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Potassium Ion

Potassium Ion

SCHEMBL3279673

O=P([O-])([O-])C(N(CCN(C(P(=O)([O-])[O-])P(=O)([O-])[O-])C(P(=O)([O-])[O-])P(=O)([O-])[O-])CCN(C(P(=O)([O-])[O-])P(=O)([O-])[O-])C(P(=O)([O-])[O-])P(=O)([O-])[O-])P(=O)([O-])[O-].[K+].[K+].[K+].[K+].[K+].[K+].[K+].[K+].[K+].[K+].[K+].[K+].[K+].[K+].[K+].[K+].[K+].[K+].[K+].[K+]

nearest known ligand 0.32

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Known targets — ChEMBL curated mechanism

AGTR1DHFRGABBR1GABBR2GABRA1GABRA2GABRA3GABRA4GABRA5GABRA6GABRB1GABRB2GABRB3GABRDGABREGABRG1GABRG2GABRG3GABRPGABRQGARTNR3C2PBP2XPTGS1PTGS2VKORC1blablaT-3blaT-4blaT-5blaT-6dacAdacBdacCfolAftsImrcAmrcBmrdApbp1apbp1bpbp2apbp2bpbp3polthyA

The experimentally established mechanism targets of Potassium Ion. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
▸ FDPS P14324 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2129659 0.95 FDPS (0.32) FDPS
SCHEMBL3979714 0.95 FDPS (0.32) FDPS
Lithium Ion SCHEMBL3278813 0.95 FDPS (0.32) FDPS
Potassium Ion SCHEMBL3178660 0.90 SLC34A1 (0.30) —
SCHEMBL11176197 0.87 — —
Lithium Ion SCHEMBL3284821 0.85 — —
SCHEMBL8599516 0.85 — —
SCHEMBL8599519 0.85 — —
SCHEMBL1531298 0.85 — —
SCHEMBL8763835 0.85 — —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-115725963-A Method for roughening ferrite surface and method for metallizing ferrite surface 广东光华科技股份有限公司 2023-03-03 — — CN claimed
US-7700532-B2 Cleaning composition and method of cleaning therewith WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) 2010-04-20 — — US claimed
US-20060154838-A1 Cleaning composition and method of cleaning therewith WAKO PURE CHEMICAL INDUSTRIES (JP) 2006-07-13 — — US claimed
EP-1562225-A1 CLEANING COMPOSITION AND METHOD OF CLEANING THEREWITH Wako Pure Chemical Industries, Ltd. (JP) 2005-08-10 — — EP claimed
WO-2023085182-A1 FOAMING DETERGENT COMPOSITION 花王株式会社 2023-05-19 — — WO disclosed
CN-115725963-A Method for roughening ferrite surface and method for metallizing ferrite surface 广东光华科技股份有限公司 2023-03-03 — — CN disclosed
EP-1564797-B1 POLISHING COMPOSITION AND RINSING COMPOSITION FUJIMI INC (JP) 2016-07-27 — — EP disclosed
US-7481949-B2 Polishing composition and rinsing composition WAKO PURE CHEMICAL INDUSTRIES, LTD (JP) 2009-01-27 — — US disclosed
US-20060151854-A1 Polishing composition and rinsing composition FUJIMI INCORPORATED (JP) 2006-07-13 — — US disclosed
EP-1564797-A1 POLISHING COMPOSITION AND RINSING COMPOSITION FUJIMI INCORPORATED (JP) 2005-08-17 — — EP disclosed
US-5736246-A SILANEDIOL OR TRIOL DERIVATIVES USED AS SIZING COMPOSITION USEFUL FOR COATING THE GLASS STRAND; IMPROVED CORROSION, ACID AND ALKALI RESISTANCE VETROTEX FRANCE (FR) 1998-04-07 — — US disclosed