Water — predicted protein targets

Known targets — ChEMBL curated mechanism

ABCC9 ABL1 ACE ACHE ACVR1 ADORA1 ADORA2A ADORA2B ADORA3 ADRA1A ADRA1B ADRA1D ADRA2A ADRA2B ADRA2C ADRB1 ADRB2 ADRB3 AGTR1 ALOX5 ATP4A ATP4B BCR BTK CACNA1A CACNA1B CACNA1C CACNA1D CACNA1E CACNA1F CACNA1G CACNA1H CACNA1I CACNA1S CACNA2D1 CACNA2D2 CACNA2D3 CACNA2D4 CACNB1 CACNB2 CACNB3 CACNB4 CACNG1 CACNG2 CACNG3 CACNG4 CACNG5 CACNG6 CACNG7 CACNG8 CALCRL CFB CHRM1 CHRM2 CHRM3 CHRM4 CHRM5 CHRNA1 CHRNB1 CHRND CHRNE CHRNG CRBN CUL4A CXCR1 CXCR2 DDB1 DDC DHFR DPP4 DRD2 DRD3 DRD4 EGFR ERBB2 ERBB4 ESR1 ESR2 FDPS FKBP1A FLT1 FLT3 FLT4 GART GHSR GRIA1 GRIA2 GRIA3 GRIA4 GRIK1 GRIK2 GRIK3 GRIK4 GRIK5 GRIN2A GSK3A GSK3B HDAC1 HDAC10 HDAC11 HDAC2 HDAC3 HDAC4 HDAC5 HDAC6 HDAC7 HDAC8 HDAC9 HRH1 HTR1A HTR1B HTR1D HTR1E HTR1F HTR2A HTR2B HTR2C HTR3A HTR3B HTR3C HTR3D HTR3E HTR4 HTR5A HTR6 HTR7 IDH1 IDH2 IMPA1 ITGA2B ITGB3 JAK1 JAK2 JAK3 KCNJ11 KCNK3 KCNK9 KDR KIT MEN1 MET MMP1 MMP13 MMP7 MMP8 NA NOD2 NS5b ODC1 OPG057 OPRD1 OPRK1 OPRM1 P PARP1 PARP2 PDE3A PDE3B PDE4A PDE4B PDE4C PDE4D PDGFRB PIK3CA PIK3CB PIK3CD PIK3CG PIK3R1 PIK3R2 PIK3R3 PIK3R5 PKLR PPARD PPAT PTGS1 PTGS2 RBX1 ROCK1 ROCK2 RRM1 RRM2 RRM2B SCN10A SCN11A SCN1A SCN2A SCN3A SCN4A SCN5A SCN7A SCN8A SCN9A SCNN1A SCNN1B SCNN1G SIGMAR1 SLC10A2 SLC5A2 SLC6A2 SLC6A3 SLC6A4 SLC9A3 SYK TACR1 THRA THRB TOP1 TUBA1A TUBA1B TUBA1C TUBA3C TUBA3E TUBA4A TUBB TUBB1 TUBB2A TUBB2B TUBB3 TUBB4A TUBB4B TUBB6 TUBB8 TYK2 TYMS VDR ampC bla blaT-3 blaT-4 blaT-5 blaT-6 blaUOE-1 dacA dacB dacC folA folP ftsI gyrA gyrB ileS mecA mrcA mrcB mrdA parC parE pbp2 pbp4 pbpA pbpF rplA rplB rplC rplD rplE rplF rplI rplJ rplK rplL rplM rplN rplO rplP rplQ rplR rplS rplT rplU rplV rplW rplX rplY rpmA rpmB rpmC rpmD rpmE rpmE2 rpmF rpmG rpmG1 rpmG2 rpmG3 rpmH rpmI rpmJ rpsA rpsB rpsC rpsD rpsE rpsF rpsG rpsH rpsI rpsJ rpsK rpsL rpsM rpsN rpsO rpsP rpsQ rpsR rpsS rpsT rpsU thyA ykgM ykgO

