11B1PTGS2CA1CA2KIF11
SCHEMBL3139775 0.85 HSD11B1 (0.45) HSD11B1PTGS2CA1CA2KIF11
SCHEMBL3132687 0.85 HSD11B1 (0.45) HSD11B1PTGS2CA1CA2KIF11
SCHEMBL3143580 0.85 BCHE (0.49) HSD11B1BCHEACHEPTGS2CA1
SCHEMBL3136049 0.85 BCHE (0.49) HSD11B1BCHEACHEPTGS2CA1
SCHEMBL3132919 0.85 BCHE (0.49) HSD11B1BCHEACHEPTGS2CA1
SCHEMBL3136577 0.85 BCHE (0.49) HSD11B1BCHEACHEPTGS2CA1
SCHEMBL3192565 0.85 TSHR (0.45) BCHEACHEPTGS2MEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8206888-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2012-06-26 US disclosed
US-20100028800-A1 RADIATION-SENSITIVE RESIN COMPOSITION JSR CORPORATION (JP) 2010-02-04 US disclosed
EP-1953593-A1 RADIATION-SENSITIVE RESIN COMPOSITION JSR Corporation (JP) 2008-08-06 EP disclosed
US-7060414-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2006-06-13 US disclosed
US-20050158657-A1 Radiation-sensitive resin composition SUZUKI AKI (JP) 2005-07-21 US disclosed
US-6899989-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2005-05-31 US disclosed