Fluoride

Fluoride

SCHEMBL321926

F.O.O.O

nearest known ligand 0.00

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

ABCC9ABL1ACEACHEACVR1ADORA1ADORA2AADORA2BADORA3ADRA1AADRA1BADRA1DADRA2AADRA2BADRA2CADRB1ADRB2ADRB3AGTR1ALOX5ATP4AATP4BBCRBTKCACNA1ACACNA1BCACNA1CCACNA1DCACNA1ECACNA1FCACNA1GCACNA1HCACNA1ICACNA1SCACNA2D1CACNA2D2CACNA2D3CACNA2D4CACNB1CACNB2CACNB3CACNB4CACNG1CACNG2CACNG3CACNG4CACNG5CACNG6CACNG7CACNG8CALCRLCFBCHRM1CHRM2CHRM3CHRM4CHRM5CHRNA1CHRNB1CHRNDCHRNECHRNGCRBNCUL4ACXCR1CXCR2DDB1DDCDHFRDPP4DRD2DRD3DRD4EGFRERBB2ERBB4ESR1ESR2FDPSFKBP1AFLT1FLT3FLT4GARTGHSRGRIA1GRIA2GRIA3GRIA4GRIK1GRIK2GRIK3GRIK4GRIK5GRIN2AGSK3AGSK3BHDAC1HDAC10HDAC11HDAC2HDAC3HDAC4HDAC5HDAC6HDAC7HDAC8HDAC9HRH1HTR1AHTR1BHTR1DHTR1EHTR1FHTR2AHTR2BHTR2CHTR3AHTR3BHTR3CHTR3DHTR3EHTR4HTR5AHTR6HTR7IDH1IDH2IMPA1ITGA2BITGB3JAK1JAK2JAK3KCNJ11KCNK3KCNK9KDRKITMEN1METMMP1MMP13MMP7MMP8NANOD2NS5bODC1OPG057OPRD1OPRK1OPRM1PPARP1PARP2PDE3APDE3BPDE4APDE4BPDE4CPDE4DPDGFRBPIK3CAPIK3CBPIK3CDPIK3CGPIK3R1PIK3R2PIK3R3PIK3R5PKLRPPARDPPATPTGS1PTGS2RBX1ROCK1ROCK2RRM1RRM2RRM2BSCN10ASCN11ASCN1ASCN2ASCN3ASCN4ASCN5ASCN7ASCN8ASCN9ASCNN1ASCNN1BSCNN1GSIGMAR1SLC10A2SLC5A2SLC6A2SLC6A3SLC6A4SLC9A3SYKTACR1THRATHRBTOP1TUBA1ATUBA1BTUBA1CTUBA3CTUBA3ETUBA4ATUBBTUBB1TUBB2ATUBB2BTUBB3TUBB4ATUBB4BTUBB6TUBB8TYK2TYMSVDRampCblablaT-3blaT-4blaT-5blaT-6blaUOE-1dacAdacBdacCfolAfolPftsIgyrAgyrBileSmecAmrcAmrcBmrdAparCparEpbp2pbp4pbpApbpFrplArplBrplCrplDrplErplFrplIrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmE2rpmFrpmGrpmG1rpmG2rpmG3rpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUthyAykgMykgO

The experimentally established mechanism targets of Fluoride. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Fluoride SCHEMBL1923512 1.00
Fluoride SCHEMBL7179572 1.00
Fluoride SCHEMBL28687216 1.00
Fluoride SCHEMBL7179569 1.00
Fluoride SCHEMBL9069651 1.00
Fluoride SCHEMBL9069648 1.00
Fluoride SCHEMBL28570525 1.00
Fluoride SCHEMBL29142678 1.00
Fluoride SCHEMBL443154 1.00
Fluoride SCHEMBL28264502 1.00