The experimentally established mechanism targets of Water. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compound	similarity	top predicted	shared targets
Water SCHEMBL526974	0.82	—	—
Water SCHEMBL3887949	0.67	—	—
Water SCHEMBL6510189	0.67	—	—
Water SCHEMBL8352263	0.67	—	—
Water SCHEMBL21848042	0.67	—	—
Water SCHEMBL25405219	0.67	—	—
Water SCHEMBL20703393	0.67	—	—
Water SCHEMBL818054	0.67	—	—
Water SCHEMBL21225084	0.67	—	—
Water SCHEMBL4098925	0.67	—	—

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 45 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

Patent	Title	Assignee	Published	Priority	Filing	Country	Status
US-7691664-B2	Low viscosity precursor compositions and methods for the deposition of conductive electronic features	CABOT CORPORATION (US)	2010-04-06	—	—	US	disclosed
US-20100034986-A1	Low viscosity precursor compositions and methods for the deposition of conductive electronic features	CABOT CORPORATION (US)	2010-02-11	—	—	US	disclosed
US-7629017-B2	Methods for the deposition of conductive electronic features	CABOT CORPORATION (US)	2009-12-08	—	—	US	disclosed
US-7524528-B2	Precursor compositions and methods for the deposition of passive electrical components on a substrate	CABOT CORPORATION (US)	2009-04-28	—	—	US	disclosed
EP-1448725-A4	LOW VISCOSITY PRECURSOR COMPOSITIONS AND METHODS FOR THE DEPOSITION OF CONDUCTIVE ELECTRONIC FEATURES	CABOT CORP (US)	2008-07-23	—	—	EP	disclosed
US-20080108218-A1	Low viscosity precursor compositions and methods for the deposition of conductive electronic features	CABOT CORPORATION (US)	2008-05-08	—	—	US	disclosed
US-20080093422-A1	Low viscosity precursor compositions and methods for the deposition of conductive electronic features	CABOT CORPORATION (US)	2008-04-24	—	—	US	disclosed
US-20080093423-A1	Low viscosity precursor compositions and methods for the deposition of conductive electronic features	CABOT CORPORATION (US)	2008-04-24	—	—	US	disclosed
US-20070221887-A1	Low viscosity precursor compositions and methods for the deposition of conductive electronic features	CABOT CORPORATION (US)	2007-09-27	—	—	US	disclosed
US-20070207565-A1	PROCESSES FOR FORMING PHOTOVOLTAIC FEATURES	CABOT CORPORATION (US)	2007-09-06	—	—	US	disclosed
US-20070096063-A1	Low viscosity precursor compositions and methods for the deposition of conductive electronic features	CABOT CORPORATION (US)	2007-05-03	—	—	US	disclosed
US-20070096064-A1	Low viscosity precursor compositions and methods for the deposition of conductive electronic features	CABOT CORPORATION (US)	2007-05-03	—	—	US	disclosed
US-20070096062-A1	Low viscosity precursor compositions and methods for the deposition of conductive electronic features	CABOT CORPORATION (US)	2007-05-03	—	—	US	disclosed
US-20070096065-A1	Low viscosity precursor compositions and methods for the deposition of conductive electronic features	CABOT CORPORATION (US)	2007-05-03	—	—	US	disclosed
EP-1448725-A2	LOW VISCOSITY PRECURSOR COMPOSITIONS AND METHODS FOR THE DEPOSITION OF CONDUCTIVE ELECTRONIC FEATURES	Superior Micropowders LLC (US)	2004-08-25	—	—	EP	disclosed
US-20030180451-A1	Low viscosity copper precursor compositions and methods for the deposition of conductive electronic features	CABOT CORPORATION	2003-09-25	—	—	US	disclosed
US-20030175411-A1	Precursor compositions and methods for the deposition of passive electrical components on a substrate	CABOT CORPORATION	2003-09-18	—	—	US	disclosed
US-20030148024-A1	Low viscosity precursor compositons and methods for the depositon of conductive electronic features	CABOT CORPORATION	2003-08-07	—	—	US	disclosed
WO-2003032084-A2	LOW VISCOSITY PRECURSOR COMPOSITIONS AND METHODS FOR THE DEPOSITION OF CONDUCTIVE ELECTRONIC FEATURES	SUPERIOR MICROPOWDERS LLC (US)	2003-04-17	—	—	WO	disclosed
US-6548122-B1	Method of producing and depositing a metal film	SRI INTERNATIONAL	2003-04-15	—	—	US	disclosed