SCHEMBL3258196

SCHEMBL3258196

C=Cc1ccccc1/C=C\C(=O)c1ccccc1

nearest known ligand 0.64

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPT P10636 8/20 0.58
RAB9A P51151 6/20 0.58
NPC1 O15118 5/20 0.58
BCHE P06276 3/20 0.58
LMNA P02545 2/20 0.58
MAOB P27338 3/20 0.58
CYP1B1 Q16678 2/20 0.58
PLIN1 O60240 1/20 0.58
TNFRSF1A P19438 1/20 0.58
ACHE P22303 1/20 0.58
RECQL P46063 1/20 0.58
PLIN5 Q00G26 1/20 0.58
ABHD5 Q8WTS1 1/20 0.58
KMT2A Q03164 4/20 0.55
ALDH1A1 P00352 4/20 0.55
HPGD P15428 4/20 0.55
MEN1 O00255 3/20 0.55
NFKB1 P19838 3/20 0.55
NFKB2 Q00653 3/20 0.55
RELA Q04206 3/20 0.55

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4120846 1.00 MAPT (0.58) MAPTRAB9ANPC1BCHELMNA
SCHEMBL4120849 1.00 MAPT (0.58) MAPTRAB9ANPC1BCHELMNA
SCHEMBL9006476 0.90 MAPT (0.69) MAPTRAB9ANPC1BCHELMNA
SCHEMBL31549898 0.83 MAPT (0.60) MAPTRAB9ANPC1BCHELMNA
SCHEMBL9817843 0.82 NFKB1 (0.62) MAPTLMNANFKB1SMN1; SMN2KDM4E
SCHEMBL175543 0.82 NFKB1 (0.62) MAPTLMNANFKB1SMN1; SMN2KDM4E
SCHEMBL1499959 0.82 RAB9A (0.59) MAPTRAB9ANPC1BCHELMNA
SCHEMBL28301997 0.81 MAPT (0.58) MAPTRAB9ANPC1BCHELMNA
SCHEMBL29569445 0.81 MAPT (0.62) MAPTRAB9ANPC1BCHELMNA
SCHEMBL30921141 0.81 AKT1 (0.58) MAPTRAB9ANPC1BCHELMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7649027-B2 having juts via photopolymerization in supercritical carbon dioxide; calcining KANSAI PAINT CO., LTD. (JP) 2010-01-19 US disclosed
US-20090023830-A1 POLYMER AND PROCESS FOR PRODUCING POLYMER KANSAI PAINT CO., LTD. (JP) 2009-01-22 US disclosed
EP-1698647-A1 POLYMER AND PROCESS FOR PRODUCING POLYMER KANSAI PAINT CO., LTD. (JP) 2006-09-06 EP disclosed
US-7081486-B2 Method of producing polymer SHIZUOKA UNIVERSITY (JP) 2006-07-25 US disclosed
EP-1598374-A1 METHOD OF PRODUCING POLYMER Japan as represented by President of Shizuoka University (JP) 2005-11-23 EP disclosed
US-20050143481-A1 Method of producing polymer KANSAI PAINT CO., LTD. (JP) 2005-06-30 US disclosed
EP-0468465-B1 Near infrared ray-decolorizable printing ink and electrophotographic toner SHOWA DENKO KK (JP) 1997-10-01 EP disclosed
US-5166041-A Optical recording element, cationic dyes SHOWA DENKO K.K. (JP) 1992-11-24 US disclosed
EP-0468465-A1 Near infrared ray-decolorizable recording material SHOWA DENKO KABUSHIKI KAISHA (JP) 1992-01-29 EP disclosed
US-4939068-A Silane containing acid BASF AKTIENGESELLSCHAFT (DE) 1990-07-03 US disclosed
EP-0141254-B1 PROCESS FOR PRODUCING ALUMINUM SUPPORT FOR LITHOGRAPHIC PRINTING PLATES FUJI PHOTO FILM CO., LTD. (JP) 1988-03-16 EP disclosed
US-4576686-A ELECTROLYTIC GRAINING OF SURFACE, ASSYMETRIC WAVE FORM FUJI PHOTO FILM CO., LTD. (JP) 1986-03-18 US disclosed
EP-0141254-A1 Process for producing aluminum support for lithographic printing plates FUJI PHOTO FILM CO., LTD. (JP) 1985-05-15 EP disclosed