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 85 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2024080850-A1 PRECURSOR MATERIAL FOR SYNTHESIS OF GROUP III-V QUANTUM DOTS AND PREPARATION METHOD THEREFOR 성균관대학교산학협력단 2024-04-18 WO claimed
WO-2023113353-A1 ZINC-DOPED QUANTUM DOT AND MANUFACTURING METHOD THEREFOR 성균관대학교산학협력단 2023-06-22 WO claimed
WO-2020197200-A1 METALLIC NANOPARTICLE CATALYSTS EMBEDDED IN POROUS OXIDE SUPPORT, WHICH SHOW HIGH CATALYTIC ACTIVITY EVEN AT LOW TEMPERATURES 주식회사 퀀텀캣 2020-10-01 WO claimed
WO-2019180321-A1 METHOD OF PROCESSING CELLULOSIC MATERIALS HELSINGIN YLIOPISTO (FI) 2019-09-26 WO claimed
US-20180294155-A1 PROCESS FOR OBTAINING SEMICONDUCTOR NANODEVICES WITH PATTERNED METAL-OXIDE THIN FILMS DEPOSITED ONTO A SUBSTRATE, AND SEMICONDUCTOR NANODEVICES THEREOF CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE (FR) 2018-10-11 US claimed
EP-3091103-A1 PROCESS FOR OBTAINING PATTERNED METAL-OXIDE THIN FILMS DEPOSITED ONTO A SUBSTRATE, FILMED SUBSTRATES OBTAINED THEREOF, AND SEMICONDUCTOR NANODEVICES COMPRISING THEM CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE (FR) 2016-11-09 EP claimed
WO-2010137838-A2 COMPOSITION FOR A LIQUID PROCESS, ELECTRONIC DEVICE USING SAME, AND METHOD FOR MANUFACTURING SAME 연세대학교 산학협력단 (KR) 2010-12-02 WO claimed
EP-2004760-A2 PROCESS FOR PRODUCING METAL OXIDE FLAKES Ciba Specialty Chemicals Holding, Inc. (CH) 2008-12-24 EP claimed
WO-2007115959-A2 PROCESS FOR PRODUCING METAL OXIDE FLAKES CIBA HOLDING INC. (CH) 2007-10-18 WO claimed
EP-1833922-A1 PROCESS OF USING MICROWAVE DEPOSITION OF METAL OXIDE ONTO AN ORGANIC SUBSTRATE CIBA SPECIALTY CHEMICALS HOLDING INC. Patent Departement (CH) 2007-09-19 EP claimed
WO-2006063949-A1 PROCESS OF USING MICROWAVE DEPOSITION OF METAL OXIDE ONTO AN ORGANIC SUBSTRATE CIBA SPECIALTY CHEMICALS HOLDING INC. (CH) 2006-06-22 WO claimed
EP-1631698-A1 PROCESS FOR THE PREPARATION OF METAL OXIDE COATED ORGANIC MATERIAL BY MICROWAVE DEPOSITION Ciba SC Holding AG (CH) 2006-03-08 EP claimed
WO-2004111298-A1 PROCESS FOR THE PREPARATION OF METAL OXIDE COATED ORGANIC MATERIAL BY MICROWAVE DEPOSITION CIBA SPECIALTY CHEMICALS HOLDING INC. (CH) 2004-12-23 WO claimed
JP-1266883-A None JP disclosed
JP-61148131-A None JP disclosed
CN-120157171-A Wet synthesis method of ammonium tetrafluorogallate raw material for fluoride glass 中国科学院上海光学精密机械研究所 2025-06-17 CN disclosed
US-4847303-A UNSATURATED KETONES THE PROCTER & GAMBLE COMPANY (US) 1989-07-11 US disclosed
JP-S61148131-A PRODUCTION OF PERFLUOROETHANE SHOWA DENKO KK 1986-07-05 JP disclosed
US-4411937-A WITH ACIDIC COMPOSITION CONSISTING OF RESIN WITH DISSOLVED FERRIC IRON AND FLUORIDE AMCHEM PRODUCTS, INC. (US) 1983-10-25 US disclosed
US-4347172-A COATINGS FROM AN ACIDIC AQUEOUS DISPERSION COMPRISING RESIN PARTICLES, HYDROFLUORIC ACID AND A SOLUBLE FERRIC COMPOUND; THICKNESS CONTROLLED BY IMMERSION TIME AMCHEM PRODUCTS, INC. (US) 1982-08-31 US disclosed