Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HSD11B1 | P28845 | 2/20 | 0.39 |
| ▸ | EPHX1 | P07099 | 3/20 | 0.38 |
| ▸ | P2RX7 | Q99572 | 1/20 | 0.38 |
| ▸ | CNR2 | P34972 | 1/20 | 0.38 |
| ▸ | EPHX2 | P34913 | 3/20 | 0.38 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.36 |
| ▸ | GAA | P10253 | 1/20 | 0.34 |
| ▸ | THRB | P10828 | 1/20 | 0.34 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.34 |
| ▸ | NPC1 | O15118 | 1/20 | 0.34 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.34 |
| ▸ | GLA | P06280 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29837434 | 1.00 | HSD11B1 (0.39) | HSD11B1EPHX1P2RX7CNR2EPHX2 | |
| SCHEMBL927164 | 0.78 | P2RX7 (0.42) | HSD11B1EPHX1P2RX7CNR2EPHX2 | |
| SCHEMBL392678 | 0.78 | THRB (0.40) | HSD11B1EPHX1P2RX7CNR2EPHX2 | |
| SCHEMBL23453794 | 0.78 | THRB (0.40) | HSD11B1EPHX1P2RX7CNR2EPHX2 | |
| SCHEMBL838918 | 0.78 | THRB (0.40) | HSD11B1EPHX1P2RX7CNR2EPHX2 | |
| SCHEMBL1326077 | 0.76 | ALDH1A1 (0.42) | HSD11B1EPHX1P2RX7CNR2EPHX2 | |
| SCHEMBL20194631 | 0.76 | CNR2 (0.41) | HSD11B1EPHX1P2RX7CNR2EPHX2 | |
| SCHEMBL5969631 | 0.76 | EPHX1 (0.35) | HSD11B1EPHX1EPHX2ALDH1A1GAA | |
| SCHEMBL8709524 | 0.76 | GLA (0.43) | HSD11B1EPHX1P2RX7EPHX2ALDH1A1 | |
| SCHEMBL18434166 | 0.73 | HSD11B1 (0.43) | HSD11B1EPHX1P2RX7CNR2ALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0908473-B1 | Styrene polymers, chemically-amplified positive resist compositions, their preparation and use in a patterning process | SHINETSU CHEMICAL CO (JP) | 2006-02-01 | — | — | EP | claimed |
| EP-2968082-B1 | PROLONGED DELIVERY OF CERTAIN FRAGRANCE COMPONENTS FROM PERSONAL CARE COMPOSITIONS | UNILEVER PLC (GB) | 2017-02-01 | — | — | EP | disclosed |
| WO-2010011824-A1 | NOVEL XANTHINE COMPOUNDS | CONCERT PHARMACEUTICALS, INC. (US) | 2010-01-28 | — | — | WO | disclosed |
| EP-0908473-B1 | Styrene polymers, chemically-amplified positive resist compositions, their preparation and use in a patterning process | SHINETSU CHEMICAL CO (JP) | 2006-02-01 | — | — | EP | disclosed |
| US-6613844-B2 | Polyhydroxystyrene type polymer containing acid labile groups, endcapped and optionally crosslinked; improved alkali dissolution contrast, sensitivity, resolution, plasma etching resistance, heat resistance, and reproducibility | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2003-09-02 | — | — | US | disclosed |
| US-20030013832-A1 | Novel styrene polymer, chemically amplified positive resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2003-01-16 | — | — | US | disclosed |
| US-6384169-B1 | POLYHYDROXYSTYRENE WITH ACID LABILE GROUP, MODIFIED AT ENDS WITH ALKYLS, ESTERS OR ALCOHOLS; INCREASED DISSOLUTION RATE, HIGH SENSITIVITY AND RESOLUTION; RESIST PATTERNS HAVE PLASMA ETCHING RESISTANCE, HEAT RESISTANCE, REPRODUCIBILITY | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2002-05-07 | — | — | US | disclosed |
| EP-0908473-A1 | Styrene polymers, chemically-amplified positive resist compositions, their preparation and use in a patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1999-04-14 | — | — | EP | disclosed |