SCHEMBL3225328

SCHEMBL3225328

C=Cc1ccc(O)c(F)c1

nearest known ligand 0.52

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
TRPA1 O75762 1/20 0.52
KDM1A O60341 2/20 0.46
SNCA P37840 1/20 0.46
ESR1 P03372 6/20 0.44
ESR2 Q92731 6/20 0.44
ALDH1A1 P00352 1/20 0.43
SIRT1 Q96EB6 1/20 0.41
LCK P06239 1/20 0.39
HSD17B1 P14061 1/20 0.38
HSD17B2 P37059 1/20 0.38
P4HB P07237 1/20 0.37
NQO2 P16083 1/20 0.37
PTGS1 P23219 1/20 0.37
KDM4E B2RXH2 1/20 0.37
LMNA P02545 1/20 0.37
HSD17B10 Q99714 1/20 0.37
MIF P14174 1/20 0.37
MCL1 Q07820 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL26793694 0.82 ESR1 (0.42) TRPA1KDM1ASNCAESR1ESR2
SCHEMBL15582384 0.82 CA3 (0.50) TRPA1ESR1ESR2ALDH1A1LCK
SCHEMBL29662132 0.78 NFE2L2 (0.50) TRPA1ALDH1A1LMNA
SCHEMBL248639 0.78 NFE2L2 (0.50) TRPA1ALDH1A1LMNA
SCHEMBL29403669 0.78 LCK (0.64) TRPA1ALDH1A1LCKNQO2PTGS1
SCHEMBL170797 0.78 LCK (0.64) TRPA1ALDH1A1LCKNQO2PTGS1
SCHEMBL18071837 0.77 KDM1A (0.46) KDM1ASNCAESR1ESR2SIRT1
SCHEMBL29465560 0.77 KDM4E (0.64) KDM1ASNCAESR1ESR2ALDH1A1
SCHEMBL219109 0.77 KDM4E (0.64) KDM1ASNCAESR1ESR2ALDH1A1
SCHEMBL465532 0.74 TRPA1 (0.53) TRPA1ESR1ESR2ALDH1A1LCK

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 104 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-103980648-B A kind of guiding self assembly copolymer compositions and correlation technique thereof 罗门哈斯电子材料有限公司 2016-08-17 CN claimed
CN-103980648-A Directed self assembly copolymer composition and related methods DOW GLOBAL TECHNOLOGIES LLC 2014-08-13 CN claimed
US-20100055626-A1 METHOD FOR PATTERN FORMATION PANASONIC CORPORATION (JP) 2010-03-04 US claimed
WO-2024212670-A1 VINYL PYRONE COMPOUND AND USE THEREOF FOR TREATING ALZHEIMER'S DISEASE 福建医科大学 2024-10-17 WO disclosed
US-12036025-B2 Bio-electrode, method for manufacturing bio-electrode, and method for measuring biological signal SHIN-ETSU CHEMICAL CO., LTD. (JP) 2024-07-16 US disclosed
US-12036025-B2 Bio-electrode, method for manufacturing bio-electrode, and method for measuring biological signal SHIN-ETSU CHEMICAL CO., LTD. (JP) 2024-07-16 US disclosed
US-20240215890-A1 Bio-Electrode, Bio-Electrode Composition, And Method For Manufacturing Bio-Electrode SHIN-ETSU CHEMICAL CO., LTD. (JP) 2024-07-04 US disclosed
US-20240215891-A1 Bio-Electrode Composition, Bio-Electrode, And Method For Manufacturing Bio-Electrode SHIN-ETSU CHEMICAL CO., LTD. (JP) 2024-07-04 US disclosed
US-20240215891-A1 Bio-Electrode Composition, Bio-Electrode, And Method For Manufacturing Bio-Electrode SHIN-ETSU CHEMICAL CO., LTD. (JP) 2024-07-04 US disclosed
CN-117088837-A Vinyl pyrone compounds and their use in the treatment of alzheimer's disease 福建医科大学 2023-11-21 CN disclosed
US-20230367210-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2023-11-16 US disclosed
CN-103980648-A Directed self assembly copolymer composition and related methods DOW GLOBAL TECHNOLOGIES LLC 2014-08-13 CN disclosed
CN-103889230-A Active compound combinations BAYER IP GMBH 2014-06-25 CN disclosed
CN-103665726-A Composition and method for preparing pattern on a substrate ROHM & HAAS ELECT MAT 2014-03-26 CN disclosed
US-20140080064-A1 RESIST PROTECTIVE FILM-FORMING COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-03-20 US disclosed
US-20140080064-A1 RESIST PROTECTIVE FILM-FORMING COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-03-20 US disclosed
CN-103571252-A Thermal annealing process ROHM & HAAS ELECT MAT 2014-02-12 CN disclosed
CN-103571253-A High temperature thermal annealing process ROHM & HAAS ELECT MAT 2014-02-12 CN disclosed
US-20100055626-A1 METHOD FOR PATTERN FORMATION PANASONIC CORPORATION (JP) 2010-03-04 US disclosed
EP-2116587-A1 LIQUID CRYSTAL COMPOSITION AND LIQUID CRYSTAL DISPLAY ELEMENT Chisso Corporation (JP) 2009-11-11 EP disclosed