SCHEMBL3256271

SCHEMBL3256271

C=C(C)C(=O)Oc1ccccc1NS(C)(=O)=O

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HSD17B10 Q99714 3/20 0.46
KMT2A Q03164 3/20 0.45
ALDH1A1 P00352 4/20 0.44
KDM4E B2RXH2 3/20 0.44
HPGD P15428 2/20 0.44
TSHR P16473 2/20 0.43
L3MBTL1 Q9Y468 1/20 0.42
KEAP1 Q14145 1/20 0.42
ELANE P08246 1/20 0.42
SMN1; SMN2 Q16637 2/20 0.42
MEN1 O00255 2/20 0.42
CCR2 P41597 1/20 0.41
MAPK1 P28482 1/20 0.41
PTGS1 P23219 3/20 0.41
PTGS2 P35354 2/20 0.41
HTT P42858 2/20 0.41
EP300 Q09472 1/20 0.41
KAT2B Q92831 1/20 0.41
KAT8 Q9H7Z6 1/20 0.41
GAA P10253 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27508885 0.85 KMT2A (0.53) HSD17B10KMT2AALDH1A1KDM4EHPGD
SCHEMBL3251056 0.85 PSIP1 (0.47) HSD17B10ALDH1A1KDM4EHPGDELANE
SCHEMBL3253880 0.84 HTT (0.53) KMT2AALDH1A1TSHRSMN1; SMN2MEN1
SCHEMBL11344377 0.81 SMN1; SMN2 (0.43) HSD17B10KMT2AALDH1A1KDM4EHPGD
SCHEMBL3251006 0.80 LMNA (0.59) KMT2AALDH1A1TSHRL3MBTL1KEAP1
SCHEMBL9568664 0.80 HSD17B10 (0.45) HSD17B10KMT2AALDH1A1KDM4EHPGD
SCHEMBL11347869 0.79 MRGPRX1 (0.54)
SCHEMBL27776272 0.78 ALDH1A1 (0.50) HSD17B10KMT2AALDH1A1KDM4EL3MBTL1
SCHEMBL30803750 0.77 ELANE (0.56) HSD17B10KMT2AALDH1A1KDM4EHPGD
SCHEMBL30803748 0.77 ELANE (0.56) HSD17B10KMT2AALDH1A1KDM4EHPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5141838-A Lithography printing plates FUJI PHOTO FILM CO., LTD. (JP) 1992-08-25 US claimed
US-20120146264-A1 RESIN COMPOSITION FOR LASER ENGRAVING, RELIEF PRINTING PLATE PRECURSOR FOR LASER ENGRAVING AND PROCESS FOR PRODUCING SAME, AND PROCESS FOR MAKING RELIEF PRINTING PLATE FUJIFILM CORPORATION (JP) 2012-06-14 US disclosed
EP-1972440-B1 Negative lithographic printing plate precursor and lithographic printing method using the same FUJIFILM CORP (JP) 2010-06-23 EP disclosed
EP-1136886-B1 Positive-working presensitized plate useful for preparing a lithographic printing plate FUJIFILM CORP (JP) 2010-05-19 EP disclosed
US-20080233516-A1 NEGATIVE LITHOGRAPHIC PRINTING PLATE PRECURSOR AND LITHOGRAPHIC PRINTING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2008-09-25 US disclosed
EP-1972440-A2 Negative lithographic printing plate precursor and lithographic printing method using the same FUJIFILM Corporation (JP) 2008-09-24 EP disclosed
US-6517987-B2 Mixture of 1,2-naphthoquinone-2-diazide-5-sulfonic acid and polymer FUJI PHOTO FILM CO., LTD. (JP) 2003-02-11 US disclosed
US-20010041299-A1 Positive-working presensitized plate useful for preparing a lithographic printing plate FUJIFILM CORPORATION (JP) 2001-11-15 US disclosed
EP-0671660-B1 Lead-frame forming material FUJI PHOTO FILM CO LTD (JP) 2001-10-17 EP disclosed
EP-1136886-A1 Positive-working presensitized plate useful for preparing a lithographic printing plate Fuji Photo Film Co., Ltd. (JP) 2001-09-26 EP disclosed
EP-1077392-A1 Photosensitive lithographic printing plate FUJI PHOTO FILM CO., LTD. (JP) 2001-02-21 EP disclosed
US-5670293-A LIGHT SENSITIVE MATERIAL WITH COPPER OR NICKEL ALLOYS, DRYING A PHOTOSENSITIVE LAYER AND WINDING THE COATED WEB INTO STRIPS AND STACKING FUJI PHOTO FILM CO., LTD. (JP) 1997-09-23 US disclosed
EP-0330239-B1 Photosensitive composition FUJI PHOTO FILM CO LTD (JP) 1996-05-22 EP disclosed
EP-0671660-A2 Lead-frame forming material FUJI PHOTO FILM CO., LTD. (JP) 1995-09-13 EP disclosed
US-5141838-A Lithography printing plates FUJI PHOTO FILM CO., LTD. (JP) 1992-08-25 US disclosed
EP-0330239-A2 Photosensitive composition FUJI PHOTO FILM CO., LTD. (JP) 1989-08-30 EP disclosed
US-4259469-A DESIRABLE SOLUBILITY CHARACTERISTICS FOR USE IN PHOTOLITHOGRAPHY EASTMAN KODAK COMPANY (US) 1981-03-31 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20120146264-A1 RESIN COMPOSITION FOR LASER ENGRAVING, RELIEF PRINTING PLATE PRECURSOR FOR LASER ENGRAVING AND PROCESS FOR PRODUCING SAME, AND PROCESS FOR MAKING RELIEF PRINTING PLATE EIF3L, EIF2B1, EIF2B5 HSD17B10 2408/4885KMT2A 506/4885ALDH1A1 1302/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.