Predicted protein targets (top 11)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HSD11B1 | P28845 | 2/20 | 0.40 |
| ▸ | GLA | P06280 | 1/20 | 0.40 |
| ▸ | ALDH1A1 | P00352 | 6/20 | 0.39 |
| ▸ | TSHR | P16473 | 2/20 | 0.39 |
| ▸ | LMNA | P02545 | 1/20 | 0.39 |
| ▸ | HTT | P42858 | 2/20 | 0.39 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.39 |
| ▸ | MAPT | P10636 | 2/20 | 0.38 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.38 |
| ▸ | CNR2 | P34972 | 1/20 | 0.37 |
| ▸ | POLB | P06746 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL595456 | 1.00 | HSD11B1 (0.40) | HSD11B1GLAALDH1A1TSHRLMNA | |
| SCHEMBL3207184 | 0.85 | HSD11B1 (0.40) | HSD11B1GLAALDH1A1TSHRLMNA | |
| SCHEMBL3207190 | 0.85 | HSD11B1 (0.40) | HSD11B1GLAALDH1A1TSHRLMNA | |
| SCHEMBL28179101 | 0.78 | LMNA (0.38) | HSD11B1GLAALDH1A1TSHRLMNA | |
| SCHEMBL524018 | 0.76 | GLA (0.44) | HSD11B1GLAALDH1A1HTTKDM4E | |
| SCHEMBL524017 | 0.76 | GLA (0.44) | HSD11B1GLAALDH1A1HTTKDM4E | |
| SCHEMBL906383 | 0.76 | GLA (0.44) | HSD11B1GLAALDH1A1HTTKDM4E | |
| SCHEMBL2026422 | 0.76 | GLA (0.44) | HSD11B1GLAALDH1A1HTTKDM4E | |
| SCHEMBL1218819 | 0.76 | GLA (0.44) | HSD11B1GLAALDH1A1LMNAHTT | |
| SCHEMBL7521812 | 0.76 | HSD11B1 (0.36) | HSD11B1GLAALDH1A1TSHRLMNA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 33 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8557501-B2 | Developable bottom antireflective coating compositions especially suitable for ion implant applications | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2013-10-15 | — | — | US | claimed |
| US-20120178029-A1 | DEVELOPABLE BOTTOM ANTIREFLECTIVE COATING COMPOSITIONS ESPECIALLY SUITABLE FOR ION IMPLANT APPLICATIONS | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2012-07-12 | — | — | US | claimed |
| US-8182978-B2 | Developable bottom antireflective coating compositions especially suitable for ion implant applications | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2012-05-22 | — | — | US | claimed |
| US-20090181171-A1 | Method of Controlling Orientation of Domains in Block Copolymer Films | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2009-07-16 | — | — | US | claimed |
| US-20240055382-A1 | METALLIZATION METHOD | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2024-02-15 | — | — | US | disclosed |
| US-20230420401-A1 | METALLIZATION METHOD | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2023-12-28 | — | — | US | disclosed |
| US-20160130462-A1 | TOPCOAT COMPOSITIONS AND PHOTOLITHOGRAPHIC METHODS | ROHM & HAAS ELECT MAT (US) | 2016-05-12 | — | — | US | disclosed |
| US-20150195916-A1 | FORMATION OF A COMPOSITE PATTERN INCLUDING A PERIODIC PATTERN SELF-ALIGNED TO A PREPATTERN | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2015-07-09 | — | — | US | disclosed |
| US-8557501-B2 | Developable bottom antireflective coating compositions especially suitable for ion implant applications | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2013-10-15 | — | — | US | disclosed |
| US-8540925-B2 | Photocurable composition, micropattern-formed product and its production process | ASAHI GLASS COMPANY, LIMITED (JP) | 2013-09-24 | — | — | US | disclosed |
| US-8491965-B2 | Method of controlling orientation of domains in block copolymer films | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2013-07-23 | — | — | US | disclosed |
| US-20120178029-A1 | DEVELOPABLE BOTTOM ANTIREFLECTIVE COATING COMPOSITIONS ESPECIALLY SUITABLE FOR ION IMPLANT APPLICATIONS | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2012-07-12 | — | — | US | disclosed |
| WO-2009019574-A1 | PHOTORESIST COMPOSITION FOR DEEP UV AND PROCESS THEREOF | AZ ELECTRONIC MATERIALS USA CORP. (DE) | 2009-02-12 | — | — | WO | disclosed |
| US-20090042148-A1 | Photoresist Composition for Deep UV and Process Thereof | AZ ELECTRONIC MATERIALS USA CORP. | 2009-02-12 | — | — | US | disclosed |
| US-20080107870-A1 | PHOTOCURABLE COMPOSITION, MICROPATTERN-FORMED PRODUCT AND ITS PRODUCTION PROCESS | ASAHI GLASS CO., LTD. (JP) | 2008-05-08 | — | — | US | disclosed |
| US-20080003517-A1 | Fluorine-Containing Cyclic Compound, Fluorine-Containing Polymer Compound, Resist Material Using Same and Method for Forming Pattern | CENTRAL GLASS COMPANY, LIMITED (JP) | 2008-01-03 | — | — | US | disclosed |
| US-6908722-B2 | Acid generator, sulfonic acid, sulfonic acid derivatives and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2005-06-21 | — | — | US | disclosed |
| US-20030113658-A1 | Acid generator, sulfonic acid, sulfonic acid derivatives and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2003-06-19 | — | — | US | disclosed |
| EP-1270553-A2 | Acid generator, sulfonic acid, sulfonic acid derivatives and radiation-sensitive resin composition | JSR Corporation (JP) | 2003-01-02 | — | — | EP | disclosed |
| WO-2002021212-A2 | FLUORINATED PHENOLIC POLYMERS AND PHOTORESIST COMPOSITIONS COMPRISING SAME | SHIPLEY COMPANY, L.L.C. (US) | 2002-03-14 | — | — | WO | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20080003517-A1 | Fluorine-Containing Cyclic Compound, Fluorine-Containing Polymer Compound, Resist Material Using Same and Method for Forming Pattern | AFF1, AFF2, FGFR1 | HSD11B1 2242/4885GLA 4244/4885ALDH1A1 903/4885 |
| US-20030113658-A1 | Acid generator, sulfonic acid, sulfonic acid derivatives and radiation-sensitive resin composition | ASIC1, PFAS, RARA | HSD11B1 3894/4885GLA 816/4885ALDH1A1 1216/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.