SCHEMBL3206004

SCHEMBL3206004

Cc1ccc([S+](c2ccccc2)c2ccccc2)c(C)c1.O=S(=O)([O-])c1ccc(F)cc1

nearest known ligand 0.41

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
FFAR4 Q5NUL3 2/20 0.41
LMNA P02545 2/20 0.40
GAA P10253 1/20 0.40
SMN1; SMN2 Q16637 1/20 0.40
KMT2A Q03164 3/20 0.36
MEN1 O00255 1/20 0.36
TSHR P16473 2/20 0.36
TDP1 Q9NUW8 1/20 0.35
PAX8 Q06710 1/20 0.35
HSD11B1 P28845 1/20 0.35
PTGS2 P35354 1/20 0.34
PKM P14618 1/20 0.34
MAPK1 P28482 1/20 0.34
HSD17B10 Q99714 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4861374 0.92 RAPGEF4 (0.40) FFAR4LMNAGAASMN1; SMN2KMT2A
SCHEMBL3200961 0.86 ALDH1A1 (0.35) FFAR4LMNAGAASMN1; SMN2KMT2A
SCHEMBL3201709 0.86 FFAR1 (0.40) FFAR4LMNAGAASMN1; SMN2KMT2A
SCHEMBL3191490 0.85 HSD11B1 (0.34) FFAR4LMNAGAASMN1; SMN2KMT2A
SCHEMBL3193928 0.84 HTT (0.33) LMNAGAASMN1; SMN2KMT2AMEN1
Trifluoromethanesulfonic Acid SCHEMBL4857072 0.83 GPR3 (0.47) FFAR4KMT2AMEN1TSHRHSD11B1
SCHEMBL3190654 0.83 FFAR4 (0.47) FFAR4LMNAGAASMN1; SMN2KMT2A
SCHEMBL2960622 0.83 KMT2A (0.42) LMNAGAASMN1; SMN2KMT2AMEN1
SCHEMBL1002296 0.83 KMT2A (0.42) LMNAGAASMN1; SMN2KMT2AMEN1
SCHEMBL3137407 0.83 KMT2A (0.42) LMNAGAASMN1; SMN2KMT2AMEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8206888-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2012-06-26 US disclosed
US-20100028800-A1 RADIATION-SENSITIVE RESIN COMPOSITION JSR CORPORATION (JP) 2010-02-04 US disclosed
EP-1953593-A1 RADIATION-SENSITIVE RESIN COMPOSITION JSR Corporation (JP) 2008-08-06 EP disclosed
US-7060414-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2006-06-13 US disclosed
US-20050158657-A1 Radiation-sensitive resin composition SUZUKI AKI (JP) 2005-07-21 US disclosed
US-6899989-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2005-05-31 US disclosed