SCHEMBL3291788

SCHEMBL3291788

O=Cc1ccc(C#CCO)c(O)c1

nearest known ligand 0.50

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
▸ KDM4E B2RXH2 1/20 0.50
▸ PTGS2 P35354 1/20 0.50
▸ RAB9A P51151 1/20 0.50
▸ ALDH1A1 P00352 5/20 0.42
▸ AOX1 Q06278 1/20 0.42
▸ ALDH5A1 P51649 3/20 0.39
▸ ABAT P80404 3/20 0.39
▸ TRIM24 O15164 1/20 0.39
▸ HPGD P15428 1/20 0.39
▸ TDP1 Q9NUW8 1/20 0.39
▸ TRIM33 Q9UPN9 1/20 0.39
▸ TTR P02766 2/20 0.36
▸ CYP3A4 P08684 1/20 0.33
▸ RECQL P46063 1/20 0.33
▸ XDH P47989 1/20 0.33
▸ CYP2A6 P11509 1/20 0.33
▸ EGFR P00533 1/20 0.32
▸ LCK P06239 1/20 0.31
▸ MAOA P21397 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3291783 0.80 KDM4E (0.55) KDM4EPTGS2RAB9AALDH1A1AOX1
SCHEMBL11219302 0.78 ALDH1A1 (0.53) KDM4ERAB9AALDH1A1AOX1ALDH5A1
SCHEMBL5682708 0.74 KDM4E (0.57) KDM4EPTGS2RAB9AALDH1A1AOX1
SCHEMBL14493327 0.73 TRPA1 (0.45) RAB9AALDH1A1HPGDTDP1
SCHEMBL2560937 0.72 MMP2 (0.47) KDM4EALDH1A1ALDH5A1ABATCYP2A6
SCHEMBL2560355 0.70 FFAR1 (0.52) KDM4EPTGS2RAB9AALDH1A1TRIM24
SCHEMBL29622517 0.70 FFAR1 (0.52) KDM4EPTGS2RAB9AALDH1A1TRIM24
SCHEMBL13464023 0.69 ALDH1A1 (0.42) KDM4EALDH1A1
Protocatechualdehyde SCHEMBL27781791 0.69 KDM4E (0.91) KDM4EPTGS2RAB9AALDH1A1AOX1
SCHEMBL5521189 0.68 KDM4E (0.59) KDM4EPTGS2RAB9AALDH1A1AOX1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7723013-B2 Negative-acting photolithographic printing plate with improved pre-burn performance SOUTHERN LITHOPLATE, INC. (US) 2010-05-25 — — US disclosed
US-20080171288-A1 Negative-acting photolithographic printing plate with improved pre-burn performance SOUTHERN LITHOPLATE, INC. 2008-07-17 — — US disclosed
EP-1917299-A1 DUAL-WAVELENGTH POSITIVE-WORKING RADIATION-SENSITIVE ELEMENTS Kodak Graphic Communications Canada Company (CA) 2008-05-07 — — EP disclosed
US-7279263-B2 Dual-wavelength positive-working radiation-sensitive elements KODAK GRAPHIC COMMUNICATIONS CANADA COMPANY (CA) 2007-10-09 — — US disclosed
WO-2007001802-A1 DUAL-WAVELENGTH POSITIVE-WORKING RADIATION-SENSITIVE ELEMENTS KODAK GRAPHIC COMMUNICATIONS CANADA COMPANY (CA) 2007-01-04 — — WO disclosed
US-20060154187-A1 Development of radiation-sensitive elements KODAK GRAPHIC COMMUNICATIONS CANADA COMPANY (CA) 2006-07-13 — — US disclosed
US-20050287468-A1 Dual-wavelength positive-working radiation-sensitive elements KODAK GRAPHIC COMMUNICATIONS CANADA COMPANY (CA) 2005-12-29 — — US disclosed
EP-1603749-A2 DEVELOPMENT ENHANCEMENT OF RADIATION-SENSITIVE ELEMENTS Creo Inc. (CA) 2005-12-14 — — EP disclosed
US-20050214677-A1 Light-sensitive lithographic printing plate FUJI PHOTO FILM CO., LTD. 2005-09-29 — — US disclosed
US-20050214678-A1 Light-sensitive lithographic printing plate FUJI PHOTO FILM CO., LTD. 2005-09-29 — — US disclosed
US-20050003296-A1 Development enhancement of radiation-sensitive elements KODAK GRAPHIC COMMUNICATIONS CANADA COMPANY (CA) 2005-01-06 — — US disclosed
WO-2004081662-A2 DEVELOPMENT ENHANCEMENT OF RADIATION-SENSITIVE ELEMENTS CREO INC. (CA) 2004-09-23 — — WO disclosed
EP-1208014-B1 POSITIVE ACTING PHOTORESIST COMPOSITION AND IMAGEABLE ELEMENT CREO IL LTD (IL) 2004-04-14 — — EP disclosed
US-6541181-B1 Heat sensitive element on lithographic substrate CREO IL. LTD. (IL) 2003-04-01 — — US disclosed
US-6255033-B1 ACETALIZATION OF A PARTIALLY HYDROLYZED POLYVINYL ACETATE WITH A MIXTURE OF AN ACYCLIC ALDEHYDE AND AN AROMATIC ALDEHYDE CREO, LTD. (IL) 2001-07-03 — — US disclosed
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