Predicted protein targets (top 11)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA1 | P00915 | 2/20 | 0.34 |
| ▸ | TSHR | P16473 | 3/20 | 0.33 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.33 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.33 |
| ▸ | PTPN1 | P18031 | 1/20 | 0.32 |
| ▸ | CHRM2 | P08172 | 1/20 | 0.30 |
| ▸ | CHRM4 | P08173 | 1/20 | 0.30 |
| ▸ | CHRM1 | P11229 | 1/20 | 0.30 |
| ▸ | TBXA2R | P21731 | 1/20 | 0.30 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.30 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL21326400 | 0.84 | TRPV1 (0.36) | CA1TSHRPTPN1CYP2D6CYP2C19 | |
| SCHEMBL476104 | 0.82 | CA1 (0.34) | CA1TSHRALDH1A1TDP1PTPN1 | |
| SCHEMBL707980 | 0.80 | ALDH1A1 (0.37) | TSHRALDH1A1TDP1 | |
| SCHEMBL2149328 | 0.76 | TSHR (0.36) | TSHRALDH1A1TDP1CHRM2CHRM4 | |
| SCHEMBL703686 | 0.75 | KDM4E (0.36) | TSHRALDH1A1 | |
| SCHEMBL704685 | 0.75 | KDM4E (0.36) | TSHRALDH1A1 | |
| SCHEMBL229663 | 0.73 | ALDH1A1 (0.38) | TSHRALDH1A1TDP1 | |
| SCHEMBL303979 | 0.73 | KDM4E (0.40) | TSHRALDH1A1 | |
| SCHEMBL11211035 | 0.71 | ALDH1A1 (0.31) | TSHRALDH1A1 | |
| SCHEMBL11455842 | 0.71 | ALDH1A1 (0.31) | TSHRALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 42 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8283260-B2 | Process for restoring dielectric properties | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2012-10-09 | — | — | US | disclosed |
| CN-1757445-B | Composition for preparing low dielectric material containing solvent | AIR PROD & CHEM | 2010-12-01 | — | — | CN | disclosed |
| US-20100041234-A1 | Process For Restoring Dielectric Properties | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2010-02-18 | — | — | US | disclosed |
| US-20090298671-A1 | Compositions for Preparing Low Dielectric Materials Containing Solvents | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2009-12-03 | — | — | US | disclosed |
| CN-100539037-C | The composition of preparation low dielectric material | AIR PROD & CHEM (US) | 2009-09-09 | — | — | CN | disclosed |
| US-7500397-B2 | Activated chemical process for enhancing material properties of dielectric films | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2009-03-10 | — | — | US | disclosed |
| US-7482676-B2 | Compositions for preparing low dielectric materials | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2009-01-27 | — | — | US | disclosed |
| CN-101312129-A | Activated chemical process for enhancing material properties of dielectric film | AIR PROD & CHEM (US) | 2008-11-26 | — | — | CN | disclosed |
| EP-1832351-B1 | Low dielectric materials and methods for making same | AIR PROD & CHEM (US) | 2008-11-12 | — | — | EP | disclosed |
| US-20080264672-A1 | Photoimprintable Low Dielectric Constant Material and Method for Making and Using Same | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2008-10-30 | — | — | US | disclosed |
| EP-1577935-A2 | Compositions for preparing low dielectric materials containing solvents | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2005-09-21 | — | — | EP | disclosed |
| US-20050196974-A1 | Compositions for preparing low dielectric materials containing solvents | VERSUM MATERIALS US, LLC | 2005-09-08 | — | — | US | disclosed |
| US-20050196535-A1 | Solvents and methods using same for removing silicon-containing residues from a substrate | AIR PRODUCTS AND CHEMICALS, INC. | 2005-09-08 | — | — | US | disclosed |
| EP-1561841-A2 | Cleaning CVD Chambers following deposition of porogen-containing materials | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2005-08-10 | — | — | EP | disclosed |
| CN-1651159-A | Cleaning CVD chambers following deposition of porogen-containing materials | AIR PROD & CHEM (US) | 2005-08-10 | — | — | CN | disclosed |
| US-20050161060-A1 | Cleaning CVD chambers following deposition of porogen-containing materials | AIR PRODUCTS AND CHEMICALS, INC. | 2005-07-28 | — | — | US | disclosed |
| EP-1464410-A1 | Low dielectric materials and methods for making same | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2004-10-06 | — | — | EP | disclosed |
| CN-1487567-A | Composition for producing low dielectric material | �����Ʒ�뻯ѧ��˾ | 2004-04-07 | — | — | CN | disclosed |
| US-20040048960-A1 | Compositions for preparing low dielectric materials | AIR PRODUCTS AND CHEMICALS, INC. | 2004-03-11 | — | — | US | disclosed |
| EP-1376671-A1 | Compositions for preparing materials with a low dielectric constant | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2004-01-02 | — | — | EP | disclosed |